ClassID:

207059

H01L21/02387 - CPC Classification

Classification description:

Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Forming layers; Forming inorganic semiconducting materials on a substrate; Substrates; Materials Group 13/15 materials

Recent Application in this class:
#1
20240429049
2024-12-26

PLANARIZATION OF ROUGH SURFACES

#2
20240332012
2024-10-03

METHOD FOR MANUFACTURING SIC SUBSTRATE

#3
20240234556
2024-07-11

N-TYPE 2D TRANSITION METAL DICHALCOGENIDE (TMD) TRANSISTOR

#4
20240136429
2024-04-25

N-TYPE 2D TRANSITION METAL DICHALCOGENIDE (TMD) TRANSISTOR

#5
20230369038
2023-11-16

Methods of forming SOI substrates

#6
20230352302
2023-11-02

Optimized heteroepitaxial growth of semiconductors

#7
20230154747
2023-05-18

A SEED LAYER, A HETEROSTRUCTURE COMPRISING THE SEED LAYER AND A METHOD OF FORMING A LAYER OF MATERIAL USING THE SEED LAYER

#8
20230148397
2023-05-11

Optimized heteroepitaxial growth of semiconductors

#9
20230139650
2023-05-04

Optimized thick heteroepitaxial growth of semiconductors with in-situ substrate pretreatment

#10
20230137113
2023-05-04

Optimized thick heteroepitaxial growth of semiconductors with in-situ substrate pretreatment

#11
20230100277
2023-03-30

Optimized Heteroepitaxial Growth of Semiconductors

#12
20230095501
2023-03-30

Optimized heteroepitaxial growth of semiconductors

#13
20230090724
2023-03-23

Optimized heteroepitaxial growth of semiconductors

#14
20230033788
2023-02-02

Optimized heteroepitaxial growth of semiconductors

#15
20220285154
2022-09-08

Method for manufacturing diamond substrate

#16
20220108883
2022-04-07

METHOD FOR FLATTENING A SURFACE ON AN EPITAXIAL LATERAL GROWTH LAYER

#17
20210111021
2021-04-15

Method of forming a semiconductor device structure

#18
20210090876
2021-03-25

Methods of forming SOI substrates

#19
20210072731
2021-03-11

Device and method for obtaining information about layers deposited in a CVD method

#20
20200357642
2020-11-12

Method for manufacturing semiconductor device

#21
20200258986
2020-08-13

High percentage silicon germanium graded buffer layers with lattice matched Ga(As-P) interlayers

#22
20200118816
2020-04-16

Method for printing wide bandgap semiconductor materials

#23
20200083042
2020-03-12

Fabrication of semiconductor substrates

#24
20190088466
2019-03-21

Methods of forming SOI substrates

#25
20190035954
2019-01-31

Semiconductor stacked body, light-receiving element, and method for producing semiconductor stacked body

#26
20180351037
2018-12-06

Optoelectronic device comprising three-dimensional semiconductor structures in an axial configuration

#27
20180151356
2018-05-31

Semiconductor device having high-κ dielectric layer and method for manufacturing the same

#28
20180144935
2018-05-24

Method for formation of a transition metal dichalcogenide (TMDC) material layer

#29
20180061772
2018-03-01

Semiconductor lithography alignment feature with epitaxy blocker

#30
20180033610
2018-02-01

CVD silicon monolayer formation method and gate oxide ALD formation on semiconductor materials

#31
20180025911
2018-01-25

Monolithic integration of semiconductor materials

#32
20180012812
2018-01-11

Heterogeneous integration of 3D SI and III-V vertical nanowire structures for mixed signal circuits fabrication

#33
20170213729
2017-07-27

Hybrid multilayer device

#34
20170179232
2017-06-22

III-V TRANSISTOR DEVICE WITH DOPED BOTTOM BARRIER

#35
20170069490
2017-03-09

ATOMIC LAYER DEPOSITION OF GERMANIUM OR GERMANIUM OXIDE

#36
20170058425
2017-03-02

Method for producing group III nitride semiconductor single crystal

#37
20170040159
2017-02-09

Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALD

#38
20160365477
2016-12-15

Method of making a semiconductor device

#39
20160351742
2016-12-01

Semiconductor layered structure, method for producing semiconductor layered structure, and method for producing semiconductor device

#40
20160293774
2016-10-06

Nonplanar III-N transistors with compositionally graded semiconductor channels

#41
20160190030
2016-06-30

Self-limiting chemical vapor deposition and atomic layer deposition methods

#42
20160141391
2016-05-19

Method for reducing contact resistance in MOS

#43
20160126094
2016-05-05

Lattice matched aspect ratio trapping to reduce defects in III-V layer directly grown on silicon

#44
20160086800
2016-03-24

Tunneling field effect transistors and transistor circuitry employing same

#45
20160064284
2016-03-03

Method for fabricating a semiconductor structure

#46
20150371868
2015-12-24

Method for fabricating vertically stacked nanowires for semiconductor applications

#47
20150364637
2015-12-17

Na dosing control method

#48
20150325682
2015-11-12

Planar semiconductor growth on III-V material

#49
20150303058
2015-10-22

CVD silicon monolayer formation method and gate oxide ALD formation on III-V materials

#50
20150170914
2015-06-18

Sulfur-containing thin films

#51
20150162182
2015-06-11

Self-limiting chemical vapor deposition and atomic layer deposition methods

#52
20150155165
2015-06-04

METHOD OF PRODUCING COMPOSITE WAFER AND COMPOSITE WAFER

#53
20150064859
2015-03-05

Nonplanar III-N transistors with compositionally graded semiconductor channels

#54
20150044859
2015-02-12

Compound semiconductor integrated circuit and method to fabricate same

#55
20150041856
2015-02-12

Compound semiconductor integrated circuit and method to fabricate same

#56
20140370690
2014-12-18

Quantum dots made using phosphine

#57
20140217468
2014-08-07

Planar semiconductor growth on III-V material

#58
20140077151
2014-03-20

Optoelectric device with semiconductor microwires or nanowires and method for manufacturing the same

#59
20130112140
2013-05-09

Apparatus for growth of dilute-nitride materials using an isotope for enhancing the sensitivity of resonant nuclear reaction analysis

#60
20130071999
2013-03-21

High throughput epitaxial lift off for flexible electronics

#61
20120326122
2012-12-27

Epitaxial wafer, photodiode, optical sensor device, and methods for producing epitaxial wafer and photodiode

#62
20120199814
2012-08-09

Silicon-based tunneling field effect transistors and transistor circuitry employing same

#63
20120018703
2012-01-26

OPTOELECTRONIC SEMICONDUCTOR COMPONENT AND METHOD FOR THE MANUFACTURE THEREOF

#64
20110266520
2011-11-03

Superlattice structure and method for making the same

#65
20110156098
2011-06-30

Semiconductor device and method of fabrication

#66
20110129949
2011-06-02

Method for growth of dilute-nitride materials using an isotope for enhancing the sensitivity of resonant nuclear reation analysis

#67
20100327316
2010-12-30

Method for manufacturing an III-V engineered substrate and the III-V engineered substrate thereof

#68
20100184278
2010-07-22

Method for epitaxial growth

#69
20100184273
2010-07-22

Group III nitride compound semiconductor device

#70
20100163848
2010-07-01

Buffer structure for semiconductor device and methods of fabrication

#71
20100148174
2010-06-17

GaN Epitaxial Wafer and Semiconductor Devices, and Method of Manufacturing GaN Epitaxial Wafer and Semiconductor Devices

#72
20090184398
2009-07-23

Group III nitride compound semiconductor device

#73
20090085055
2009-04-02

Method for Growing an Epitaxial Layer

#74
20090053864
2009-02-26

METHOD FOR FABRICATING A SEMICONDUCTOR STRUCTURE HAVING HETEROGENEOUS CRYSTALLINE ORIENTATIONS

#75
20090034571
2009-02-05

Migration enhanced epitaxy fabrication of active regions having quantum wells

#76
20080315370
2008-12-25

Fabrication of optical-quality facets vertical to a (001) orientation substrate by selective epitaxial growth

#77
20080272377
2008-11-06

Gallium Nitride Substrate and Gallium Nitride Film Deposition Method

#78
20080242061
2008-10-02

Precursor gas mixture for depositing an epitaxial carbon-doped silicon film

#79
20080194067
2008-08-14

Fabrication of optical-quality facets vertical to a (001) orientation substrate by selective epitaxial growth

#80
20080142926
2008-06-19

Directionally controlled growth of nanowhiskers

#81
20080116488
2008-05-22

Transistor structure and manufacturing method thereof

#82
20060246700
2006-11-02

Migration enhanced epitaxy fabrication of active regions having quantum wells

#83
20060166418
2006-07-27

Method of fabricating semiconductor device

#84
20060019470
2006-01-26

Directionally controlled growth of nanowhiskers

#85
20050239274
2005-10-27

Method for growth of group III-V semiconductor material on a dielectric

#86
20050124105
2005-06-09

Semiconductor device and method of manufacturing the same

#87
17094878
2024-07-23

Optimized thick heteroepitaxial growth of semiconductors with in-situ substrate pretreatment