206995 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Cleaning; Cleaning before device manufacture, i.e. Begin-Of-Line process; Dry cleaning only with gaseous HF
METHOD OF MANUFACTURING A MICROSTRUCTURE
#2METHOD OF MANUFACTURING A MICROSTRUCTURE
#3SUBSTRATE CARRIER DETERIORATION DETECTION AND REPAIR
#4INTEGRATED EPITAXY AND PRECLEAN SYSTEM
#5PLASMA ASSISTED DAMAGE ENGINEERING DURING ION IMPLANTATION
#6SUBSTRATE PROCESSING METHOD
#7APPARATUS FOR MANUFACTURING DISPLAY APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS
#8Multi-zone gas distribution systems and methods
#9System with substrate carrier deterioration detection and repair
#10Methods and systems for cleaning high aspect ratio structures
#11MATERIAL LAYER DEPOSITION METHODS, SEMICONDUCTOR PROCESSING SYSTEMS, AND RELATED COMPUTER PROGRAM PRODUCTS
#12In situ generation process and system
#13METHOD OF MANUFACTURING A MICROSTRUCTURE
#14INTEGRATED EPITAXY AND PRECLEAN SYSTEM
#15WAFER SURFACE TREATMENT DEVICE
#16Plasma-based process for production of F and HF from benign precursors and use of the same in room-temperature plasma processing
#17GAS TREATMENT APPARATUS
#18Methods and systems for cleaning high aspect ratio structures
#19Integrated epitaxy and preclean system
#20Low-temperature plasma pre-clean for selective gap fill
#21HYDROGEN FLUORIDE VAPOR PHASE CORROSION APPARATUS AND METHOD
#22Multi-zone gas distribution systems and methods
#23WAFER SURFACE TREATMENT DEVICE AND METHOD THEREOF
#24FILM SURFACE TREATMENT METHOD AND FILM SURFACE TREATMENT DEVICE
#25Substrate carrier deterioration detection and repair
#26Plasma-based process for production of F and HF from benign precursors and use of the same in room-temperature plasma processing
#27Element chip manufacturing method
#28Cleaning method in inspection apparatus, and the inspection apparatus
#29Film forming method and film forming apparatus
#30Plasma-based process for production of F and HF from benign precursors and use of the same in room-temperature plasma processing
#31Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high K at channel
#32Hydrogen fluoride vapor phase corrosion method
#33Method and device for reducing contamination for reliable bond pads
#34Multi-zone gas distribution systems and methods
#35Cleaning method
#36APPARATUS AND METHOD FOR SELECTIVE DEPOSITION
#37Substrate carrier deterioration detection and repair
#38Semiconductor device
#39Epitaxy system integrated with high selectivity oxide removal and high temperature contaminant removal
#40Integrated epitaxy and preclean system
#41Method and apparatus for cleaning semiconductor device structure with gas flow
#42Substrate treatment method and substrate treatment apparatus
#43Naturally oxidized film removing method and naturally oxidized film removing device
#44Cleaning method
#45Method for manufacturing semiconductor device
#46Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high k at channel
#47Apparatus and method for selective deposition
#48Method for removing adhering matter and dry etching method
#49Apparatus and method for selective deposition
#50Substrate cleaning method for removing oxide film
#51Substrate processing apparatus and guide portion
#52Plasma pre-clean module and process
#53Preparing a semiconductor surface for epitaxial deposition
#54Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high K at channel
#55Dry non-plasma treatment system
#56Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium
#57Semiconductor device having structure capable of suppressing oxygen diffusion and method of manufacturing the same
#58Dry-etch for selective tungsten removal
#59Directional SiOetch using plasma pre-treatment and high-temperature etchant deposition
#60Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#61Directional SiOetch using low-temperature etchant deposition and plasma post-treatment
#62Dry non-plasma treatment system and method of using
#63Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
#64Substrate cleaning method and system using atmospheric pressure atomic oxygen
#65METHOD FOR SURFACE TREATMENT OF A WAFER
#66WAFER CLEANING APPARATUS AND WAFER CLEANING METHOD USING THE SAME
#67METHOD FOR MANUFACTURING EPITAXIAL SILICON WAFER
#68SUBSTRATE CLEANING METHOD FOR REMOVING OXIDE FILM
#69Dry non-plasma treatment system and method of using
#70SURFACE TREATMENT APPARATUS AND SURFACE TREATMENT METHOD
#71Method of fabricating a semiconductor device
#72SILICIDE FORMING METHOD AND SYSTEM THEREOF
#73Semiconductor wafer processing method and apparatus
#74Manufacturing method of epitaxial silicon wafer and substrate cleaning apparatus
#75Molecular bonding method with cleaning with hydrofluoric acid in vapor phase and rinsing with deionized water
#76Dry non-plasma treatment system and method of using
#77Method for producing a layer structure
#78Batch processing system and method for performing chemical oxide removal
#79METHOD OF FORMING A SEMICONDUCTOR DEVICE
#80METHOD OF FORMING A SEMICONDUCTOR DEVICE
#81Method of surface processing substrate, method of cleaning substrate, and programs for implementing the methods
#82METHODS FOR FORMING THIN OXIDE LAYERS ON SEMICONDUCTOR WAFERS
#83Scalable gate and storage dielectric
#84Method for manufacturing a semiconductor device
#85Substrate treating apparatus and substrate treating method
#86Cleaning and etching methods and their apparatuses
#87Multiple grow-etch cyclic surface treatment for substrate preparation
#88HF vapor phase cleaning and oxide etching
#89Semiconductor manufacturing method and associated semiconductor manufacturing system