206999 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Cleaning; Cleaning during device manufacture during, before or after processing of insulating layers
Sub-classes:CLEANING SLURRY FOR SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#2SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD
#3SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#4METHODS OF FABRICATING HIGH-K GATE STRUCTURES
#5METHOD FOR SELECTIVELY REMOVING PREDETERMINED PART OF SELECTED ELEMENT IN SEMICONDUCTOR STRUCTURE
#6VOLUME-LESS FLUORINE INCORPORATION METHOD
#7COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS
#8SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD
#9ETCHING METHOD AND ETCHING APPARATUS
#10AREA SELECTIVE DEPOSITION
#11ELECTROCHEMICAL REDUCTION OF SURFACE METAL OXIDES
#12SEMICONDUCTOR DEVICE
#13PLASMA-ASSISTED ETCHING OF METAL OXIDES
#14MICROWAVE APPARATUS FOR DUAL MODE OPERATION AND METHODS OF USE
#15FIELD EFFECT TRANSISTORS WITH DUAL SILICIDE CONTACT STRUCTURES
#16CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME
#17APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES
#18FABRICATION OF FIELD EFFECT TRANSISTORS WITH FERROELECTRIC MATERIALS
#19SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#20ETCHING COMPOSITIONS
#21CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS
#22METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#23METHOD FOR PRODUCING THIN FILM, THIN FILM, AND SUBSTRATE PROCESSING APPARATUS
#24SEMICONDUCTOR WAFER WITH DEVICES HAVING DIFFERENT TOP LAYER THICKNESSES
#25GROWTH OF THIN OXIDE LAYER IN VERTICAL CHANNEL STRUCTURE
#26CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME
#27Fabrication and processing of graphene electronic devices on Silicon with a SiO2 passivation layer
#28METHODS FOR PROTECTING A PERIPHERAL EDGE AND BACKSIDE OF A SEMICONDUCTOR SUBSTRATE
#29SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#30METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#31Formation Of Gate All Around Device
#32SUBSTRATE TREATING METHOD AND TREATMENT LIQUID EVALUATING METHOD
#33SEMICONDUCTOR PATTERN STRUCTURE PRESERVATION
#34METHODS OF FORMING A BILAYER HARDMASK AND ASSOCIATED DEPOSITION METHODS USING A BILAYER HARDMASK
#35BATH SYSTEMS AND METHODS THEREOF
#36METHOD FOR TREATING SUBSTRATE USING BORON COMPOUND
#37METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY
#38SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
#39COATING FILM FORMING METHOD, COATING FILM FORMING APPARATUS, AND STORAGE MEDIUM
#40CONFORMAL BORON DOPING METHOD FOR THREE-DIMENSIONAL STRUCTURE AND USE THEREOF
#41METHODS FOR WET ATOMIC LAYER ETCHING OF MOLYBDENUM
#42METHOD FOR REDUCING CHARGING OF SEMICONDUCTOR WAFERS
#43SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#44SUBSTRATE PROCESSING METHOD
#45CHEMICAL-RESISTANT PROTECTIVE FILM-FORMING COMPOSITION HAVING CATECHOL GROUP
#46METHOD FOR ADJUSTING LINEWIDTH DUE TO PATTERN LOAD EFFECT IN SADP MANDREL ETCHING
#47SELECTIVE ETCH USING FLUOROCARBON-BASED DEPOSITION OF A METALLOID OR METAL
#48HALOGEN-FREE MOLYBDENUM-CONTAINING PRECURSORS FOR DEPOSITION OF MOLYBDENUM
#49METAL OXIDE PRECLEAN FOR BOTTOM-UP GAPFILL IN MEOL AND BEOL
#50PROCESSING SOLUTION FOR SEMICONDUCTOR DEVICE, METHOD FOR PROCESSING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#51WET CLEANING METHOD
#52COMPOSITION, COMPOUND, RESIN, SUBSTRATE TREATMENT METHOD, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
#53SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING
#54CLEANING LIQUID, METHOD OF CLEANING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR ELEMENT
#55TREATMENTS TO ENHANCE MATERIAL STRUCTURES
#56CLEANING CHAMBER FOR METAL OXIDE REMOVAL
#57Semiconductor Processing Using a Two-Dimensional Polymer
#58COMPOSITIONS FOR REMOVING PHOTORESISTS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR PACKAGES USING THE COMPOSITIONS
#59APPARATUS AND METHOD FOR MANUFACTURING METAL GATE STRUCTURES
#60SYSTEMS AND METHODS FOR NANOHOLE WET CLEANS
#61SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#62METHODS OF FABRICATING A MULTIANALYTE DETECTION DEVICE AND DEVICES THEREOF
#63CLEANING SOLUTION AND METHOD OF CLEANING WAFER
#64PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
#65PROTECTIVE FILM, PROTECTIVE FILM AGENT, AND METHOD OF PROCESSING WORKPIECE
#66METHOD FOR FORMING THERMAL OXIDE FILM ON SEMICONDUCTOR SUBSTRATE AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
#67METHOD OF FORMING HIGH VOLTAGE TRANSISTOR AND STRUCTURE RESULTING THEREFROM
#68SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#69METHODS FOR SELECTIVELY FORMING A DIELECTRIC LAYER ON A METALLIC SURFACE RELATIVE TO A DIELECTRIC SURFACE
#70CLEANING COMPOSITION, CLEANING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR
#71Metal oxide interlayer structure for NFET and PFET
#72APPARATUS FOR CLEANING PROCESS AND METHOD FOR CLEANING PROCESS
#73SEMICONDUCTOR DEVICE
#74Semiconductor wafer with devices having different top layer thicknesses
#75SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE
#76METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND FORMING PHOTORESIST PATTERN
#77COMPOSITION FOR SEMICONDUCTOR PROCESSING AND PROCESSING METHOD
#78SEMICONDUCTOR CLEANING USING PLASMA-FREE PRECURSORS
#79CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL
#80Surface Treatment Compositions and Methods
#81FIELD EFFECT TRANSISTORS WITH DUAL SILICIDE CONTACT STRUCTURES
#82SEMICONDUCTOR WAFER CLEANING APPARATUS
#83SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#84METHODS OF SEPARATING SEMICONDUCTOR DIES
#85Volume-less Fluorine Incorporation Method
#86SUBSTRATE MODIFICATION FOR SUPERLATTICE CRITICAL THICKNESS IMPROVEMENT
#87GAS MIXTURE INCLUDING HYDROGEN FLUORIDE, ALCOHOL AND AN ADDITIVE FOR PREVENTING STICTION OF AND/OR REPAIRING HIGH ASPECT RATIO STRUCTURES
#88METHOD FOR SELECTIVELY REMOVING PREDETERMINED PART OF SELECTED ELEMENT IN SEMICONDUCTOR STRUCTURE
#89Semiconductor devices and methods of manufacturing
#90ETCHING METHOD AND ETCHING APPARATUS
#91Hard mask trimming in method for manufacturing semiconductor device
#92SUBSTRATE PROCESSING METHOD, COMPONENT PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS
#93SELF-ASSEMBLED MONOLAYER REMOVING LIQUID, AND SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS USING THE SAME
#94WET CLEANING TOOL AND METHOD
#95PLASMA-ACTIVATED LIQUIDS
#96Methods for selective removal of surface oxides on metal films
#97CATIONIC ELEMENTS-ASSISTED DIRECT BONDING METHOD
#98Plasma-Assisted Etching Of Metal Oxides
#99Method for reducing charging of semiconductor wafers
#100In-situ CMP self-assembled monolayer for enhancing metal-dielectric adhesion and preventing metal diffusion
#101Bath systems and methods thereof
#102SEMICONDUCTOR DEVICE
#103RINSE PROCESS AFTER FORMING FIN-SHAPED STRUCTURE
#104SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#105SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
#106POINT-OF-USE BLENDING OF RINSE SOLUTIONS FOR EUV PROCESSING TO MITIGATE PATTERN COLLAPSE
#107Metal-compound-removing solvent and method in lithography
#108Method for fabricating semiconductor device and reworking process
#109Surface Treatment Compositions and Methods
#110Method of processing a wafer
#111Substrate processing method and substrate processing system
#112SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES AND SURFACE TREATMENT AGENT COMPOSITION
#113SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES AND SURFACE TREATMENT AGENT COMPOSITION
#114Composition Comprising a Siloxane and an Alkane for Avoiding Pattern Collapse When Treating Patterned Materials with Line-Space Dimensions of 50 NM or Below
#115DEVICES HAVING A TRANSISTOR WITH A MODIFIED CHANNEL REGION
#116WAFER TRANSFER METHOD AND WAFER TRANSFER APPARATUS
#117PROCESS SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY AND PATTERN FORMING METHOD USING SAME
#118Semiconductor device and manufacturing method thereof
#119Metal oxide interlayer structure for nFET and pFET
#120CLEANING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS
#121Coating film forming method, coating film forming apparatus, and storage medium
#122SELECTIVE FILM FORMATION METHOD
#123Methods and systems for cleaning high aspect ratio structures
#124Semiconductor structure and manufacturing method thereof
#125HARD MASK LIFTOFF PROCESSES
#126ETCHING METHOD, SEMICONDUCTOR MANUFACTURING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#127Substrate processing method and substrate processing apparatus
#128METHOD OF MANUFACTURING INTEGRATED CIRCUIT USING ETCHING PROCESS
#129Low-cost method of making a hard mask for high resolution and low dimensional variations for the fabrication and manufacturing of micro- and nano-devices and -systems
#130CLEANING METHOD OF ELECTRONIC COMPONENT AND MANUFACTURING METHOD OF ELEMENT CHIP
#131Cleaning formulation for removing residues on surfaces
#132Method of manufacturing semiconductor package
#133SUBSTRATE PROCESSING APPARATUS, CLEANING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#134Substrate processing apparatus, substrate processing method and a semiconductor device manufacturing method
#135Cleaning formulation for removing residues on surfaces
#136Cleaning chamber for metal oxide removal
#137Manufacturing method for semiconductor silicon wafer
#138Method of forming a pattern
#139METHOD AND SYSTEM FOR REMOVING L-FC IN PLASMA ETCHING PROCESS
#140Method for etching substrates comprising a thin surface layer, for improving the uniformity of thickness of the layer
#141TURNAROUND MECHANISM OF SILICON WAFERS
#142Device for conveying and dispersing silicon wafers
#143Device for degumming and inserting silicon wafers and method for processing silicon wafers
#144Substrate processing method and substrate processing system
#145Bath systems and methods thereof
#146PATTERNING SCHEME TO IMPROVE EUV RESIST AND HARD MASK SELECTIVITY
#147CLEANING SOLUTION AND METHOD OF CLEANING WAFER
#148Compositions for removing photoresists and methods of manufacturing semiconductor devices and semiconductor packages using the compositions
#149Semiconductor method and device
#150Method and structure of middle layer removal
#151Semiconductor structure and fabrication method thereof, and peripheral circuit
#152Semiconductor Device and Method
#153Substrate processing method and substrate processing apparatus
#154Substrate Processing Apparatus, Non-transitory Computer-readable Recording Medium, Substrate Processing Method and Method of Manufacturing Semiconductor Device
#155Method for reducing charging of semiconductor wafers
#156Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device
#157THERMAL ATOMIC LAYER ETCH WITH RAPID TEMPERATURE CYCLING
#158Semiconductor wafer with devices having different top layer thicknesses
#159SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY MEDIUM
#160CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
#161Method and apparatus for cleaning semiconductor wafer
#162Substrate processing method and substrate processing apparatus
#163Substrate processing method, component processing method, and substrate processing apparatus
#164Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device
#165Storage container storing treatment liquid for manufacturing semiconductor
#166PLASMA-ASSISTED ETCHING OF METAL OXIDES
#167Substrate pattern filling composition and use of the same
#168Method of forming a semiconductor device
#169APPARATUS AND METHOD FOR SUPPLYING PROCESSING LIQUID
#170Field effect transistors with dual silicide contact structures
#171Method for Fabricating a Semiconductor Device
#172Metal gate using monolayers
#173Substrate treatment method and substrate treatment apparatus
#174Semiconductor structure
#175Cleaning formulation for removing residues on surfaces
#176Method and system for foreline deposition diagnostics and control
#177FORMATION OF GATE ALL AROUND DEVICE
#178Method for manufacturing electronic device
#179In-situ CMP self-assembled monolayer for enhancing metal-dielectric adhesion and preventing metal diffusion
#180Substrate processing method
#181Operating method of etching device
#182Method for preparing semiconductor sample with etched pit suitable for microscope observation
#183Contaminant detection tools including nebulizer and related methods
#184Apparatus and method for manufacturing metal gate structures
#185Method for manufacturing bit line structure, method for manufacturing semiconductor structure, and semiconductor structure
#186Metal oxide interlayer structure for nFET and pFET
#187Process for producing a semiconductor component based on a III-N compound
#188Plasma-assisted etching of metal oxides
#189ETCHANT COMPOSITION
#190Process liquid for extreme ultraviolet lithography and pattern forming method using same
#191Intermediate raw material, and polishing composition and composition for surface treatment using the same
#192Method for making semiconductor device including a superlattice and providing reduced gate leakage
#193Surface Smoothing of Workpieces
#194Gas mixture including hydrogen fluoride, alcohol and an additive for preventing stiction of and/or repairing high aspect ratio structures
#195SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#196Semiconductor device and manufacturing method thereof
#197Substrate processing method and plasma processing apparatus
#198SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#199METHOD FOR PROCESSING SEMICONDUCTOR STRUCTURE
#200Semiconductor wafer with devices having different top layer thicknesses
#201Method of manufacturing semiconductor device
#202Substrate processing method and substrate processing apparatus
#203Fabrication of Field Effect Transistors With Ferroelectric Materials
#204Semiconductor device and method for fabricating the same
#205Substrate processing method and substrate processing apparatus
#206Semiconductor structure and manufacturing method thereof
#207Selective oxidation and simplified pre-clean
#208Semiconductor devices and methods of manufacturing
#209Semiconductor wafer cleaning apparatus
#210Semiconductor device and method of manufacturing the same
#211Freezing a sacrificial material in forming a semiconductor
#212Methods for ALD of Metal Oxides on Metal Surfaces
#213Systems and Methods for Removal of Hardmask
#214Field effect transistors with dual silicide contact structures
#215Pattern formation method and method for manufacturing a semiconductor device
#216Substrate processing apparatus and substrate processing method
#217Method and apparatus for cleaning semiconductor wafer
#218Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
#219Semiconductor devices and methods of manufacturing
#220Semiconductor device
#221Method for forming a semiconductor structure including plasma cleaning operations
#222Thermal atomic layer etch with rapid temperature cycling
#223Metal-compound-removing solvent and method in lithography
#224Semiconductor method and device
#225Contaminant detection tools and related methods
#226Metal oxide interlayer structure for nFET and pFET
#227Non-volatile memory with gate all around thin film transistor and method of manufacturing the same
#228Silicon oxide selective dry etch process
#229METHODS AND APPARATUS FOR CLEANING METAL CONTACTS
#230Method for detecting ultra-small defect on wafer surface
#231TREATMENTS TO ENHANCE MATERIAL STRUCTURES
#232Cleaning solution for removing dry etching residue and method for manufacturing semiconductor substrate using same
#233Method for fabricating a semiconductor device
#234Etching method, semiconductor manufacturing apparatus, and method of manufacturing semiconductor device
#235PROTECTIVE FLUID FOR ALUMINA, PROTECTION METHOD, AND PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE HAVING ALUMINA LAYER USING SAME
#236Fabrication of field effect transistors with ferroelectric materials
#237Treatment system and method
#238Three-dimensional memory device and fabricating method thereof
#239Wafer treatment for achieving defect-free self-assembled monolayers
#240Substrate cleaning method, substrate cleaning system, and memory medium
#241Semiconductor device
#242Integrated circuit device with ion doped regions that provide dopant ions to gate dielectric film
#243Cleaning formulation for removing residues on surfaces
#244Capacitance reduction in a semiconductor device
#245Semiconductor structure and manufacturing method thereof
#246Laminate of aluminum nitride single-crystal substrate
#247High dielectric constant dielectric layer forming method, image sensor device, and manufacturing method thereof
#248Structure and formation method of semiconductor device with metal gate stack
#249Method of forming semiconductor structure
#250Cleaning solution and method of cleaning wafer
#251Point-of-use blending of rinse solutions to mitigate pattern collapse
#252Gap filling composition and pattern forming method using composition containing polymer
#253Semiconductor device and method
#254Solution, method of forming resist pattern, and semiconductor device manufacturing method
#255Method and structure of middle layer removal
#256Method of removing an etch mask
#257PRODUCTION OF SEMICONDUCTOR REGIONS IN AN ELECTRONIC CHIP
#258Semiconductor manufacturing apparatus and manufacturing method of semiconductor device
#259Substrate processing method and substrate processing apparatus
#260Simultaneous hydrophilization of photoresist and metal surface preparation: methods, systems, and products
#261Method of forming film on substrate and method of manufacturing liquid ejection head
#262Etchant composition and method of fabricating semiconductor device
#263Method for forming a fin-based semiconductor structure
#264Surface smoothing of workpieces
#265METHODS OF CLEANING AN OXIDE LAYER IN A FILM STACK TO ELIMINATE ARCING DURING DOWNSTREAM PROCESSING
#266ETCHING DEVICE AND OPERATING METHOD THEREOF
#267METHOD FOR FABRICATING INTERCONNECT OF SEMICONDUCTOR DEVICE
#268Method for cleaning silicon wafer
#269Metal gate using monolayers
#270Treatment system and method
#271Substrate processing apparatus
#272Method for fabricating semiconductor device
#273Pattern formation method and method for manufacturing a semiconductor device
#274High dielectric constant dielectric layer forming method, image sensor device, and manufacturing method thereof
#275Semiconductor structure and method for preparing the same
#276Method for forming channel hole in three-dimensional memory device using nonconformal sacrificial layer
#277Systems and methods for hafnium-containing film removal
#278Fin field effect transistor (FinFET) device with controlled end-to-end critical dimension and method for forming the same
#279Wet clean solutions to prevent pattern collapse
#280Etching method
#281Semiconductor device and method
#282Approach to prevent collapse of high aspect ratio Fin structures for vertical transport Fin field effect transistor devices
#283In-situ integrated chambers
#284Method for making a well disposed over a sensor
#285Semiconductor method and device
#286Morphology of resist mask prior to etching
#287Selective deposition on silicon containing surfaces
#288Gate spacer and method of forming
#289Method and structure of middle layer removal
#290VFET devices with ILD protection
#291Cleaning formulation for removing residues on surfaces
#292Semiconductor device and method
#293Semiconductor structure and manufacturing method thereof
#294Substrate processing apparatus and substrate processing method
#295Post-lithography defect inspection using an e-beam inspection tool
#296Methods for manufacturing an interconnect structure for semiconductor devices
#297Pre-cleaning for etching of dielectric materials
#298Semiconductor wafer processing method
#299Selective deposition method for forming semiconductor structure
#300Method for cleaning semiconductor wafer and manufacturing method of semiconductor wafer using the method for cleaning