Patents-Review.com
ClassID:

205406 ⎘

H01J37/3452 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Constructional aspects of the reactor; Magnet arrangements in particular for cathodic sputtering apparatus Magnet distribution

Recent Application in this class:
#1
20260148947
2026-05-28

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

 #2
20260146315
2026-05-28

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE

 #3
20260043127
2026-02-12

MAGNETRON SPUTTERING APPARATUS

 #4
20260031312
2026-01-29

Beam Plasma Source Enhanced Magnetron Sputtering

 #5
20260015711
2026-01-15

PROCESS TO DEPOSIT QUANTIZED NANO LAYERS BY MAGNETRON SPUTTERING

 #6
20260005004
2026-01-01

METHOD AND APPARATUS FOR METAL AND CERAMIC NANOLAYERING FOR ACCIDENT TOLERANT NUCLEAR FUEL, PARTICLE ACCELERATORS, AND AEROSPACE LEADING EDGES

 #7
20250329521
2025-10-23

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

 #8
20250246419
2025-07-31

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

 #9
20250101572
2025-03-27

MULTICATHODE PVD SYSTEM FOR HIGH ASPECT RATIO BARRIER SEED DEPOSITION

 #10
20250059640
2025-02-20

FILM FORMING APPARATUS AND FILM FORMING METHOD

 #11
20240301546
2024-09-12

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE

 #12
20240290593
2024-08-29

Magnetron design for improved bottom coverage and uniformity

 #13
20240282558
2024-08-22

PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY

 #14
20240274420
2024-08-15

FILM FORMATION METHOD AND FILM FORMATION DEVICE

 #15
20240258087
2024-08-01

CYLINDRICAL CATHODE AND CHAMBER USING SAME FOR SPUTTERING

 #16
20240247365
2024-07-25

Multicathode PVD system for high aspect ratio barrier seed deposition

 #17
20240194464
2024-06-13

STABLE GROUND ANODE FOR THIN FILM PROCESSING

 #18
20240021421
2024-01-18

Vacuum deposition into trenches and vias

 #19
20240014018
2024-01-11

Apparatus and a Method of Controlling Thickness Variation in a Material Layer Formed Using Physical Vapour Deposition

 #20
20230411132
2023-12-21

Semiconductor process apparatus and process chamber

 #21
20230402271
2023-12-14

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

 #22
20230386809
2023-11-30

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

 #23
20230307218
2023-09-28

Physical vapor deposition apparatus and method thereof

 #24
20230282466
2023-09-07

SPUTTER MAGNETRON FOR OPERATING WITH OTHER PLASMA SOURCES

 #25
20230274920
2023-08-31

SYSTEM AND METHOD FOR MAKING THICK-MULTILAYER DIELECTRIC FILMS

 #26
20230260770
2023-08-17

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

 #27
20230141298
2023-05-11

Etch uniformity improvement for single turn internal coil PVD chamber

 #28
20230094699
2023-03-30

Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition

 #29
20230052340
2023-02-16

Movable magnet array for magnetron sputtering

 #30
20230014186
2023-01-19

Methods of and apparatus for magnetron sputtering

 #31
20230005725
2023-01-05

METHOD OF SPUTTER-COATING SUBSTRATES OR OF MANUFACTURING SPUTTER COATED SUBSTRATES AND APPARATUS

 #32
20220406582
2022-12-22

Multifocal magnetron design for physical vapor deposition processing on a single cathode

 #33
20220396865
2022-12-15

SPUTTER DEPOSITION APPARATUS AND METHOD

 #34
20220384164
2022-12-01

Apparatus for generating magnetic fields on substrates during semiconductor processing

 #35
20220380888
2022-12-01

Methods for shaping magnetic fields during semiconductor processing

 #36
20220367161
2022-11-17

Physical vapor deposition apparatus and method thereof

 #37
20220319819
2022-10-06

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

 #38
20220223391
2022-07-14

Sputter target magnet

 #39
20220195585
2022-06-23

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #40
20220178014
2022-06-09

Film forming apparatus and film forming method

 #41
20220106680
2022-04-07

Device for sputtering

 #42
20220068620
2022-03-03

Systems and methods for an improved magnetron electromagnetic assembly

 #43
20220042168
2022-02-10

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #44
20220020577
2022-01-20

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

 #45
20210375603
2021-12-02

Magnetron sputtering source and coating system arrangement

 #46
20210317569
2021-10-14

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like Films

 #47
20210249241
2021-08-12

Magnet unit for magnetron sputtering apparatus

 #48
20210115553
2021-04-22

Sputtering a layer on a substrate using a high-energy density plasma magnetron

 #49
20210115552
2021-04-22

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #50
20210102284
2021-04-08

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #51
20210050196
2021-02-18

Heat-Transfer Roller for Sputtering and Method of Making the Same

 #52
20210050193
2021-02-18

Methods of and apparatus for magnetron sputtering

 #53
20200377995
2020-12-03

Compact system for coupling RF power directly into RF linacs

 #54
20200357616
2020-11-12

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

 #55
20200303173
2020-09-24

HEAT-TRANSFER ROLLER FOR SPUTTERING AND METHOD OF MAKING THE SAME

 #56
20200273684
2020-08-27

Method and apparatus for metal and ceramic nanolayering for accident tolerant nuclear fuel, particle accelerators, and aerospace leading edges

 #57
20200263298
2020-08-20

Apparatus and method for processing, coating or curing a substrate

 #58
20200255935
2020-08-13

Sputtering apparatus

 #59
20200234934
2020-07-23

Interchangeable magnet pack

 #60
20200232088
2020-07-23

APPARATUS AND SYSTEM FOR VACUUM DEPOSITION ON A SUBSTRATE AND METHOD FOR VACUUM DEPOSITION ON A SUBSTRATE

 #61
20200105511
2020-04-02

Physical vapor deposition apparatus and method thereof

 #62
20200090914
2020-03-19

METHODS AND APPARATUS FOR UNIFORMITY CONTROL IN SELECTIVE PLASMA VAPOR DEPOSITION

 #63
20200090913
2020-03-19

Apparatus and a method of controlling thickness variation in a material layer formed using physical vapour deposition

 #64
20200080192
2020-03-12

Sputtering apparatus and method of forming film

 #65
20190378699
2019-12-12

METHODS AND APPARATUS FOR MAGNETRON ASSEMBLIES IN SEMICONDUCTOR PROCESS CHAMBERS

 #66
20190271070
2019-09-05

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

 #67
20190256969
2019-08-22

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #68
20190252166
2019-08-15

SPUTTERING SOURCE

 #69
20190252165
2019-08-15

Film forming system and method for forming film on substrate

 #70
20190249293
2019-08-15

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

 #71
20190244796
2019-08-08

Magnetron, magnetron sputtering chamber, and magnetron sputtering apparatus

 #72
20190244754
2019-08-08

Magnetic thin film deposition chamber and thin film deposition apparatus

 #73
20190203346
2019-07-04

Sputtering cathode, sputtering device, and method for producing film-formed body

 #74
20190180991
2019-06-13

Multifocal magnetron design for physical vapor deposition processing on a single cathode

 #75
20190088456
2019-03-21

Physical vapor deposition chamber with static magnet assembly and methods of sputtering

 #76
20190080891
2019-03-14

COATER

 #77
20190066988
2019-02-28

Sputter target magnet

 #78
20180374688
2018-12-27

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #79
20180371605
2018-12-27

Arc evaporation source

 #80
20180355474
2018-12-13

Film-forming apparatus and film-forming method

 #81
20180308670
2018-10-25

Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition

 #82
20180277343
2018-09-27

APPARATUS CONFIGURED FOR SPUTTER DEPOSITION ON A SUBSTRATE, SYSTEM CONFIGURED FOR SPUTTER DEPOSITION ON A SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON A SUBSTRATE

 #83
20180269043
2018-09-20

MAGNETRON SPUTTERING APPARATUS AND FILM FORMATION METHOD USING MAGNETRON SPUTTERING APPARATUS

 #84
20180261437
2018-09-13

Semiconductor manufacturing apparatus

 #85
20180245212
2018-08-30

Vacuum processing apparatus and method for vacuum processing substrates

 #86
20180240656
2018-08-23

Hybrid Filtered Arc-Magnetron Deposition Method, Apparatus And Applications Thereof

 #87
20180195164
2018-07-12

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #88
20180190477
2018-07-05

MAGNETRON PLATE, MAGNETRON APPARATUS AND MAGNETRON SPUTTERING DEVICE

 #89
20180051368
2018-02-22

High density, low stress amorphous carbon film, and process and equipment for its deposition

 #90
20180030591
2018-02-01

Rotary cathode unit for magnetron sputtering apparatus

 #91
20180023189
2018-01-25

Magnetic-field-generating apparatus for magnetron sputtering

 #92
20180005800
2018-01-04

Film forming apparatus

 #93
20170369985
2017-12-28

Laterally adjustable return path magnet assembly and methods

 #94
20170345628
2017-11-30

Magnetic anode for sputter magnetron cathode

 #95
20170342547
2017-11-30

Sputtering apparatus and sputtering method using the same

 #96
20170253959
2017-09-07

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

 #97
20170178912
2017-06-22

Capacitive coupled plasma source for sputtering and resputtering

 #98
20170178878
2017-06-22

Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source

 #99
20170175251
2017-06-22

Surrounding field sputtering source

 #100
20170175248
2017-06-22

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

 #101
20170167012
2017-06-15

OFF-AXIS MAGNETRON SPUTTERING WITH REAL-TIME REFLECTION HIGH ENERGY ELECTRON DIFFRACTION ANALYSIS

 #102
20170114446
2017-04-27

Apparatus for sputtering and operation method thereof

 #103
20170062192
2017-03-02

FILM FORMING APPARATUS

 #104
20170029941
2017-02-02

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

 #105
20170025258
2017-01-26

DEPOSITION OF THICK MAGNETIZABLE FILMS FOR MAGNETIC DEVICES

 #106
20170011894
2017-01-12

Magnetron and magnetron sputtering device

 #107
20160358763
2016-12-08

Hermetically sealed magnetic keeper cathode

 #108
20160289820
2016-10-06

Rotary magnetron magnet bar and apparatus containing the same for high target utilization

 #109
20160273094
2016-09-22

Magnetic Configuration for a Magnetron Sputter Deposition System

 #110
20160268110
2016-09-15

LINEAR SCANNING SPUTTERING SYSTEM AND METHOD

 #111
20160247902
2016-08-25

MANUFACTURING METHOD OF OXIDE FILM AND SPUTTERING APPARATUS

 #112
20160203961
2016-07-14

Magnetron sputtering apparatus

 #113
20160172168
2016-06-16

Apparatus for PVD dielectric deposition

 #114
20160163521
2016-06-09

Interchangeable magnet pack

 #115
20160133445
2016-05-12

SPUTTERING SYSTEM AND METHOD FOR HIGHLY MAGNETIC MATERIALS

 #116
20160104607
2016-04-14

Method of and magnet assembly for high power pulsed magnetron sputtering

 #117
20160099135
2016-04-07

Rectangular Hollow Sputter Source and Method of use Thereof

 #118
20160047032
2016-02-18

Deposition device and deposition method

 #119
20160035547
2016-02-04

Magnetron assembly for physical vapor deposition chamber

 #120
20160013035
2016-01-14

SYSTEM AND APPARATUS TO FACILITATE PHYSICAL VAPOR DEPOSITION TO MODIFY NON-METAL FILMS ON SEMICONDUCTOR SUBSTRATES

 #121
20150357171
2015-12-10

Methods and apparatus for improved metal ion filtering

 #122
20150311065
2015-10-29

Physical vapor deposition methods and systems to form semiconductor films using counterbalance magnetic field generators

 #123
20150307985
2015-10-29

Rotation plus vibration magnet for magnetron sputtering apparatus

 #124
20150235824
2015-08-20

SPUTTERING SYSTEM AND METHOD FOR HIGHLY MAGNETIC MATERIALS

 #125
20150235823
2015-08-20

Plasma apparatus, magnetic-field controlling method, and semiconductor manufacturing method

 #126
20150187547
2015-07-02

Film deposition device

 #127
20150114835
2015-04-30

FILM FORMING APPARATUS

 #128
20150107992
2015-04-23

Sputtering apparatus and magnet unit

 #129
20150104894
2015-04-16

Light-emitting panel, manufacturing method of light-emitting panel, and film forming system

 #130
20150075982
2015-03-19

Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processes

 #131
20150075981
2015-03-19

ROTATING MAGNETRON SPUTTERING TARGET AND CORRESPONDING MAGNETRON SPUTTERING DEVICE

 #132
20150075970
2015-03-19

PVD plasma control using a magnet edge lift mechanism

 #133
20150027876
2015-01-29

Sputtering system and method of fabricating display device using the same

 #134
20150014158
2015-01-15

Magnetic field generation apparatus and sputtering apparatus

 #135
20140319676
2014-10-30

Electronic component manufacturing method and electrode structure

 #136
20140311893
2014-10-23

Sputtering system and method using direction-dependent scan speed or power

 #137
20140265857
2014-09-18

Apparatus and arrangements of magnetic field generators to facilitate physical vapor deposition to form semiconductor films

 #138
20140262750
2014-09-18

Sputtering devices and methods

 #139
20140246314
2014-09-04

Configurable variable position closed track magnetron

 #140
20140238843
2014-08-28

Variable radius dual magnetron

 #141
20140216923
2014-08-07

PVD RF DC open/closed loop selectable magnetron

 #142
20140183037
2014-07-03

Radio-frequency sputtering system with rotary target for fabricating solar cells

 #143
20140124359
2014-05-08

New Magnet Design Which Improves Erosion Profile for PVD Systems

 #144
20140069802
2014-03-13

APPARATUS AND METHODS FOR PHYSICAL VAPOR DEPOSITION

 #145
20140061029
2014-03-06

Sputtering apparatus

 #146
20140054168
2014-02-27

Apparatus for cylindrical magnetron sputtering

 #147
20140042023
2014-02-13

Magnetron design for extended target life in radio frequency (RF) plasmas

 #148
20130299349
2013-11-14

Magnetic-field-generating apparatus for magnetron sputtering

 #149
20130220547
2013-08-29

Substrate processing apparatus

 #150
20130213797
2013-08-22

Rotation plus vibration magnet for magnetron sputtering apparatus

 #151
20130199924
2013-08-08

Sputtering sources for high-pressure sputtering with large targets and sputtering method

 #152
20130186743
2013-07-25

Magnetron sputtering apparatus and film forming method

 #153
20130180851
2013-07-18

Magnetic field generator, magnetron cathode and spattering apparatus

 #154
20130146453
2013-06-13

Interchangeable magnet pack

 #155
20130146442
2013-06-13

PROFILED SPUTTER TARGET

 #156
20130140522
2013-06-06

Light-emitting panel, manufacturing method of light-emitting panel, and film forming system

 #157
20130112546
2013-05-09

LINEAR SCANNING SPUTTERING SYSTEM AND METHOD

 #158
20130105310
2013-05-02

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

 #159
20130081938
2013-04-04

MAGNETRON SPUTTERING APPARATUS AND METHOD

 #160
20130056348
2013-03-07

VACUUM COATING APPARATUS AND METHOD FOR DEPOSITING NANOCOMPOSITE COATINGS

 #161
20130032469
2013-02-07

Arc PVD plasma source and method of deposition of nanoimplanted coatings

 #162
20130017316
2013-01-17

SPUTTER GUN

 #163
20120273343
2012-11-01

METHOD FOR COATING A SUBSTRATE AND COATER

 #164
20120261253
2012-10-18

Rotary magnetron magnet bar and apparatus containing the same for high target utilization

 #165
20120214793
2012-08-23

Sleep aid composition and method

 #166
20120211352
2012-08-23

Sputtering magnetron assembly

 #167
20120199476
2012-08-09

Production of Nanoparticles

 #168
20120175251
2012-07-12

Sputtering apparatus

 #169
20120160673
2012-06-28

Magnet unit and magnetron sputtering apparatus

 #170
20120152896
2012-06-21

High density plasma etchback process for advanced metallization applications

 #171
20120119861
2012-05-17

Permanent Magnets Array for Planar Magnetron

 #172
20120118732
2012-05-17

FILM FORMATION APPARATUS

 #173
20120111724
2012-05-10

MAGNETIC CIRCUIT FOR SPUTTERING APPARATUS

 #174
20120111270
2012-05-10

PLASMA PROCESSING CHAMBER HAVING ENHANCED DEPOSITION UNIFORMITY

 #175
20120097534
2012-04-26

MAGNETRON SPUTTERING CATHODE AND FILM FORMATION APPARATUS

 #176
20120073965
2012-03-29

Magnet mounting system and magnetron sputtering device having same

 #177
20120073960
2012-03-29

MAGNETRON SPUTTERING APPARATUS AND ELECTRONIC COMPONENT MANUFACTURING METHOD

 #178
20120048724
2012-03-01

Cylindrical Magnetron Sputter Source Utilizing Halbach Magnet Array

 #179
20120027954
2012-02-02

MAGNET FOR PHYSICAL VAPOR DEPOSITION PROCESSES TO PRODUCE THIN FILMS HAVING LOW RESISTIVITY AND NON-UNIFORMITY

 #180
20120012458
2012-01-19

Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system

 #181
20110297537
2011-12-08

Magnet unit and magnetron sputtering apparatus

 #182
20110259733
2011-10-27

Magnetic field control for uniform film thickness distribution in sputter apparatus

 #183
20110247928
2011-10-13

Sputtering apparatus and sputtering method

 #184
20110240468
2011-10-06

Target utilization improvement for rotatable magnetrons

 #185
20110209986
2011-09-01

Sputtering apparatus, sputtering method, and electronic device manufacturing method

 #186
20110198219
2011-08-18

MAGNETRON SPUTTERING DEVICE

 #187
20110186421
2011-08-04

TARGET ASSEMBLY FOR A MAGNETRON SPUTTERING APPARATUS, A MAGNETRON SPUTTERING APPARATUS AND A METHOD OF USING THE MAGNETRON SPUTTERING APPARATUS

 #188
20110180401
2011-07-28

Magnet unit and magnetron sputtering apparatus

 #189
20110127157
2011-06-02

Low impedance plasma

 #190
20110108416
2011-05-12

MAGNETRON SPUTTER

 #191
20110079511
2011-04-07

MAGNET ARRANGEMENT FOR A TARGET BACKING TUBE AND TARGET BACKING TUBE COMPRISING THE SAME

 #192
20110079508
2011-04-07

METHOD FOR COATING A SUBSTRATE AND COATER

 #193
20110056829
2011-03-10

Cathode unit and sputtering apparatus provided with the same

 #194
20110048934
2011-03-03

System and apparatus to facilitate physical vapor deposition to modify non-metal films on semiconductor substrates

 #195
20110048927
2011-03-03

SPUTTERING APPARATUS AND SPUTTERING METHOD

 #196
20110036708
2011-02-17

MAGNETRON SPUTTERING DEVICE

 #197
20110031116
2011-02-10

MAGNETRON SPUTTERING TARGET ASSEMBLY AND COATING APPARATUS HAVING SAME

 #198
20100330856
2010-12-30

Papermaking fabrics with contaminant resistant nanoparticle coating and method of in situ application

 #199
20100252427
2010-10-07

MAGNETRON SPUTTERING TARGET AND MAGNETRON SPUTTERING SYSTEM

 #200
20100252417
2010-10-07

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

 #201
20100230282
2010-09-16

Magnet structure and cathode electrode unit for magnetron sputtering, and magnetron sputtering system

 #202
20100213048
2010-08-26

Magnetron sputtering cathode, magnetron sputtering apparatus, and method of manufacturing magnetic device

 #203
20100206726
2010-08-19

Magnet target and magnetron sputtering apparatus having the same

 #204
20100193354
2010-08-05

MAGNETRON SPUTTERING CATHODE

 #205
20100133089
2010-06-03

Magnetron sputtering apparatus and method for manufacturing thin film

 #206
20100101945
2010-04-29

Magnetron sputtering apparatus

 #207
20100096254
2010-04-22

DEPOSITION SYSTEMS AND METHODS

 #208
20100080928
2010-04-01

Confining Magnets In Sputtering Chamber

 #209
20100078309
2010-04-01

SPUTTERING METHOD AND SPUTTERING APPARATUS

 #210
20100051448
2010-03-04

Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering

 #211
20100044222
2010-02-25

Sputtering target including magnetic field uniformity enhancing sputtering target backing tube

 #212
20100018857
2010-01-28

SPUTTER CATHODE APPARATUS ALLOWING THICK MAGNETIC TARGETS

 #213
20090321248
2009-12-31

LOW DAMAGE SPUTTERING SYSTEM AND METHOD

 #214
20090314631
2009-12-24

Magnetron With Electromagnets And Permanent Magnets

 #215
20090242396
2009-10-01

ADJUSTABLE MAGNET PACK FOR SEMICONDUCTOR WAFER PROCESSING

 #216
20090188790
2009-07-30

CONCENTRIC HOLLOW CATHODE MAGNETRON SPUTTER SOURCE

 #217
20090145743
2009-06-11

Sputtering devices and methods

 #218
20090139853
2009-06-04

Sputtering apparatus and sputtering method

 #219
20090114528
2009-05-07

SPUTTER COATING DEVICE AND COATING METHOD

 #220
20090045047
2009-02-19

Conformal magnetron sputter deposition

 #221
20080210556
2008-09-04

Sputtering apparatus

 #222
20080185285
2008-08-07

DESIGN SUPPORTING METHOD, SYSTEM, AND PROGRAM OF MAGNETRON SPUTTERING APPARATUS

 #223
20080179183
2008-07-31

Offset magnet compensation for non-uniform plasma

 #224
20080121515
2008-05-29

Magnetron sputtering utilizing halbach magnet arrays

 #225
20080110749
2008-05-15

Arc source and magnet configuration

 #226
20080099329
2008-05-01

Position controlled dual magnetron

 #227
20080067063
2008-03-20

Systems and methods for magnetron deposition

 #228
20080047831
2008-02-28

Segmented/modular magnet bars for sputtering target

 #229
20080012460
2008-01-17

Magnetron for cylindrical targets

 #230
20080011600
2008-01-17

Dual hexagonal shaped plasma source

 #231
20070231939
2007-10-04

Manufacturing method of a transparent conductive film, a manufacturing method of a transparent electrode of an organic electroluminescence device, an organic electroluminescence device and the manufacturing method

 #232
20070205096
2007-09-06

Magnetron based wafer processing

 #233
20070175748
2007-08-02

METHOD OF MANUFACTURING AT LEAST ONE SPUTTER-COATED SUBSTRATE AND SPUTTER SOURCE

 #234
20070151841
2007-07-05

Flexible magnetron including partial rolling support and centering pins

 #235
20070131538
2007-06-14

Systems and methods for back-biased face target sputtering

 #236
20070108041
2007-05-17

Magnetron source having increased usage life

 #237
20070095654
2007-05-03

Controlled multi-step magnetron sputtering process

 #238
20060207871
2006-09-21

Sputtering devices and methods

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