H01L21/02093 - CPC Classification Index

ClassID:

207011 ⎘

H01L21/02093 - CPC Classification

Classification description:

Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Cleaning product to be cleaned Cleaning of porous materials

Recent Application in this class:

20160230016

Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same

20150187670

Semiconductor device, method for manufacturing the same, and rinsing liquid

20150004797

Method of stripping organic mask with reduced damage to low-K film

20120272999

Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same

20080118995

Method and composition for restoring dielectric properties of porous dielectric materials

20050191861

Using supercritical fluids and/or dense fluids in semiconductor applications