207007 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Cleaning product to be cleaned
Sub-classes:SUBSTRATE TREATING METHOD
#2METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE
#3Ramped Spin-Dry on Semiconductor Wafer
#4Composition for removing polymer
#5METHOD FOR CLEANING SUBSTRATE AND CLEANING DEVICE
#6Methods for stripping and cleaning semiconductor structures
#7CARRIER BOAT FOR DIE PACKAGE FLUX CLEANING
#8Cleaning sheet, manufacturing method of semiconductor device and manufacturing method of cleaning sheet
#9Multi-wafer deposition tool for reducing residual deposition on transfer blades and methods of operating the same
#10Composition for removing polymer
#11CLEANING DEVICE
#12Substrate processing apparatus and substrate processing method
#13METHODS AND APPARATUS FOR CLEANING METAL CONTACTS
#14System and method of cleaning mesa sidewalls of a template
#15Method for cleaning quartz epitaxial chambers
#16Method for cleaning substrate and cleaning device
#17Substrate processing method and substrate processing apparatus
#18LAMINAR FLOW DEVICE
#19PERC solar cell capable of improving photoelectric conversion efficiency and preparation method thereof
#20Pellicle adhesive residue removal system and methods
#21Method of manufacturing semiconductor device by etching and washing
#22Method for removing organic cured film on substrate, and acidic cleaning liquid
#23Determination method and substrate processing equipment
#24Cleaning apparatus and cleaning method of substrate processing apparatus
#25SYSTEMS AND METHODS FOR PLASMA-LESS DE-HALOGENATION
#26Substrate processing device which performs processing on substrate
#27Method of growing high quality, thick SiC epitaxial films by eliminating silicon gas phase nucleation and suppressing parasitic deposition
#28Drying high aspect ratio features
#29Method for processing a semiconductor region and an electronic device
#30Sealing composition and method of manufacturing semiconductor device
#31Method for Cleaning Hermetic Semiconductor Packages
#32Method for cleaning lanthanum gallium silicate wafer
#33UV cleaning device of glass substrate
#34Substrate processing method
#35Particle removal with minimal etching of silicon-germanium
#36Liquid chemical for forming protecting film
#37Systems and methods for treating substrates with cryogenic fluid mixtures
#38Substrate processing method and substrate processing apparatus
#39Systems and methods for drying high aspect ratio structures without collapse using stimuli-responsive sacrificial bracing material
#40Method of cleaning substrate processing apparatus
#41METHODS FOR CLEANING SEMICONDUCTOR SUBSTRATES
#42Pretreatment method for reduction and/or elimination of basal plane dislocations close to epilayer/substrate interface in growth of SiC epitaxial films
#43Pretreatment method for reduction and/or elimination of basal plane dislocations close to epilayer/substrate interface in growth of SiC epitaxial films
#44Wafer surface conditioning for stability in fab environment
#45Method of collapse-free drying of high aspect ratio structures
#46Method of growing high quality, thick SiC epitaxial films by eliminating silicon gas phase nucleation and suppressing parasitic deposition
#47Rinse liquid for insulating film and method of rinsing insulating film
#48Cleaning composition and cleaning method using the same
#49SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
#50Apparatus and method for inspecting defect in object surface
#51Pretreatment method for reduction and/or elimination of basal plane dislocations close to epilayer/substrate interface in growth of SiC epitaxial films
#52Method of cleaning substrate processing apparatus
#53Liquid chemical for forming protecting film
#544H-POLYTYPE GALLIUM NITRIDE-BASED SEMICONDUCTOR DEVICE ON A 4H-POLYTYPE SUBSTRATE
#55SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#56Apparatus and method for inspecting defect on object surface
#57Method of removing graphitic and/or fluorinated organic layers from the surface of a chip passivation layer having Si-containing compounds
#58Method for cleaning substrate having exposed silicon and silicon germanium layers and related method for fabricating semiconductor device
#594H-polytype gallium nitride-based semiconductor device on a 4H-polytype substrate
#60Plasma etching chamber and plasma etching system using same