ROTATABLE SPUTTER TARGET BASE, ROTATABLE SPUTTER TARGET, COATING INSTALLATION, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, TARGET BASE CONNECTION MEANS, AND METHOD OF CONNECTING A ROTATABLE TARGET BASE DEVICE FOR SPUTTERING INSTALLATIONS TO A TARGET BASE SUPPORT

Rotary target backing tube bonding assembly

COOLED DARK SPACE SHIELD FOR MULTI-CATHODE DESIGN

SPUTTERING DEVICE

SUBSTRATE HOLDING DEVICE AND SPUTTERING APPARATUS HAVING SAME

DEVICE FOR SUPPORTING A ROTATABLE TARGET AND SPUTTERING INSTALLATION

Cylindrical sputtering target, and method for manufacturing same

END-BLOCK AND SPUTTERING INSTALLATION

ROTATABLE TARGET, BACKING TUBE, SPUTTERING INSTALLATION AND METHOD FOR PRODUCING A ROTATABLE TARGET

Apparatus and method for improved darkspace gap design in RF sputtering chamber

METHOD OF BONDING ROTATABLE CERAMIC TARGETS TO A BACKING STRUCTURE

Cylindrical magnetron having a shunt

SPUTTERING APPARATUS WITH ROTATABLE SPUTTERING TARGET

SUPPORT DEVICE AND COATING DEVICE USING SAME

Supporting device for a magnetron assembly with a rotatable target

PVD TARGET WITH END OF SERVICE LIFE DETECTION CAPABILITY

Sputtering apparatus

Target Exchange Type Plasma Generating Apparatus

Rotatable sputtering magnetron with high stiffness

Sputter-coating apparatus

Rotary Target Assembly and Rotary Target

Cathode unit and sputtering apparatus provided with the same

Sputtering target apparatus

Use of DC magnetron sputtering systems

Sputtering apparatus including cathode with rotatable targets, and related methods

FILM DEPOSITING APPARATUS AND METHOD

Sputtering apparatus and method of preventing damage thereof

TARGET BACKING TUBE, CYLINDRICAL TARGET ASSEMBLY AND SPUTTERING SYSTEM

TARGET BACKING TUBE, CYLINDRICAL TARGET, AND CYLINDRICAL TARGET ASSEMBLY

SPUTTERING SYSTEM, ROTATABLE CYLINDRICAL TARGET ASSEMBLY, BACKING TUBE, TARGET ELEMENT AND COOLING SHIELD

Sputtering target temperature control utilizing layers having predetermined emissivity coefficients

COOLING PLATE AND MANUFACTURING METHOD THEREFOR

HIGH UTILIZATION ROTATABLE TARGET USING CERAMIC TITANIUM OXIDE RING

Magnetron sputtering device having rotatable substrate holder

Hot tile sputtering system

Rotary cathode for magnetron sputtering apparatus

DEPOSITION APPARATUS WITH HIGH TEMPERATURE ROTATABLE TARGET AND METHOD OF OPERATING THEREOF

Film forming apparatus and film forming method

SPUTTERING APPARATUS, DOUBLE ROTARY SHUTTER UNIT, AND SPUTTERING METHOD

Sputter target and backing plate assembly

Magnet bar support system

Rotatable magnetron sputtering with axially movable target electrode tube

Film forming method by sputtering and sputtering apparatus thereof

Endblock for a magnetron device with a rotatable target

SPUTTERING TARGET

FILM COATING APPARATUS

VACUUM-COATING MACHINE WITH MOTOR-DRIVEN ROTARY CATHODE

ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION

ROTATABLE SPUTTER TARGET BASE, ROTATABLE SPUTTER TARGET, COATING INSTALLATION, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, TARGET BASE CONNECTION MEANS, AND METHOD OF CONNECTING A ROTATABLE TARGET BASE DEVICE FOR SPUTTERING INSTALLATIONS TO A TARGET BASE SUPPORT

ROTATABLE SPUTTER TARGET BACKING CYLINDER, ROTATABLE SPUTTER TARGET, METHODS OF PRODUCING AND RESTORING A ROTATABLE SPUTTER TARGET, AND COATING INSTALLATION

Method for assembling at least two plates and use of the method for preparing an ion beam sputtering assembly

SPUTTERING APPARATUS AND METHOD OF THIN FILM FORMATION

Powder-Fiber Adhesive

SPUTTERING APPARATUS, SPUTTERING METHOD AND METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM

End-block for a magnetron device with a rotatable target, and vacuum coating apparatus

SPUTTER TARGET ASSEMBLY HAVING A LOW-TEMPERATURE HIGH-STRENGTH BOND

Drive end-block for a rotatable magnetron

VACUUM COATING APPARATUS

Rotatable sputter target comprising an end-block with a liquid coolant supply system

Cylindrical magnetron

Drive end-block for a rotatable magnetron

TARGET FOR EFFICIENT USE OF PRECIOUS DEPOSITION MATERIAL

TUBULAR TARGET HAVING A CONNECTING LAYER ARRANGED BETWEEN THE TARGET TUBE AND THE CARRIER TUBE

MULTIPLE GROOVED VACUUM COUPLING

FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

INSERT PIECE FOR AN END-BLOCK OF A SPUTTERING INSTALLATION

Target arrangement

Rotatable sputter target

Magnetic shunts in tubular targets

Plasma deposition apparatus and method

Securing device for a sputtering source

MAGNETRON END-BLOCK WITH SHIELDED TARGET MOUNTING ASSEMBLY

Deposited Film Forming Method, Deposited Film Forming Device, Deposited Film, and Photosensitive Member Provided with the Deposited Film

Method for connecting magnetic substance target to backing plate, and magnetic substance target

Sputtering target having increased life and sputtering uniformity

BONDING METHOD FOR CYLINDRICAL TARGET

Sputter target and backing plate assembly

Module for coating both sides of a substrate in a single pass

Sputtering target fixture

Deposition system with improved material utilization

Target/Backing Plate Constructions, and Methods of Forming Them

Metal Double-Layer Structure and Method For Manufacturing the Same and Regeneration Method of Sputtering Target Employing That Method

Supply end block for rotary magnetron

VERTICALLY MOUNTED ROTARY CATHODES IN SPUTTERING SYSTEM ON ELEVATED RAILS

Sputtering target, sputtering target-backing plate assembly and deposition system

Flat end-block for carrying a rotatable sputtering target

End-block for a rotatable target sputtering apparatus

MONOLITHIC TARGET FOR FLAT PANEL APPLICATION

Novel manufacturing design and processing methods and apparatus for PVD targets

Circulated cooled target

COOLED DARK SPACE SHIELD FOR MULTI-CATHODE DESIGN

Method for forming sputter target assemblies having a controlled solder thickness

Electrically Coupled Target Panels

Backing plate assembly

PVD target

Film Forming Apparatus

Target for a sputtering source

Target holding apparatus

Magnetron Sputtering Device In which Two Modes Of Magnetic Flux Distribution (Balanced Mode/Unbalanced Mode) Can Be Switched From One To The Other And Vice Versa, A Film Formation Method For Forming A Film From An Inorganic Film Formation Material Using The Device, And A Dual Mode Magnetron Sputtering Device And Film Formation Method For Forming A Film From An Inorganic Film Formation Material At A Low Temperature Using The Device

Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers

Partially suspended rolling magnetron

Process kit components for titanium sputtering chamber

Target for sputtering chamber

Cathode for a vacuum sputtering system

Flexible magnetron including partial rolling support and centering pins

Target arrangement for mounting / dismounting and method of manufacturing

Target designs and related methods for enhanced cooling and reduced deflection and deformation

SPUTTERING TARGET FOR TITANIUM SPUTTERING CHAMBER

Sputtering target assembly having low conductivity backing plate and method of making same

Very long cylindrical sputtering target and method for manufacturing

PVD target with end of service life detection capability

PVD target with end of service life detection capability

METHOD OF USING A TARGET HAVING END OF SERVICE LIFE DETECTION CAPABILITY

Multiple zone sputtering target created through conductive and insulation bonding

Methods of treating deposition process components to form particle traps, and deposition process components having particle traps thereon

Copper or copper alloy target/copper alloy backing plate assembly

Vacuum-coating machine with motor-driven rotary cathode

Monolithic sputter target backing plate with integrated cooling passages

Tube cathode for use in sputter processes

Centering mechanism for aligning sputtering target tiles

Sputtering target with slow-sputter layer under target material

Sputtering apparatus and method of preventing damage thereof

Bonding of target tiles to backing plate with patterned bonding agent

Adaptable fixation for cylindrical magnetrons

Large area elastomer bonded sputtering target and method for manufacturing

Sputtering target tiles having structured edges separated by a gap

Target assemblies, targets, backing plates, and methods of target cooling

Cylindrical AC/DC Magnetron with Compliant Drive System and Improved Electrical and Thermal Isolation

Target backing plate for sputtering system

Sacrificial cathode target for sputtering cathode assembly

Sputtering cathode, production method and corresponding cathode

Rotating tubular sputter target assembly

Tubular sputtering target

Backing plates for sputtering targets

Sputtering target fixture

Target and method of diffusion bonding target to backing plate

PVD target support members and methods of making

Sputtering cathode adapter assembly and method

Sputtering cathode for coating processes

Rotary target locking ring assembly

Target support assembly

Replaceable target sidewall insert with texturing

Vacuum sputtering cathode

Thermography test method and apparatus for bonding evaluation in sputtering targets

Cathode for vacuum sputtering treatment machine

Method of manufacturing sputter targets with internal cooling channels

Methods of treating non-sputtered regions of PVD target constructions to form particle traps

Method for centering a sputter target onto a backing plate and the assembly thereof

Cylindrical magnetron with self cleaning target

Sputtering target assembly and sputtering apparatus using the same

Sputtering target assemblies using resistance welding

Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation

Sputtering device

Sputtering targets, and related apparatuses and methods

Magnetron assembly having coolant guide for enhanced target cooling