ClassID:

207034

H01L21/02258 - CPC Classification

Classification description:

Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Forming layers; Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by anodic treatment, e.g. anodic oxidation

Recent Application in this class:
#1
20250213162
2025-07-03

ENCAPSULATED FLEXIBLE ELECTRONICS FOR LONG-TERM IMPLANTATION

#2
20240371629
2024-11-07

SURFACE PROCESSING METHOD OF SEMICONDUCTOR WAFER

#3
20240213018
2024-06-27

METHOD OF MANUFACTURING AN INTEGRATED DEVICE COMPISING ANODIC POROUS OXIDE WITH LIMITED ROUGHNESS

#4
20230223301
2023-07-13

METHOD OF REMOVING BARRIER LAYER

#5
20230197440
2023-06-22

DEVICE COMPRISING AN ANODIC POROUS REGION SURROUNDED BY A TRENCH HAVING AN ELECTRICAL ISOLATION BARRIER, AND CORRESPONDING METHOD

#6
20230103690
2023-04-06

Long-term implantable electronic devices

#7
20220384185
2022-12-01

SURFACE PROCESSING APPARATUS AND SURFACE PROCESSING METHOD FOR SiC SUBSTRATE

#8
20220352048
2022-11-03

Method of Manufacturing Semiconductor Chips having a Side Wall Sealing

#9
20220310613
2022-09-29

Memory device and method for manufacturing the same

#10
20220310581
2022-09-29

Memory device having multiple chips and method for manufacturing the same

#11
20220246745
2022-08-04

Silicon Carbide Devices, Semiconductor Devices and Methods for Forming Silicon Carbide Devices and Semiconductor Devices

#12
20210305230
2021-09-30

Memory device having multiple chips and method for manufacturing the same

#13
20210066449
2021-03-04

Porous region structure and method of manufacture thereof

#14
20200350185
2020-11-05

Semiconductor fabrication with electrochemical apparatus

#15
20200249188
2020-08-06

Semiconductor device having a porous metal oxide film and a semiconductor substrate with a connection electrically connected to the porous metal oxide film

#16
20200176580
2020-06-04

Silicon carbide devices, semiconductor devices and methods for forming silicon carbide devices and semiconductor devices

#17
20200161420
2020-05-21

Systems and methods for forming nanowires using anodic oxidation

#18
20200091199
2020-03-19

Thin film transistor and method of fabricating the same, array substrate and method of fabricating the same, display device

#19
20200066554
2020-02-27

Semiconductor fabrication with electrochemical apparatus

#20
20200051988
2020-02-13

Antifuse array and method of forming antifuse using anodic oxidation

#21
20200022601
2020-01-23

Encapsulated flexible electronics for long-term implantation

#22
20190096709
2019-03-28

Semiconductor fabrication with electrochemical apparatus

#23
20190074212
2019-03-07

Semiconductor device and semiconductor wafer including a porous layer and method of manufacturing

#24
20190006396
2019-01-03

Method for manufacturing thin film transistor, method for manufacturing array substrate, array substrate and display device

#25
20180254414
2018-09-06

Method of manufacturing a memory device

#26
20180219019
2018-08-02

Antifuse array and method of forming antifuse using anodic oxidation

#27
20180182869
2018-06-28

THIN FILM TRANSISTOR AND METHOD OF FABRICATING THE SAME

#28
20180090601
2018-03-29

Thin-film transistor (TFT) and manufacturing method thereof

#29
20180047614
2018-02-15

Thermally stable charge trapping layer for use in manufacture of semiconductor-on-insulator structures

#30
20170316953
2017-11-02

Method for fabricating a metal oxide thin film transistor

#31
20170263719
2017-09-14

METHOD OF MANUFACTURING A SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR STRUCTURE

#32
20170186905
2017-06-29

Heterostructure including anodic aluminum oxide layer

#33
20170117383
2017-04-27

METHOD FOR FORMING A SEMICONDUCTOR DEVICE

#34
20170104094
2017-04-13

III-N material structure for gate-recessed transistors

#35
20160343606
2016-11-24

Air gap forming techniques based on anodic alumina for interconnect structures

#36
20160268144
2016-09-15

Capacitor formed in insulated pores of an anodized metal layer

#37
20160247993
2016-08-25

Light-emitting device substrate, light-emitting device, and method for producing light-emitting device substrate

#38
20160203977
2016-07-14

Semiconductor arrangement including buried anodic oxide and manufacturing method

#39
20160099131
2016-04-07

Workpiece processing method

#40
20160049296
2016-02-18

Method for forming a semiconductor device

#41
20150380303
2015-12-31

Conductive element structure and method

#42
20150279846
2015-10-01

Antifuse array and method of forming antifuse using anodic oxidation

#43
20150279724
2015-10-01

Air gap forming techniques based on anodic alumina for interconnect structures

#44
20150194383
2015-07-09

Air gap forming techniques based on anodic alumina for interconnect structures

#45
20150162418
2015-06-11

Method for forming a semiconductor device having insulating parts or layers formed via anodic oxidation

#46
20150162411
2015-06-11

METHOD OF MANUFACTURING A SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR STRUCTURE

#47
20150162192
2015-06-11

Method for forming a semiconductor device

#48
20140319529
2014-10-30

Anti-diffusion layer, preparation method thereof, thin-film transistor (TFT), array substrate, display device

#49
20140251817
2014-09-11

Passivation scheme for solar cells

#50
20130126870
2013-05-23

Thin Film Transistor, Array Substrate, Device and Manufacturing Method

#51
20120322249
2012-12-20

MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE

#52
20120119375
2012-05-17

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

#53
20110124203
2011-05-26

Method of forming a gate insulator in group III-V nitride semiconductor devices

#54
20110086507
2011-04-14

Method for providing oxide layers

#55
20110068339
2011-03-24

Semiconductor device including transistors with silicided impurity regions

#56
20100227197
2010-09-09

Complex oxide film and method for producing same, composite body and method for producing same, dielectric material, piezoelectric material, capacitor, piezoelectric element and electronic device

#57
20100129977
2010-05-27

Integrated circuit with capacitor and method for the production thereof

#58
20100079929
2010-04-01

CMOS COMPATIBLE INTEGRATED HIGH DENSITY CAPACITOR STRUCTURE AND PROCESS SEQUENCE

#59
20100078329
2010-04-01

OPTICALLY MONITORING AN ALOX FABRICATION PROCESS

#60
20090289254
2009-11-26

Semiconductor device including transistors with silicided impurity regions

#61
20090269914
2009-10-29

PROCESS FOR FORMING A DIELECTRIC ON A COPPER-CONTAINING METALLIZATION AND CAPACITOR ARRANGEMENT

#62
20090255820
2009-10-15

Method for electrochemically structuring a conductive or semiconductor material, and device for implementing it

#63
20090117720
2009-05-07

Strained semiconductor-on-insulator by Si:C combined with porous process

#64
20080152941
2008-06-26

Microstructure and method of manufacturing the same

#65
20080143015
2008-06-19

Method of fabricating porous aluminum oxide mold having sub-micron structure and methods of imprinting to make LEDS using the mold

#66
20080124522
2008-05-29

Electronic circuit board and its manufacturing method

#67
20070235342
2007-10-11

Method for manufacturing nanostructure

#68
20070234947
2007-10-11

Method for controlling at nanometric scale the growth of thin films of conjugated organic molecules

#69
20070173073
2007-07-26

Porous silicon dielectric

#70
20070117413
2007-05-24

Process for the production of a nitrogenous layer a semiconductor or metal surface

#71
20070096223
2007-05-03

Transistor having dielectric stressor elements for applying in-plane shear stress

#72
20060267074
2006-11-30

Method for fabricating semiconductor device and semiconductor device

#73
20060254921
2006-11-16

Anodization process and layers produced therefrom

#74
20060252240
2006-11-09

Process for forming a dielectric on a copper-containing metallization and capacitor arrangement

#75
20060216532
2006-09-28

METHODS AND APPARATUS FOR DEVICES HAVING IMPROVED CAPACITANCE

#76
20060214265
2006-09-28

Integrated circuit with capacitor and method for the production thereof

#77
20060196024
2006-09-07

METHODS AND APPARATUS FOR DEVICES HAVING IMPROVED CAPACITANCE

#78
20060141751
2006-06-29

Method for making a silicon dioxide layer on a silicon substrate by anodic oxidation

#79
20060121700
2006-06-08

Method of forming a gate insulator in group III-V nitride semiconductor devices

#80
20050153489
2005-07-14

Semiconductor device and method for manufacturing the same

#81
20050142705
2005-06-30

Semiconductor device and method for manufacturing the same

#82
20050126920
2005-06-16

Method and apparatus for electrochemical processing

#83
20050077183
2005-04-14

Anodic oxidation apparatus

#84
20050037592
2005-02-17

Devices having improved capacitance and methods of their fabrication

#85
16006786
2019-07-02

Anodic aluminum oxide as hard mask for plasma etching

#86
15900762
2019-12-31

Covalent chemical surface modification of surfaces with available silicon or nitrogen