Patents-Review.com
ClassID:

205405 ⎘

H01J37/345 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Constructional aspects of the reactor Magnet arrangements in particular for cathodic sputtering apparatus

Sub-classes:
Recent Application in this class:
#1
20260135070
2026-05-14

PHYSICAL VAPOR DEPOSITION APPARATUS

 #2
20260094796
2026-04-02

SUBSTRATE PROCESSING APPARATUS

 #3
20250340976
2025-11-06

CATHODIC ARC SOURCE

 #4
20250323006
2025-10-16

ELECTRON BEAM DEVICE FOR SURFACE TREATMENT

 #5
20250314717
2025-10-09

SYSTEM AND METHOD FOR MEASURING MAGNETIC FIELDS IN PVD SYSTEM

 #6
20250029819
2025-01-23

SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION

 #7
20240347327
2024-10-17

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

 #8
20240194462
2024-06-13

SPUTTERING APPARATUS

 #9
20240120182
2024-04-11

PLACING TABLE AND SUBSTRATE PROCESSING APPARATUS

 #10
20240096609
2024-03-21

Semiconductor processing tool and methods of operation

 #11
20240003993
2024-01-04

SYSTEM AND METHOD FOR MEASURING MAGNETIC FIELDS IN PVD SYSTEM

 #12
20230402271
2023-12-14

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

 #13
20230374654
2023-11-23

IN SITU AND TUNABLE DEPOSITION OF A FILM

 #14
20230352270
2023-11-02

METHOD AND APPARATUS FOR USE IN GENERATING PLASMA

 #15
20230257866
2023-08-17

METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FOR PRODUCING AN OPTICAL ELEMENT, SECONDARY GAS AND PROJECTION EXPOSURE SYSTEM

 #16
20230175113
2023-06-08

PHYSICAL VAPOR DEPOSITION APPARATUS

 #17
20230133160
2023-05-04

Sputtering system with a plurality of cathode assemblies

 #18
20230091273
2023-03-23

Deposition method for tuning magnetic field distribution of deposition equipment

 #19
20230085216
2023-03-16

SPUTTERING APPARATUS AND METHOD FOR THIN FILM ELECTRODE DEPOSITION

 #20
20230032857
2023-02-02

IN SITU AND TUNABLE DEPOSITION OF A FILM

 #21
20230029343
2023-01-26

Sputtering apparatus, film formation method, and method for manufacturing product

 #22
20230005724
2023-01-05

Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source

 #23
20220406582
2022-12-22

Multifocal magnetron design for physical vapor deposition processing on a single cathode

 #24
20220399195
2022-12-15

SPUTTER DEPOSITION

 #25
20220384166
2022-12-01

MAGNETIC-FIELD-DISTRIBUTION TUNER, DEPOSITION EQUIPMENT AND METHOD OF DEPOSITION

 #26
20220307125
2022-09-29

CATHODIC ARC SOURCE

 #27
20220195585
2022-06-23

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #28
20220181129
2022-06-09

MAGNETRON PLASMA APPARATUS

 #29
20220157582
2022-05-19

MAGNET BAR WITH ATTACHED SENSOR

 #30
20220130641
2022-04-28

METHOD OF PRODUCING IONS AND APPARATUS

 #31
20220112593
2022-04-14

Sputtering system with a plurality of cathode assemblies

 #32
20220068620
2022-03-03

Systems and methods for an improved magnetron electromagnetic assembly

 #33
20220068619
2022-03-03

SYSTEMS AND METHODS FOR A MAGNETRON WITH A SEGMENTED TARGET CONFIGURATION

 #34
20220042168
2022-02-10

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #35
20220020577
2022-01-20

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

 #36
20210351022
2021-11-11

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

 #37
20210327691
2021-10-21

HIGH DENSITY PLASMA PROCESSING APPARATUS

 #38
20210317569
2021-10-14

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like Films

 #39
20210175072
2021-06-10

Material deposition systems, and related methods

 #40
20210164099
2021-06-03

High throughput vacuum deposition sources and system

 #41
20210123130
2021-04-29

Method and apparatus for depositing a material

 #42
20210115553
2021-04-22

Sputtering a layer on a substrate using a high-energy density plasma magnetron

 #43
20210115552
2021-04-22

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #44
20210102284
2021-04-08

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #45
20210082674
2021-03-18

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

 #46
20210062325
2021-03-04

Method and chamber for backside physical vapor deposition

 #47
20210050196
2021-02-18

Heat-Transfer Roller for Sputtering and Method of Making the Same

 #48
20210005438
2021-01-07

Sputtering cathode, sputtering cathode assembly, and sputtering apparatus

 #49
20200377992
2020-12-03

Cathode device and sputtering apparatus

 #50
20200357616
2020-11-12

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

 #51
20200303173
2020-09-24

HEAT-TRANSFER ROLLER FOR SPUTTERING AND METHOD OF MAKING THE SAME

 #52
20200279723
2020-09-03

Sputtering system and method

 #53
20200144038
2020-05-07

Film processing method and film manufacturing method

 #54
20200080192
2020-03-12

Sputtering apparatus and method of forming film

 #55
20190271070
2019-09-05

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

 #56
20190256969
2019-08-22

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #57
20190249293
2019-08-15

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

 #58
20190206662
2019-07-04

Film forming unit for sputtering apparatus

 #59
20190203346
2019-07-04

Sputtering cathode, sputtering device, and method for producing film-formed body

 #60
20190194798
2019-06-27

Cathode unit for sputtering apparatus

 #61
20190180991
2019-06-13

Multifocal magnetron design for physical vapor deposition processing on a single cathode

 #62
20190172691
2019-06-06

HEATING CARRIER DEVICE FOR USE ON SPUTTERING CATHODE ASSEMBLY

 #63
20190172690
2019-06-06

Substrate processing apparatus

 #64
20190088456
2019-03-21

Physical vapor deposition chamber with static magnet assembly and methods of sputtering

 #65
20190051327
2019-02-14

Mechanically balanced and magnetically unbalanced device

 #66
20190035612
2019-01-31

SPUTTERING TARGET WITH MICRO CHANNELS

 #67
20180374689
2018-12-27

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

 #68
20180371605
2018-12-27

Arc evaporation source

 #69
20180323048
2018-11-08

Flexible adjustable return path magnet assembly and methods

 #70
20180315584
2018-11-01

Device for producing an amorphous carbon layer by electron cyclotron resonance plasma

 #71
20180245217
2018-08-30

High throughput vacuum deposition sources and system

 #72
20180195164
2018-07-12

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #73
20180127865
2018-05-10

Nanoparticle Deposition Systems

 #74
20180057928
2018-03-01

SPUTTERING APPARATUS

 #75
20180044781
2018-02-15

Pulse shape controller for sputter sources

 #76
20180012738
2018-01-11

MAGNETRON PLASMA APPARATUS

 #77
20180005806
2018-01-04

APPARATUS FOR PHYSICAL VAPOR DEPOSITION REACTIVE PROCESSING OF THIN FILM MATERIALS

 #78
20170369988
2017-12-28

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

 #79
20170369985
2017-12-28

Laterally adjustable return path magnet assembly and methods

 #80
20170345628
2017-11-30

Magnetic anode for sputter magnetron cathode

 #81
20170268122
2017-09-21

Molten target sputtering (MTS) deposition for enhanced kinetic energy and flux of ionized atoms

 #82
20170256386
2017-09-07

Magnetic Spattering Coating Device and Target Device Thereof

 #83
20170253959
2017-09-07

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

 #84
20170211175
2017-07-27

SPUTTER SOURCE FOR SEMICONDUCTOR PROCESS CHAMBERS

 #85
20170207071
2017-07-20

Sputter device with moving target

 #86
20170178912
2017-06-22

Capacitive coupled plasma source for sputtering and resputtering

 #87
20170178875
2017-06-22

INSULATOR TARGET

 #88
20170175253
2017-06-22

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

 #89
20170175248
2017-06-22

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

 #90
20170140906
2017-05-18

Cooling water jet pack for high power rotary cathodes

 #91
20170076922
2017-03-16

Gas Configuration for Magnetron Deposition Systems

 #92
20170047205
2017-02-16

Apparatus and a method for deposition of material to form a coating

 #93
20170029941
2017-02-02

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

 #94
20170029935
2017-02-02

Artificial joint cup, magnetic control sputtering coating film device and preparation method thereof

 #95
20160376695
2016-12-29

Method for monitoring usage of a physical vapor deposition (PVD) target with an ultrasonic transducer

 #96
20160358763
2016-12-08

Hermetically sealed magnetic keeper cathode

 #97
20160326632
2016-11-10

Sputter unit

 #98
20160300700
2016-10-13

Anode Shield

 #99
20160289815
2016-10-06

Method and apparatus for depositing a material

 #100
20160265101
2016-09-15

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

 #101
20160260589
2016-09-08

Film forming apparatus

 #102
20160203961
2016-07-14

Magnetron sputtering apparatus

 #103
20160160343
2016-06-09

Film deposition device

 #104
20160118254
2016-04-28

Oxide and method for forming the same

 #105
20160104607
2016-04-14

Method of and magnet assembly for high power pulsed magnetron sputtering

 #106
20160056026
2016-02-25

PROCESSING APPARATUS

 #107
20160002770
2016-01-07

APPARATUS WITH NEIGHBORING SPUTTER CATHODES AND METHOD OF OPERATION THEREOF

 #108
20150357171
2015-12-10

Methods and apparatus for improved metal ion filtering

 #109
20150311065
2015-10-29

Physical vapor deposition methods and systems to form semiconductor films using counterbalance magnetic field generators

 #110
20150235751
2015-08-20

Magnet unit and magnetron sputtering apparatus

 #111
20150194294
2015-07-09

Method of fine tuning a magnetron sputtering electrode in a rotatable cylindrical magnetron sputtering device

 #112
20150122644
2015-05-07

Arc evaporation source

 #113
20150107992
2015-04-23

Sputtering apparatus and magnet unit

 #114
20150101924
2015-04-16

ASSEMBLY AND METHOD OF COATING AN INTERIOR SURFACE OF AN OBJECT

 #115
20150075970
2015-03-19

PVD plasma control using a magnet edge lift mechanism

 #116
20150048735
2015-02-19

Encapsulated magnetron

 #117
20150027876
2015-01-29

Sputtering system and method of fabricating display device using the same

 #118
20150014158
2015-01-15

Magnetic field generation apparatus and sputtering apparatus

 #119
20140346037
2014-11-27

SPUTTER DEVICE

 #120
20140305795
2014-10-16

Magnetron plasma apparatus

 #121
20140265857
2014-09-18

Apparatus and arrangements of magnetic field generators to facilitate physical vapor deposition to form semiconductor films

 #122
20140262767
2014-09-18

Sputter source for semiconductor process chambers

 #123
20140251799
2014-09-11

Film deposition apparatus with low plasma damage and low processing temperature

 #124
20140246312
2014-09-04

Sputtering apparatus

 #125
20140246310
2014-09-04

Sputtering apparatus

 #126
20140238852
2014-08-28

Cylindrical evaporation source

 #127
20140216923
2014-08-07

PVD RF DC open/closed loop selectable magnetron

 #128
20140184073
2014-07-03

Plasma enhanced chemical vapor deposition (PECVD) source

 #129
20140183037
2014-07-03

Radio-frequency sputtering system with rotary target for fabricating solar cells

 #130
20140158530
2014-06-12

Apparatus for sputtering and a method of fabricating a metallization structure

 #131
20140085024
2014-03-27

Racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering

 #132
20140061029
2014-03-06

Sputtering apparatus

 #133
20130299349
2013-11-14

Magnetic-field-generating apparatus for magnetron sputtering

 #134
20130220547
2013-08-29

Substrate processing apparatus

 #135
20130146444
2013-06-13

Magnetron with gradually increasing magnetic field out of turnarounds

 #136
20130105309
2013-05-02

Magnetron sputtering apparatus

 #137
20130032476
2013-02-07

ROTARY CATHODES FOR MAGNETRON SPUTTERING SYSTEM

 #138
20130032469
2013-02-07

Arc PVD plasma source and method of deposition of nanoimplanted coatings

 #139
20120193227
2012-08-02

MAGNET ARRAY FOR A PHYSICAL VAPOR DEPOSITION SYSTEM

 #140
20120181171
2012-07-19

Nanoparticle Deposition Systems

 #141
20120175251
2012-07-12

Sputtering apparatus

 #142
20120160673
2012-06-28

Magnet unit and magnetron sputtering apparatus

 #143
20120152738
2012-06-21

MAGNETRON ARRANGEMENT WITH A HOLLOW TARGET

 #144
20120152726
2012-06-21

METHOD AND APPARATUS TO PRODUCE HIGH DENSITY OVERCOATS

 #145
20120070589
2012-03-22

CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLASMA DEPOSITION AND RESPUTTERING UNIFORMITY

 #146
20120037493
2012-02-16

Arc evaporation source and film forming method using the same

 #147
20120027954
2012-02-02

MAGNET FOR PHYSICAL VAPOR DEPOSITION PROCESSES TO PRODUCE THIN FILMS HAVING LOW RESISTIVITY AND NON-UNIFORMITY

 #148
20120012458
2012-01-19

Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system

 #149
20120000775
2012-01-05

Apparatus for Forming Electronic Material Layer

 #150
20110311735
2011-12-22

Magnetron design for RF/DC physical vapor deposition

 #151
20110186427
2011-08-04

Cylindrical magnetron having a shunt

 #152
20110168553
2011-07-14

Sputtering system

 #153
20110139612
2011-06-16

Sputtering apparatus

 #154
20100252417
2010-10-07

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

 #155
20100101947
2010-04-29

Arc plasma source

 #156
20100101945
2010-04-29

Magnetron sputtering apparatus

 #157
20090263966
2009-10-22

Apparatus for sputtering and a method of fabricating a metallization structure

 #158
20090166188
2009-07-02

Method for depositing electrically insulating layers

 #159
20080210556
2008-09-04

Sputtering apparatus

 #160
20080110749
2008-05-15

Arc source and magnet configuration

 #161
15714069
2020-10-13

Cathode assemblies and sputtering systems

 #162
15065704
2018-03-06

Apparatus for enhanced physical vapor deposition

 #163
12630940
2017-09-26

Cathode assemblies and sputtering systems