Patents-Review.com
ClassID:

205400 ⎘

H01J37/3435 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Constructional aspects of the reactor Target holders (includes backing plates and endblocks)

Recent Application in this class:
#1
20260094796
2026-04-02

SUBSTRATE PROCESSING APPARATUS

 #2
20250361600
2025-11-27

PHYSICAL VAPOR DEPOSITION SYSTEM AND METHODS OF OPERATING THE SAME

 #3
20250357073
2025-11-20

ELECTRICALLY CONDUCTIVE CERAMIC ELECTRIC FIELD BLOCKING PLATE

 #4
20250316468
2025-10-09

ROTARY MAGNETRON SPUTTERING WITH INDIVIDUALLY ADJUSTABLE MAGNETIC FIELD

 #5
20250299938
2025-09-25

PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORING

 #6
20250290192
2025-09-18

COATING PLANT AND METHOD FOR TARGET REPLACEMENT

 #7
20250218723
2025-07-03

SUBSTRATE SUPPORT DEVICE AND METHOD OF PREVENTING OCCURRENCE OF ARCING

 #8
20250183021
2025-06-05

SPUTTERING APPARATUS

 #9
20250149303
2025-05-08

DYNAMIC VACUUM SEAL SYSTEM FOR PHYSICAL VAPOR DEPOSITION SPUTTER APPLICATIONS

 #10
20250125131
2025-04-17

SPUTTERING TARGET, METHOD OF BONDING TARGET MATERIAL AND BACKING PLATE, AND METHOD OF MANUFACTURING SPUTTERING TARGET

 #11
20250092508
2025-03-20

PVD TARGET DESIGN AND SEMICONDUCTOR DEVICES FORMED USING THE SAME

 #12
20250029819
2025-01-23

SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION

 #13
20250014878
2025-01-09

WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE

 #14
20240429036
2024-12-26

PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORING

 #15
20240420937
2024-12-19

GROUNDING DEVICE FOR THIN FILM FORMATION USING PLASMA

 #16
20240271271
2024-08-15

PHYSICAL VAPOR DEPOSITION SYSTEM AND METHODS OF OPERATING THE SAME

 #17
20240258088
2024-08-01

Sputtering apparatus

 #18
20240213006
2024-06-27

CONSUMABLE COMPONENT TREATING APPARATUS AND SEMICONDUCTOR MANUFACTURING EQUIPMENT

 #19
20240212980
2024-06-27

PLASMA PROCESS APPARATUS

 #20
20240194462
2024-06-13

SPUTTERING APPARATUS

 #21
20240183029
2024-06-06

DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME

 #22
20240183027
2024-06-06

FILM FORMATION METHOD AND FILM FORMATION APPARATUS

 #23
20240084441
2024-03-14

Sputtering target and sputtering apparatus including the same

 #24
20240063003
2024-02-22

SPUTTERING APPARATUS

 #25
20240021422
2024-01-18

Device for reducing misalignment between sputtering target and shield

 #26
20230402247
2023-12-14

Molten liquid transport for tunable vaporization in ion sources

 #27
20230374654
2023-11-23

IN SITU AND TUNABLE DEPOSITION OF A FILM

 #28
20230366079
2023-11-16

PVD target design and semiconductor devices formed using the same

 #29
20230360897
2023-11-09

SPUTTERING TARGET-BACKING PLATE ASSEMBLY, MANUFACTURING METHOD THEREFOR, AND RECOVERY METHOD FOR SPUTTERING TARGET

 #30
20230307218
2023-09-28

Physical vapor deposition apparatus and method thereof

 #31
20230274921
2023-08-31

Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target

 #32
20230167542
2023-06-01

FILM FORMING APPARATUS

 #33
20230154733
2023-05-18

MAGNETRON TARGET COUPLING AND SUPPORT DEVICE

 #34
20230144179
2023-05-11

ELECTROCHROMIC DEVICES

 #35
20230143320
2023-05-11

Sputter trap having a thin high purity coating layer and method of making the same

 #36
20230138552
2023-05-04

Cathode unit for magnetron sputtering apparatus and magnetron sputtering apparatus

 #37
20230130947
2023-04-27

Tilted PVD source with rotating pedestal

 #38
20230091273
2023-03-23

Deposition method for tuning magnetic field distribution of deposition equipment

 #39
20230085216
2023-03-16

SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION

 #40
20230065664
2023-03-02

SPUTTERING DEVICE

 #41
20230035198
2023-02-02

Sputtering apparatus

 #42
20230032857
2023-02-02

IN SITU AND TUNABLE DEPOSITION OF A FILM

 #43
20230029343
2023-01-26

Sputtering apparatus, film formation method, and method for manufacturing product

 #44
20230005724
2023-01-05

Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source

 #45
20220415637
2022-12-29

Cleaning of SIN with CCP plasma or RPS clean

 #46
20220415636
2022-12-29

Cleaning of sin with CCP plasma or RPS clean

 #47
20220415634
2022-12-29

FILM FORMING APPARATUS, PROCESSING CONDITION DETERMINATION METHOD, AND FILM FORMING METHOD

 #48
20220415631
2022-12-29

MODULAR SPUTTERING TARGET WITH PRECIOUS METAL INSERT AND SKIRT

 #49
20220406582
2022-12-22

Multifocal magnetron design for physical vapor deposition processing on a single cathode

 #50
20220399195
2022-12-15

SPUTTER DEPOSITION

 #51
20220384166
2022-12-01

MAGNETIC-FIELD-DISTRIBUTION TUNER, DEPOSITION EQUIPMENT AND METHOD OF DEPOSITION

 #52
20220384159
2022-12-01

Sputter deposition

 #53
20220367161
2022-11-17

Physical vapor deposition apparatus and method thereof

 #54
20220359175
2022-11-10

ANALYZING METHOD

 #55
20220351953
2022-11-03

Sputtering target assembly to prevent overetch of backing plate and methods of using the same

 #56
20220316045
2022-10-06

SYSTEM AND METHOD FOR ION-ASSISTED DEPOSITION OF OPTICAL COATINGS

 #57
20220310371
2022-09-29

Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target

 #58
20220301837
2022-09-22

FILM DEPOSITION APPARATUS, SPUTTERING TARGET, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

 #59
20220223390
2022-07-14

Film formation apparatus and film formation method

 #60
20220220615
2022-07-14

Wafer support and thin-film deposition apparatus using the same

 #61
20220195585
2022-06-23

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #62
20220162744
2022-05-26

Target structure of physical vapor deposition

 #63
20220154329
2022-05-19

Isolator ring clamp and physical vapor deposition chamber incorporating same

 #64
20220154324
2022-05-19

Vacuum processing apparatus

 #65
20220145446
2022-05-12

METHOD FOR PRODUCING TARGETS FOR PHYSICAL VAPOR DEPOSITION (PVD)

 #66
20220139686
2022-05-05

Substrate processing apparatus and substrate processing method

 #67
20220139685
2022-05-05

Profiled sputtering target and method of making the same

 #68
20220102124
2022-03-31

Target, film forming apparatus, and method of manufacturing film formation object

 #69
20220084871
2022-03-17

Film formation apparatus

 #70
20220076934
2022-03-10

Semiconductor manufacturing apparatus and earth shield

 #71
20220068620
2022-03-03

Systems and methods for an improved magnetron electromagnetic assembly

 #72
20220051883
2022-02-17

Sputtering equipment and operation method thereof

 #73
20220042168
2022-02-10

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #74
20220037136
2022-02-03

Deposition system with multi-cathode and method of manufacture thereof

 #75
20220028672
2022-01-27

ROTARY MAGNETRON SPUTTERING WITH INDIVIDUALLY ADJUSTABLE MAGNETIC FIELD

 #76
20220013342
2022-01-13

Backing plate, sputtering target, and production methods therefor

 #77
20220005679
2022-01-06

Plasma chamber target for reducing defects in workpiece during dielectric sputtering

 #78
20210407777
2021-12-30

Sputtering target assembly to prevent overetch of backing plate and methods of using the same

 #79
20210391158
2021-12-16

MAGNETRON WITH CONTROLLER FOR MONITORING AND CONTROL

 #80
20210381099
2021-12-09

Liquid sputter target

 #81
20210317569
2021-10-14

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like Films

 #82
20210292886
2021-09-23

Sputtering apparatus and sputtering method

 #83
20210272785
2021-09-02

Physical vapor deposition processing systems target cooling

 #84
20210257198
2021-08-19

Cathode unit and film forming apparatus

 #85
20210238732
2021-08-05

Advanced sputter targets for ion generation

 #86
20210238731
2021-08-05

PVD target design and semiconductor devices formed using the same

 #87
20210217638
2021-07-15

Stage, film-forming apparatus, and film-processing apparatus

 #88
20210197877
2021-07-01

TARGET CONVEYING VEHICLE

 #89
20210164099
2021-06-03

High throughput vacuum deposition sources and system

 #90
20210118653
2021-04-22

Film formation device and film formation method

 #91
20210115553
2021-04-22

Sputtering a layer on a substrate using a high-energy density plasma magnetron

 #92
20210115552
2021-04-22

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #93
20210102284
2021-04-08

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #94
20210020419
2021-01-21

Target structure and film forming apparatus

 #95
20200381226
2020-12-03

Film forming apparatus

 #96
20200365370
2020-11-19

Process chamber with reduced plasma arc

 #97
20200347491
2020-11-05

Target structure of physical vapor deposition

 #98
20200343080
2020-10-29

Substrate processing apparatus and substrate processing method

 #99
20200303172
2020-09-24

TARGET ASSEMBLY SHIELD

 #100
20200294778
2020-09-17

Sputtering target with backside cooling grooves

 #101
20200287445
2020-09-10

Termination unit

 #102
20200279724
2020-09-03

FILM FORMATION DEVICE

 #103
20200266039
2020-08-20

Physical vapor deposition processing systems target cooling

 #104
20200266038
2020-08-20

DUAL POWER FEED ROTARY SPUTTERING CATHODE

 #105
20200258724
2020-08-13

Sputtering target-backing plate assembly

 #106
20200258723
2020-08-13

Physical vapor deposition apparatus

 #107
20200241409
2020-07-30

Physical Vapor Deposition Target Assembly

 #108
20200203134
2020-06-25

Rotatable sputtering target

 #109
20200185205
2020-06-11

Sputtering apparatus including cathode with rotatable targets, and related methods

 #110
20200181761
2020-06-11

Sputtering target and manufacturing method thereof

 #111
20200176235
2020-06-04

PHYSICAL VAPOR DEPOSITION WITH A DUAL-SHUTTER

 #112
20200174335
2020-06-04

Electrochromic devices

 #113
20200168444
2020-05-28

Analyzing method

 #114
20200157675
2020-05-21

Advanced sputter targets for ion generation

 #115
20200144034
2020-05-07

Target object processing method and plasma processing apparatus

 #116
20200135438
2020-04-30

Feeding structure, upper electrode assembly, and physical vapor deposition chamber and device

 #117
20200126764
2020-04-23

Plasma processing apparatus

 #118
20200105511
2020-04-02

Physical vapor deposition apparatus and method thereof

 #119
20200090916
2020-03-19

Insertable target holder for solid dopant materials

 #120
20200090915
2020-03-19

Target assembly for safe and economic evaporation of brittle materials

 #121
20200066494
2020-02-27

FILM FORMING DEVICE AND METHOD OF FORMING PIEZOELECTRIC FILM

 #122
20200051796
2020-02-13

Film-forming apparatus, film-forming system, and film-forming method

 #123
20200048761
2020-02-13

Sputter trap having a thin high purity coating layer and method of making the same

 #124
20200043711
2020-02-06

Film forming apparatus and film forming method

 #125
20200027708
2020-01-23

Sputtering device

 #126
20190390327
2019-12-26

Apparatus for depositing material on the surface of a substrate

 #127
20190378700
2019-12-12

A UNIVERSALLY MOUNTABLE END-BLOCK

 #128
20190371610
2019-12-05

Process integration method to tune resistivity of nickel silicide

 #129
20190316248
2019-10-17

Film-forming apparatus, method for producing film-formed product using same, and cooling panel

 #130
20190299324
2019-10-03

Process for producing sputtering target and sputtering target

 #131
20190272979
2019-09-05

METHOD OF PROCESSING A SUBSTRATE USING AN ION BEAM AND APPARATUS FOR PERFORMING THE SAME

 #132
20190271070
2019-09-05

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

 #133
20190256969
2019-08-22

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #134
20190255655
2019-08-22

Indirect surface finishing during hybrid manufacturing

 #135
20190249293
2019-08-15

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

 #136
20190244754
2019-08-08

Magnetic thin film deposition chamber and thin film deposition apparatus

 #137
20190237306
2019-08-01

Electrical transfer in an endblock for a sputter device

 #138
20190206662
2019-07-04

Film forming unit for sputtering apparatus

 #139
20190194798
2019-06-27

Cathode unit for sputtering apparatus

 #140
20190180991
2019-06-13

Multifocal magnetron design for physical vapor deposition processing on a single cathode

 #141
20190180971
2019-06-13

Ion source crucible for solid feed materials

 #142
20190172691
2019-06-06

HEATING CARRIER DEVICE FOR USE ON SPUTTERING CATHODE ASSEMBLY

 #143
20190172690
2019-06-06

Substrate processing apparatus

 #144
20190080890
2019-03-14

VACUUM DEPOSITION COMPOSITE TARGET

 #145
20190078195
2019-03-14

Sputtering target capable of stabilizing ignition

 #146
20190057851
2019-02-21

Physical vapor deposition processing systems target cooling

 #147
20190035612
2019-01-31

SPUTTERING TARGET WITH MICRO CHANNELS

 #148
20190003039
2019-01-03

Sputter devices and methods

 #149
20190003037
2019-01-03

Target structure of physical vapor deposition

 #150
20180374689
2018-12-27

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

 #151
20180374688
2018-12-27

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #152
20180366328
2018-12-20

Process integration method to tune resistivity of nickel silicide

 #153
20180342378
2018-11-29

Sputtering target with backside cooling grooves

 #154
20180337052
2018-11-22

Systems and methods for low resistivity physical vapor deposition of a tungsten film

 #155
20180323047
2018-11-08

SPUTTER TARGET BACKING PLATE ASSEMBLIES WITH COOLING STRUCTURES

 #156
20180312963
2018-11-01

Substrate bearing assembly and magnetron sputtering device

 #157
20180308671
2018-10-25

Profiled sputtering target and method of making the same

 #158
20180282859
2018-10-04

Sputtering target-backing plate assembly and production method thereof

 #159
20180277342
2018-09-27

SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME

 #160
20180269043
2018-09-20

MAGNETRON SPUTTERING APPARATUS AND FILM FORMATION METHOD USING MAGNETRON SPUTTERING APPARATUS

 #161
20180254172
2018-09-06

Sputtering apparatus, film deposition method, and control device

 #162
20180245217
2018-08-30

High throughput vacuum deposition sources and system

 #163
20180223419
2018-08-09

Processes for low pressure, cold bonding of solid lithium to metal substrates

 #164
20180211825
2018-07-26

Sputtering target having RFID information

 #165
20180209036
2018-07-26

Sputtering apparatus and target changing device thereof

 #166
20180202039
2018-07-19

HEAT TREATMENT METHODS FOR METAL AND METAL ALLOY PREPARATION

 #167
20180197719
2018-07-12

Method of processing a substrate using an ion beam and apparatus for performing the same

 #168
20180195164
2018-07-12

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #169
20180195163
2018-07-12

COOLING AND UTILIZATION OPTIMIZATION OF HEAT SENSITIVE BONDED METAL TARGETS

 #170
20180144913
2018-05-24

Tubular target

 #171
20180138024
2018-05-17

Connector piece for a tubular target

 #172
20180094340
2018-04-05

High strength aluminum alloy backing plate and methods of making

 #173
20180051368
2018-02-22

High density, low stress amorphous carbon film, and process and equipment for its deposition

 #174
20180037984
2018-02-08

ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE

 #175
20180019108
2018-01-18

Sputtering target with backside cooling grooves

 #176
20170372951
2017-12-28

Method and processing apparatus for performing pre-treatment to form copper wiring in recess formed in substrate

 #177
20170372871
2017-12-28

Cathodic arc deposition apparatus and method

 #178
20170369985
2017-12-28

Laterally adjustable return path magnet assembly and methods

 #179
20170338087
2017-11-23

Sputter target and sputtering methods

 #180
20170330736
2017-11-16

Device having two end blocks, an assembly and a sputter system comprising same, and a method of providing RF power to a target assembly using said device or assembly

 #181
20170329200
2017-11-16

Electrochromic devices

 #182
20170327940
2017-11-16

Lithium sputter targets

 #183
20170298500
2017-10-19

TARGET SPUTTERING DEVICE AND METHOD FOR SPUTTERING TARGET

 #184
20170287685
2017-10-05

SPUTTERING TARGET ASSEMBLY HAVING A GRADED INTERLAYER AND METHODS OF MAKING

 #185
20170278685
2017-09-28

Dual power feed rotary sputtering cathode

 #186
20170271134
2017-09-21

Lithium Cobalt Sintered Body and Sputtering Target Produced by Using the Sintered Body, Production Method of Lithium Cobalt Oxide Sintered Body, and Thin Film Formed from Lithium Cobalt Oxide

 #187
20170271130
2017-09-21

Durable 3D geometry conformal anti-reflection coating

 #188
20170268122
2017-09-21

Molten target sputtering (MTS) deposition for enhanced kinetic energy and flux of ionized atoms

 #189
20170256386
2017-09-07

Magnetic Spattering Coating Device and Target Device Thereof

 #190
20170250061
2017-08-31

Vacuum device

 #191
20170229296
2017-08-10

Target assembly

 #192
20170213712
2017-07-27

Backing plate obtained by diffusion-bonding anticorrosive metal and Mo or Mo alloy, and sputtering target-backing plate assembly provided with said backing plate

 #193
20170207071
2017-07-20

Sputter device with moving target

 #194
20170178912
2017-06-22

Capacitive coupled plasma source for sputtering and resputtering

 #195
20170178878
2017-06-22

Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source

 #196
20170175248
2017-06-22

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

 #197
20170140906
2017-05-18

Cooling water jet pack for high power rotary cathodes

 #198
20170133209
2017-05-11

Sputtering target

 #199
20170084434
2017-03-23

DIFFUSION-BONDED SPUTTER TARGET ASSEMBLY AND METHOD OF MANUFACTURING

 #200
20170076923
2017-03-16

Silicon sputtering target with special surface treatment and good particle performance and methods of making the same

 #201
20170062192
2017-03-02

FILM FORMING APPARATUS

 #202
20160358763
2016-12-08

Hermetically sealed magnetic keeper cathode

 #203
20160343555
2016-11-24

Clamp and carrier used in a coating apparatus

 #204
20160343550
2016-11-24

End block assembly, bearing assembly, and method for manufacturing a bearing assembly

 #205
20160336151
2016-11-17

AC power connector, sputtering apparatus and method therefor

 #206
20160326632
2016-11-10

Sputter unit

 #207
20160284524
2016-09-29

Cylindrical sputtering target

 #208
20160276583
2016-09-22

Method of manufacturing tunnel magnetoresistive effect element and sputtering apparatus

 #209
20160260583
2016-09-08

Cathodic arc deposition apparatus and method

 #210
20160237555
2016-08-18

Multi-Magnetron Arrangement

 #211
20160230267
2016-08-11

Apparatus and a method for plating an Nd—Fe—B magnet

 #212
20160229029
2016-08-11

Optimized textured surfaces and methods of optimizing

 #213
20160209722
2016-07-21

Electrochromic devices

 #214
20160172166
2016-06-16

Target, adapted to an indirect cooling device, having a cooling plate

 #215
20160111265
2016-04-21

End block arrangement and socket arrangement

 #216
20160093477
2016-03-31

DURABLE 3D GEOMETRY CONFORMAL ANTI-REFLECTION COATING

 #217
20160086777
2016-03-24

Sputtering target-backing plate assembly

 #218
20160079045
2016-03-17

Sputtering apparatus, film deposition method, and control device

 #219
20160071706
2016-03-10

Centering of a plate in a holder both at room temperatures and at higher temperatures

 #220
20160071705
2016-03-10

Backing plate-integrated metal sputtering target and method of producing same

 #221
20160064201
2016-03-03

Sputtering target having increased power compatibility

 #222
20160064200
2016-03-03

Li-containing oxide target assembly

 #223
20160042928
2016-02-11

Sputtering apparatus

 #224
20160030909
2016-02-04

Deposition tool for combinatorial thin film material libraries

 #225
20160027624
2016-01-28

SPUTTERING APPARATUS

 #226
20160027623
2016-01-28

Sputtering apparatus

 #227
20160013034
2016-01-14

Online adjustable magnet bar

 #228
20160013032
2016-01-14

Cathode assembly, physical vapor deposition system, and method for physical vapor deposition

 #229
20160002770
2016-01-07

APPARATUS WITH NEIGHBORING SPUTTER CATHODES AND METHOD OF OPERATION THEREOF

 #230
20150370204
2015-12-24

Fixing unit of plate-shaped member, PVD processing apparatus and fixing method of plate-shaped member

 #231
20150307983
2015-10-29

Drum sputtering device

 #232
20150279636
2015-10-01

PARTICLE FREE ROTARY TARGET AND METHOD OF MANUFACTURING THEREOF

 #233
20150279635
2015-10-01

Deposition system with multi-cathode and method of manufacture thereof

 #234
20150262796
2015-09-17

Sputtering apparatus and substrate processing apparatus

 #235
20150262789
2015-09-17

Method for increased target utilization in ion beam deposition tools

 #236
20150255260
2015-09-10

NbO2 sintered compact, sputtering target comprising the sintered compact, and method of producing NbO2 sintered compact

 #237
20150249026
2015-09-03

ROOM-TEMPERATURE BONDING APPARATUS AND ROOM-TEMPERATURE BONDING METHOD

 #238
20150235821
2015-08-20

UNIFORM FORCE FLANGE CLAMP

 #239
20150211110
2015-07-30

DEVICE FOR COATING A SUBSTRATE MADE OF PARTICLES

 #240
20150203960
2015-07-23

Target retaining apparatus

 #241
20150197847
2015-07-16

Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure

 #242
20150194294
2015-07-09

Method of fine tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device

 #243
20150170889
2015-06-18

Diffusion bonded high purity copper sputtering target assemblies

 #244
20150170888
2015-06-18

Physical vapor deposition (PVD) target having low friction pads

 #245
20150155143
2015-06-04

Apparatus and method for improved darkspace gap design in RF sputtering chamber

 #246
20150101924
2015-04-16

ASSEMBLY AND METHOD OF COATING AN INTERIOR SURFACE OF AN OBJECT

 #247
20150096881
2015-04-09

Sputtering apparatus and sputtering method

 #248
20150075979
2015-03-19

Intaglio printing plate coating apparatus

 #249
20150060261
2015-03-05

Target adapted to an indirect cooling device

 #250
20150047975
2015-02-19

Sputtering target with backside cooling grooves

 #251
20150021166
2015-01-22

SPUTTERING APPARATUS AND METHOD

 #252
20150008120
2015-01-08

In-vacuum rotational device

 #253
20140367252
2014-12-18

Sputtering target assembly

 #254
20140367250
2014-12-18

SYSTEMS FOR FORMING PHOTOVOLTAIC CELLS ON FLEXIBLE SUBSTRATES

 #255
20140339545
2014-11-20

Semiconductor device, method for manufacturing the same, and apparatus for manufacturing semiconductor device

 #256
20140318953
2014-10-30

Sputtering target and manufacturing method therefor

 #257
20140318947
2014-10-30

Sputter target and sputtering methods

 #258
20140284210
2014-09-25

Sputtering apparatus, target and shield

 #259
20140262768
2014-09-18

Plating stack to condition a bonding surface

 #260
20140261180
2014-09-18

PVD target for self-centering process shield

 #261
20140251799
2014-09-11

Film deposition apparatus with low plasma damage and low processing temperature

 #262
20140251217
2014-09-11

Target for PVD sputtering system

 #263
20140197025
2014-07-17

Hot tile sputtering system

 #264
20140174920
2014-06-26

Evaporation source

 #265
20140138242
2014-05-22

Lithium sputter targets

 #266
20140076714
2014-03-20

Sputtering device

 #267
20140054167
2014-02-27

Film-forming apparatus

 #268
20140034490
2014-02-06

Diffusion-bonded sputter target assembly and method of manufacturing

 #269
20140034489
2014-02-06

Film-forming apparatus

 #270
20130299345
2013-11-14

Sputtering apparatus

 #271
20130284594
2013-10-31

Narrow source for physical vapor deposition processing

 #272
20130264199
2013-10-10

CYLINDRICAL MAGNETRON SPUTTERING TARGET ASSEMBLY

 #273
20130256125
2013-10-03

Substrate processing system with mechanically floating target assembly

 #274
20130220805
2013-08-29

Sputtering target-backing plate assembly and method for producing same

 #275
20130192981
2013-08-01

Direct cooled rotary sputtering target

 #276
20130186751
2013-07-25

Pinned target design for RF capacitive coupled plasma

 #277
20130186744
2013-07-25

Method of switching magnetic flux distribution

 #278
20130153412
2013-06-20

Apparatus for enabling concentricity of plasma dark space

 #279
20130087453
2013-04-11

Method for forming sputter target assemblies having a controlled solder thickness

 #280
20130048494
2013-02-28

SPUTTERING DEVICE

 #281
20130017316
2013-01-17

SPUTTER GUN

 #282
20130008777
2013-01-10

Cylindrical Rotating Magnetron Sputtering Cathode Device and Method of Depositing Material Using Radio Frequency Emissions

 #283
20130001077
2013-01-03

Non-adhesive sputtering structure including a sputtering target and backing plate

 #284
20120305393
2012-12-06

SPUTTER TARGET

 #285
20120285627
2012-11-15

Elastomer Bonded Item and Method for Debonding

 #286
20120255859
2012-10-11

Gadolinium sputtering target and production method of said target

 #287
20120228132
2012-09-13

Sputtering target-backing plate assembly, and its production method

 #288
20120222956
2012-09-06

METHOD AND APPARATUS FOR FORMING A CYLINDRICAL TARGET ASSEMBLY

 #289
20120214793
2012-08-23

Sleep aid composition and method

 #290
20120199469
2012-08-09

PVD sputtering target with a protected backing plate

 #291
20120193218
2012-08-02

Device for supporting a rotatable target and sputtering apparatus

 #292
20120164354
2012-06-28

SPUTTERING APPARATUS AND MANUFACTURING METHOD OF ELECTRONIC DEVICE

 #293
20120160672
2012-06-28

Sputtering apparatus

 #294
20120131784
2012-05-31

PVD target with end of service life detection capability

 #295
20120111270
2012-05-10

PLASMA PROCESSING CHAMBER HAVING ENHANCED DEPOSITION UNIFORMITY

 #296
20120097526
2012-04-26

ROTARY MAGNETRON

 #297
20120067721
2012-03-22

TARGET ASSEMBLY

 #298
20120061238
2012-03-15

Sputtering cathode having a non-bonded semiconducting target

 #299
20120048726
2012-03-01

Methods of sputtering using a non-bonded semiconducting target

 #300
20120048725
2012-03-01

NON-BONDED ROTARY SEMICONDUCTING TARGETS AND METHODS OF THEIR SPUTTERING