207028 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Forming layers; Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
Sub-classes:METHODS FOR WET ATOMIC LAYER ETCHING OF TRANSITION METAL OXIDE DIELECTRIC MATERIALS
#2METHOD OF MANUFACTURING LEAD FRAME
#3Semiconductor Device and Method of Forming MEMS Super-Junction Metal Oxide Semiconductor Using Epitaxial Layer
#4Semiconductor Device and Method of Forming MEMS Super-Junction Metal Oxide Semiconductor Using Vapor Phase Deposition
#5Integrated circuit device with source/drain barrier
#6BENZYL COMPOUND PASSIVATION FOR SELECTIVE DEPOSITION AND SELECTIVE ETCH PROTECTION
#7Methods for filling a gap feature on a substrate surface and related semiconductor structures
#8Sintered body, substrate, circuit board, and manufacturing method of sintered boy
#9METHOD FOR FORMING CONTACT SURFACE ON TOP OF MESA STRUCTURE FORMED ON SEMICONDUCTOR SUBSTRATE
#10Molecular doping
#11INSULATION PLATE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
#12Integrated circuit device with source/drain barrier
#13Fin Field-Effect Transistor device and method of forming the same
#14Method and apparatus for forming substrate surfaces with exposed crystal lattice using accelerated neutral atom beam
#15Methods for filling a gap feature on a substrate surface and related semiconductor structures
#16Structure body, sensor, and method for producing structure body
#17Integrated circuit device with source/drain barrier
#18Thiourea organic compound for gallium arsenide based optoelectronics surface passivation
#19Sintered body, substrate, circuit board, and manufacturing method of sintered body
#20Fin field-effect transistor device and method of forming the same
#21Method of treating semiconductor substrate
#22Epitaxy-free nanowire cell process for the manufacture of photovoltaics
#23Critical dimension correction via calibrated trim dosing
#24Uniform gate dielectric for DRAM device
#25Semiconductor device and manufacture method of the same
#26Integrated circuit device with source/drain barrier
#27Electronic device packages with attenuated electromagnetic interference signals
#28Fin Field-Effect Transistor device and method of forming the same
#29METHOD FOR OBTAINING A GRAPHENE-BASED FET, IN PARTICULAR A MEMORY FET, EQUIPPED WITH AN EMBEDDED DIELECTRIC ELEMENT MADE BY FLUORINATION
#30Graphene as interlayer dielectric
#31Thiourea organic compound for gallium arsenide based optoelectronics surface passivation
#32Method for ultra-shallow etching using neutral beam processing based on gas cluster ion beam technology
#33Deposition of charge trapping layers
#34Method for forming semiconductor structure
#35Methods of forming nanostructures using self-assembled nucleic acids, and nanostructures thereof
#36Titanium compound based hard mask films
#37Graphene fluorination for integration of graphene with insulators and devices
#38Methods of forming nanostructures using self-assembled nucleic acids, and nanostructures thereof
#39Graphene wiring structure and manufacturing method thereof
#40Surface passivation on indium-based materials
#41Nitridation on HDP oxide before high-k deposition to prevent oxygen ingress
#42Method for repairing an oxide layer and method for manufacturing a semiconductor structure applying the same
#43Semiconductor substrate, eletronic device and method for manufacturing the same
#44Homoepitaxial tunnel barriers with functionalized graphene-on-graphene and methods of making
#45NONVOLATILE MEMORY DEVICE USING SEMICONDUCTOR NANOCRYSTALS AND METHOD OF FORMING SAME
#46Device isolation in FinFET CMOS
#47Method of manufacturing thin film transistor
#48Dummy fin formation by gas cluster ion beam
#49Self-assembled monolayer for pattern formation
#50Nonvolatile semiconductor memory device and method for manufacturing same
#51Hydroxyl group termination for nucleation of a dielectric metallic oxide
#52ANGLED GAS CLUSTER ION BEAM
#53THIN FILM DEVICE, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING DISPLAY
#54METHOD AND APPARATUS FOR FORMING DIELECTRIC FILM OF LOW-DIELECTRIC CONSTANT AND METHOD FOR DETACHING POROGEN
#55Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
#56Pre-cut wafer applied underfill film
#57Semiconductor substrate, electronic device and method for manufacturing the same
#58SILICON OXYCARBIDE, GROWTH METHOD OF SILICON OXYCARBIDE LAYER, SEMICONDUCTOR DEVICE AND MANUFACTURE METHOD FOR SEMICONDUCTOR DEVICE
#59Nonvolatile semiconductor memory device and method for manufacturing same
#60Nonvolative memory device using semiconductor nanocrystals and method of forming same
#61Nonvolatile memory device using semiconductor nanocrystals and method of forming same
#62Ultra-thin film formation using gas cluster ion beam processing
#63Method of fabricating a gate dielectric for high-k metal gate devices
#64Nonvolatile memory device using semiconductor nanocrystals and method forming same
#65METHOD OF MANUFACTURING LIGHT-EMITTING ELEMENT, LIGHT-EMITTING ELEMENT, LIGHT-EMITTING DEVICE AND ELECTRONIC APPARATUS
#66Method of forming a nonvolatile memory device using semiconductor nanoparticles
#67Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
#68Integrated circuit device with source/drain barrier
#69Three-dimensional memory device with aluminum-containing etch stop layer for backside contact structure and method of making thereof
#70Semiconducting graphene structures, methods of forming such structures and semiconductor devices including such structures