206993 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Cleaning Cleaning before device manufacture, i.e. Begin-Of-Line process
Sub-classes:SUBSTRATE PROCESSING SYSTEM
#2A METHOD OF CLEANING A SEMICONDUCTOR SUBSTRATE FOR A SOLAR CELL, AND A CORRESPONDING CLEANING SYSTEM
#3EPITAXIAL WAFER AND A METHOD FOR MANUFACTURING AN EPITAXIAL WAFER
#4SUBSTRATE CARRIER DETERIORATION DETECTION AND REPAIR
#5SYSTEM AND METHOD FOR RING FRAME CLEANING AND INSPECTION
#6STACKED WAFER STRUCTURE AND METHOD FOR FORMING THE SAME
#7TREATMENTS TO ENHANCE MATERIAL STRUCTURES
#8WAFER SEPARATION APPARATUS AND METHOD, AND METHOD FOR MANUFACTURING SILICON WAFER
#9METHODS AND APPARATUS FOR PRECLEANING AND TREATING WAFER SURFACES
#10Shutter disk
#11System and method for ring frame cleaning and inspection
#12Post-CMP cleaning and apparatus
#13METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH PRE-CLEANING TREATMENT
#14System with substrate carrier deterioration detection and repair
#15Device Having Cleaning Bodies
#16ENHANCED PROCESS FOR QUBIT FABRICATION
#17METHODS AND APPARATUS FOR MINIMIZING VOIDS FOR CHIP ON WAFER COMPONENTS
#18METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT
#19Stacked wafer structure and method for forming the same
#20Methods for aluminum oxide surface recovery
#21Treatments to enhance material structures
#22Cleaning Compositions
#23Treatments to enhance material structures
#24Post-CMP cleaning and apparatus
#25Conformal high concentration boron doping of semiconductors
#26Cleaning compositions
#27Shutter disk
#28Gate-last ferroelectric field effect transistor and manufacturing method thereof
#29Methods and apparatus for aluminum oxide surface recovery
#30Methods and apparatus for precleaning and treating wafer surfaces
#31System and method for ring frame cleaning and inspection
#32Substrate carrier deterioration detection and repair
#33Treatments to enhance material structures
#34Method of cleaning substrate processing apparatus, and substrate processing system
#35Shutter disk
#36Group III-V compound semiconductor substrate and group III-V compound semiconductor substrate with epitaxial layer
#37SYSTEMS AND METHODS FOR TREATING SUBSTRATES WITH CRYOGENIC FLUID MIXTURES
#38METHOD FOR MANUFACTURING SiC EPITAXIAL WAFER
#39Cleaning compositions
#40Device modified substrate article and methods for making
#41In-situ integrated chambers
#42Semiconductor substrate manufacturing method
#43Group III-V compound semiconductor substrate and group III-V compound semiconductor substrate with epitaxial layer
#44Conformal high concentration boron doping of semiconductors
#45System and method for ring frame cleaning and inspection
#46Computer storage medium to perform a substrate treatment method using a block copolymer containing a hydrophilic and hydrophobic copolymers
#47Cleaning compositions
#48Cutting apparatus
#49Post-CMP cleaning and apparatus
#50Method for producing an epitaxial layer on a growth plate
#51Method of enhancing a DLC coated surface for enhanced multipaction resistance
#52Substrate carrier deterioration detection and repair
#53Method and apparatus for surface preparation prior to epitaxial deposition
#54Systems and methods for treating substrates with cryogenic fluid mixtures
#55SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#56Manufacture method of AMOLED pixel drive circuit
#57Substrate processing apparatus, substrate processing method and recording medium
#58Binary metal oxide based interlayer for high mobility channels
#59Methods for titanium silicide formation using TiClprecursor and silicon-containing precursor
#60Semiconductor devices and FinFETs
#61Apparatus and method of treating surface of semiconductor substrate
#62Binary metal oxide based interlayer for high mobility channels
#63Binary metal oxide based interlayer for high mobility channels
#64Binary metal oxide based interlayer for high mobility channels
#65VACUUM PLATFORM WITH PROCESS CHAMBERS FOR REMOVING CARBON CONTAMINANTS AND SURFACE OXIDE FROM SEMICONDUCTOR SUBSTRATES
#66Apparatus for spraying cryogenic fluids
#67Methods for chemical etching of silicon
#68Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers
#69Device modified substrate article and methods for making
#70Wafer back-side polishing system and method for integrated circuit device manufacturing processes
#71Post-CMP cleaning and apparatus
#72Methods and apparatus for in-situ cleaning of copper surfaces and deposition and removal of self-assembled monolayers
#73AUTOMATIC CONTROL OF SPRAY BAR AND UNITS FOR CHEMICAL MECHANICAL POLISHING IN-SITU BRUSH CLEANING
#74Substrate treatment system, substrate transfer method and computer storage medium
#75Substrate treatment system, substrate transfer method and computer storage medium
#76Systems and methods for treating substrates with cryogenic fluid mixtures
#77Array substrate manufactured by reduced times of patterning processes manufacturing method thereof and display apparatus
#78Method for pretreatment of base substrate and method for manufacturing layered body using pretreated base substrate
#79Semiconductor devices and FinFETS
#80Systems and methods for treating substrates with cryogenic fluid mixtures
#81Systems and methods for treating substrates with cryogenic fluid mixtures
#82Systems and methods for treating substrates with cryogenic fluid mixtures
#83Systems and methods for treating substrates with cryogenic fluid mixtures
#84Apparatus and method for depositing electronically conductive pasting material
#85Apparatus and method of treating surface of semiconductor substrate
#86Methods for forming a molecular dopant monolayer on a substrate
#87Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, recording medium, and cleaning completion determining method
#88METHOD FOR REDUCING DEFECTS IN POLYSILICON LAYERS
#89Method for producing nanocarbon film and nanocarbon film
#90Methods of forming semiconductor devices and FinFETs
#91Polishing method and polishing apparatus
#92Method of removing oxide from substrate and method of manufacturing semiconductor device using the same
#93Manufacturing method of low temperature polycrystalline silicon thin film and manufacturing method of thin film transistor
#94COMPOSITION FOR CLEANING FLAT PANEL DISPLAY AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME
#95Method for manufacturing bonded wafer
#96Methods for forming semiconductor materials in STI trenches
#97Substrate processing apparatus, substrate transfer method and storage medium
#98Substrate treatment system, substrate transfer method and computer storage medium
#99Plasma treatment method, plasma treatment apparatus, and semiconductor device manufacturing method
#100Methods for reducing the metal content in the device layer of SOI structures and SOI structures produced by such methods
#101METHOD OF CLEANING SILICON CARBIDE SEMICONDUCTOR, SILICON CARBIDE SEMICONDUCTOR, AND SILICON CARBIDE SEMICONDUCTOR DEVICE
#102Photolytic processing of materials with hydrogen
#103APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE
#104METHOD FOR MANUFACTURING SYSTEM-IN-PACKAGE
#105Apparatus and method for depositing electrically conductive pasting material
#106Apparatus and method for removing photoresist from a substrate
#107Method of manufacturing a semiconductor device and wet processing apparatus
#108Method of processing a substrate
#109Manufacture of ultra-clean surfaces by selective
#110Method for manufacturing SOI wafer
#111Method of processing a substrate
#112Wafer processing method
#113Method of depositing a diffusion barrier for copper interconnect applications