207102 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Forming layers; Forming inorganic semiconducting materials on a substrate; Formation types; Deposition types Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
FIN PATTERNING FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#2Integrated CMOS Source Drain Formation With Advanced Control
#3METHODS OF EPITAXIALLY GROWING BORON-CONTAINING STRUCTURES
#4Memory Arrays, and Methods of Forming Memory Arrays
#5PATTERN REPLICATION TECHNIQUES FOR CONDUCTIVE INTERCONNECTS USING SELECTIVE DEPOSITION
#6MULTILAYER ISOLATION STRUCTURE FOR HIGH VOLTAGE SILICON-ON-INSULATOR DEVICE
#7Source/Drain EPI Structure For Device Boost
#8Deposition Equipment with Adjustable Temperature Source
#9MANUFACTURING METHOD FOR HYBRID SOI SUBSTRATE
#10METHODS OF FORMING SEMICONDUCTOR DEVICE
#11IN SITU REMOVABLE BLOCKING LAYER FORMATION
#12METHOD FOR DEPOSITING BORON AND GALLIUM CONTAINING SILICON GERMANIUM LAYERS
#13INTEGRATED ASSEMBLIES AND METHODS OF FORMING INTEGRATED ASSEMBLIES
#14VERTICAL MEMORY DEVICES
#15TRENCH CONTACT STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#16SELECTIVE FEATURE MODIFICATION USING DIRECTIONAL DEPOSITION
#17METHOD TO SUPPRESS BASE POLY LINKUP OVERGROWTH INTO THE EMITTER CAVITY DURING SILICON GERMANIUM SELECTIVE EPITAXY GROWTH
#18APPARATUS, SYSTEMS, AND METHODS OF USING ATOMIC HYDROGEN RADICALS WITH SELECTIVE EPITAXIAL DEPOSITION
#19EPITAXIAL SOURCE OR DRAIN STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#20METHOD, SYSTEM AND APPARATUS FOR FORMING ANISOTROPIC LAYER
#21METHOD FOR SEMICONDUCTOR PROCESSING
#22PLUGS FOR INTERCONNECT LINES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#23APPARATUS, SYSTEMS, AND METHODS OF USING ATOMIC HYDROGEN RADICALS WITH SELECTIVE EPITAXIAL DEPOSITION
#24HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#25MANUFACTURING METHOD FOR HYBRID SOI SUBSTRATE
#26MEMORY ARRAYS AND METHODS USED IN FORMING A MEMORY ARRAY COMPRISING STRINGS OF MEMORY CELLS
#27CONTACT OVER ACTIVE GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#28SEMICONDUCTOR DEVICE
#29MULTI-LAYER SOLID-STATE DEVICES AND METHODS FOR FORMING THE SAME
#30SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
#31Devices Having a Semiconductor Material That Is Semimetal in Bulk and Methods of Forming the Same
#32System and Method for Semiconductor Structure
#33VERTICAL MEMORY STUCTURE WITH AIR GAPS AND METHOD FOR PREPARING THE SAME
#34GATE CUT AND FIN TRIM ISOLATION FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#35Deposition Equipment with Adjustable Temperature Source
#36SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE
#37METHODS OF FORMING SEMICONDUCTOR DEVICE
#38METHOD OF FORMING AN EPITAXIAL LAYER
#39DUAL METAL GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#40Trench contact structures for advanced integrated circuit structure fabrication
#41VERTICAL SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
#42Semiconductor device having doped epitaxial region and its methods of fabrication
#43METHOD FOR FABRICATING A STRAINED STRUCTURE AND STRUCTURE FORMED
#44CLEANING PROCESS FOR SOURCE/DRAIN EPITAXIAL STRUCTURES
#45METHOD OF SELECTIVELY FORMING PHOSPHOROUS-DOPED EPITAXIAL MATERIAL ON A SURFACE
#46Integrated assemblies and methods of forming integrated assemblies
#47Vertical memory structure with air gaps and method for preparing the same
#48HETEROGENEOUS METAL LINE COMPOSITIONS FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#49FINFET DEVICES
#50Vertical memory devices
#51Gate cut and fin trim isolation for advanced integrated circuit structure fabrication
#52Semiconductor device
#53EPITAXIAL STRUCTURES FOR FIN-LIKE FIELD EFFECT TRANSISTORS
#54SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
#55FINFET DEVICE HAVING FLAT-TOP EPITAXIAL FEATURES AND METHOD OF MAKING THE SAME
#56Semiconductor device, method of manufacturing the same and electronic device including the device
#57SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF AND MEMORY
#58MULTILAYER ISOLATION STRUCTURE FOR HIGH VOLTAGE SILICON-ON-INSULATOR DEVICE
#59INTEGRATED CIRCUITS HAVING SOURCE/DRAIN STRUCTURE AND METHOD OF MAKING
#60SEMICONDUCTOR DEVICE WITH CAP ELEMENT
#61Trench contact structures for advanced integrated circuit structure fabrication
#62METHODS OF EPITAXIALLY GROWING BORON-CONTAINING STRUCTURES
#63TRENCH ISOLATION FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#64Semiconductor devices
#65SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS
#66RF GROUNDING CONFIGURATION FOR PEDESTALS
#67MEMS SENSOR AND METHOD OF MANUFACTURING MEMS SENSOR
#68Contact over active gate structures for advanced integrated circuit structure fabrication
#69GATE LINE PLUG STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#70FIN PATTERNING FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#71Hybrid scheme for improved performance for P-type and N-type FinFETs
#72Heterogeneous metal line compositions for advanced integrated circuit structure fabrication
#73Semiconductor device and manufacturing method of a semiconductor device
#74SAG nanowire growth with ion implantation
#75Deposition equipment with adjustable temperature source
#76Three-dimensional memory device having pocket structure in memory string and method for forming the same
#77Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
#78EPITAXIAL SOURCE OR DRAIN STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION
#79Plugs for interconnect lines for advanced integrated circuit structure fabrication
#80Integrated assemblies and methods of forming integrated assemblies
#81Vertical semiconductor device and method for fabricating the same
#82Semiconductor device having spacer residue
#83Semiconductor structure
#84Methods for GAA I/O formation by selective epi regrowth
#85METHOD FOR DEPOSITING A GROUP IV SEMICONDUCTOR AND RELATED SEMICONDUCTOR DEVICE STRUCTURES
#86Selective methods for fabricating devices and structures
#87SOURCE/DRAIN EPI STRUCTURE FOR DEVICE BOOST
#88FinFET device having flat-top epitaxial features and method of making the same
#89Vertical storage device, method of manufacturing the same, and electronic apparatus including storage device
#90Integrated circuits having source/drain structure and method of making
#91Devices having a semiconductor material that is semimetal in bulk and methods of forming the same
#92Gate cut and fin trim isolation for advanced integrated circuit structure fabrication
#93Vertical memory devices
#94Semiconductor device and methods of forming the same
#95Integrated CMOS Source Drain Formation With Advanced Control
#96Integrated assemblies comprising conductive levels having two different metal-containing structures laterally adjacent one another, and methods of forming integrated assemblies
#97Memory Arrays, and Methods of Forming Memory Arrays
#98Three-dimensional semiconductor memory device
#99Compact and efficient CMOS inverter
#100Method for fabricating a strained structure and structure formed
#101Semiconductor device
#102Method for fabricating memory device
#103Semiconductor devices and manufacturing methods of the same
#104Cleaning process for source/drain epitaxial structures
#105Semiconductor devices
#106APPARATUS, SYSTEMS, AND METHODS OF USING ATOMIC HYDROGEN RADICALS WITH SELECTIVE EPITAXIAL DEPOSITION
#107Method of fabricating semiconductor device
#108Selective Deposition of Germanium
#109Semiconductor devices and methods of manufacturing the same
#110Method for preparing vertical memory structure with air gaps
#111Gate spacer patterning
#112Semiconductor device and apparatus of manufacturing the same
#113Method for fabricating memory device
#114Memory arrays and methods used in forming a memory array comprising strings of memory cells
#115Memory arrays and methods used in forming a memory array comprising strings of memory cells
#116Semiconductor device
#117Manufacturing method of gallium oxide thin film for power semiconductor using dopant activation technology
#118Source/drain EPI structure for device boost
#119Device, a method used in forming a circuit structure, a method used in forming an array of elevationally-extending transistors and a circuit structure adjacent thereto
#120Fabrication method for a 3-dimensional NOR memory array
#121Multilayer isolation structure for high voltage silicon-on-insulator device
#122Structure of 3D NAND memory device and method of forming the same
#123FinFET devices
#124Vertical transistor fabrication for memory applications
#125Method for manufacturing a semiconductor device
#126Integrated assemblies and methods of forming integrated assemblies
#127SAG nanowire growth with ion implantation
#128METHOD FOR DEPOSITING BORON AND GALLIUM CONTAINING SILICON GERMANIUM LAYERS
#129Semiconductor device
#130Selective deposition of silicon using deposition-treat-etch process
#131METHODS FOR FORMING A GERMANIUM ISLAND USING SELECTIVE EPITAXIAL GROWTH AND A SACRIFICIAL FILLING LAYER
#132Integrated circuitry, memory arrays comprising strings of memory cells, methods used in forming integrated circuitry, and methods used in forming a memory array comprising strings of memory cells
#133Memory device and method of fabricating the same
#134Vertical memory structure with air gaps and method for preparing the same
#135Compact and efficient CMOS inverter
#136Embedded memory using SOI structures and methods
#137Method for filling recessed features in semiconductor devices with a low-resistivity metal
#138Epitaxial structures for fin-like field effect transistors
#139Epitaxial monocrystalline channel for storage transistors in 3-dimensional memory structures and methods for formation thereof
#140Semiconductor device having cap layer
#141Memory arrays and methods used in forming a memory array comprising strings of memory cells and operative through-array-vias
#142Trench contact structures for advanced integrated circuit structure fabrication
#143Fin cut and fin trim isolation for advanced integrated circuit structure fabrication
#144Method for FinFET LDD doping
#145Semiconductor device including physical unclonable function
#146Three dimensional memory device and method for fabricating the same
#147Contact over active gate structures for advanced integrated circuit structure fabrication
#148Gate line plug structures for advanced integrated circuit structure fabrication
#149Semiconductor epitaxy bordering isolation structure
#150Memory device and method for fabricating the same
#151Memory device and method for fabricating the same
#152Semiconductor structures and methods of forming thereof
#153Vapor phase epitaxy method
#154Semiconductor device having doped epitaxial region and its methods of fabrication
#155Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
#156Integrated assemblies, and methods of forming integrated assemblies
#157Semiconductor device
#158Trench isolation for advanced integrated circuit structure fabrication
#159Semiconductor structure formation
#160Word line architecture for three dimensional NAND flash memory
#161Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
#162Methods for GAA I/O formation by selective epi regrowth
#163Vertical memory devices
#164Three-dimensional memory device having pocket structure in memory string and method for forming the same
#165Memory arrays and methods used in forming a memory array comprising strings of memory cells
#166Compound semiconductor and method for producing the same
#167FABRICATION OF SILICON GERMANIUM CHANNEL AND SILICON/SILICON GERMANIUM DUAL CHANNEL FIELD-EFFECT TRANSISTORS
#168Three-dimensional memory devices and fabrication methods thereof
#169MEMORY DEVICE WITH CONFINED CHARGE STORAGE STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
#170Semiconductor devices
#171Integrated assemblies comprising conductive levels having two different metal-containing structures laterally adjacent one another, and methods of forming integrated assemblies
#172Hybrid scheme for improved performance for P-type and N-type FinFETs
#173Semiconductor device and method for fabricating the same
#174Semiconductor device and methods of forming the same
#175Replacement gate structures for advanced integrated circuit structure fabrication
#176Method for manufacturing a mixed substrate
#177FinFET device and method of forming same
#178Multi-layer solid-state devices and methods for forming the same
#179SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD OF THE SAME
#180Heterogeneous metal line compositions for advanced integrated circuit structure fabrication
#181Integrated assemblies, and methods of forming integrated assemblies
#182Opto-electronic HEMT
#183Semiconductor device and manufacturing method of a semiconductor device
#184Memory arrays and methods used in forming a memory array comprising strings of memory cells
#185Memory device and method for fabricating the same
#186Integrated assemblies having rugged material fill, and methods of forming integrated assemblies
#187Devices having a semiconductor material that is semimetal in bulk and methods of forming the same
#188Dual metal gate structure having portions of metal gate layers in contact with a gate dielectric
#189Semiconductor device with cap element
#190Memory arrays and methods used in forming a memory array comprising strings of memory cells and operative through-array-vias
#191Semiconductor memory device having three-dimensional structure and method for manufacturing the same
#192Three-dimensional memory device containing a vertical semiconductor channel containing a connection strap and method of making the same
#193Method and apparatus for forming a patterned layer of carbon, method of forming a patterned layer of material
#194Vertical semiconductor device and method for fabricating the same
#195Selective epitaxy
#196Plugs for interconnect lines for advanced integrated circuit structure fabrication
#197Three-dimensional memory devices and methods for forming the same
#198Strained structure of a semiconductor device
#199Three-dimensional memory device and fabricating method thereof
#200Semiconductor device
#201Replacement gate structures for advanced integrated circuit structure fabrication
#202Semiconductor device
#203Semiconductor devices and methods of manufacturing the same
#204Three-dimensional semiconductor memory device
#205Semiconductor device
#206Method for fabricating a strained structure and structure formed
#207Integrated circuits having source/drain structure and method of making
#208Semiconductor device and manufacturing method thereof
#209EPITAXIAL WAFER PROCESSING METHOD
#210Source and drain stressors with recessed top surfaces
#211Fin cut and fin trim isolation for advanced integrated circuit structure fabrication
#212Differentiated voltage threshold metal gate structures for advanced integrated circuit structure fabrication
#213Self-aligned gate and junction for VTFET
#214Semiconductor device and method of manufacture
#215Semiconductor structures and methods with high mobility and high energy bandgap materials
#216Fabrication method for a 3-dimensional NOR memory array
#217FinFET devices
#218Semiconductor structure formation
#219Dual metal gate structures for advanced integrated circuit structure fabrication
#220Manufacturing method of semiconductor device
#221Three-dimensional memory devices and fabrication methods thereof
#222Hybrid scheme for improved performance for P-type and N-type FinFETs
#223Epitaxial structures for fin-like field effect transistors
#224Vertical memory devices
#225Semiconductor device and apparatus of manufacturing the same
#226Semiconductor device and manufacturing method thereof
#227Semiconductor DRAM cell structure having low leakage capacitor
#228Methods for forming three-dimensional memory devices
#229Semiconductor device, method of manufacturing the same and electronic device including the device
#230Method of fabricating three-dimensional semiconductor memory device
#231Stacked FinFET masked-programmable ROM
#232Vertical transistor fabrication for memory applications
#233Selective metal deposition by patterning direct electroless metal plating
#234Methods for solving epitaxial growth loading effect at different pattern density regions
#235Fin patterning for advanced integrated circuit structure fabrication
#236Semiconductor die stacking using vertical interconnection by through-dielectric via structures and methods for making the same
#237Semiconductor devices
#238Gate-last process for vertical transport field-effect transistor
#239Gate cut and fin trim isolation for advanced integrated circuit structure fabrication
#240Three-dimensional semiconductor memory device
#241Vertical-type memory device
#242Semiconductor device and manufacturing method thereof
#243Method of manufacturing semiconductor device
#244Method of forming a device structure using selective deposition of gallium nitride and system for same
#245GaN HEMT device structure and method of fabrication
#246Vapor phase growth method
#247Reduced-form-factor transistor with self-aligned terminals and adjustable on/off-currents and manufacture method thereof
#248Manufacturing method of a semiconductor device
#249Field effect transistor and process of forming the same
#250Nanosheet field-effect transistor with substrate isolation
#251Hybrid scheme for improved performance for P-type and N-type FinFETs
#252Method of forming epitaxial silicon layer and semiconductor device thereof
#253Selective deposition of silicon using deposition-treat-etch process
#254STRUCTURE OF 3D NAND MEMORY DEVICE AND METHOD OF FORMING THE SAME
#255FinFET doping methods and structures thereof
#256Semiconductor epitaxy bordering isolation structure
#257Method for fabricating a strained structure and structure formed
#258Fabrication of silicon germanium channel and silicon/silicon germanium dual channel field-effect transistors
#259Contact over active gate structures for advanced integrated circuit structure fabrication
#260Method for forming a FinFET structure that prevents or reduces deformation of adjacent fins
#261Epitaxial monocrystalline channel for storage transistors in 3-dimensional memory structures and methods for formation thereof
#262Semiconductor device
#263Semiconductor memory device
#264Semiconductor device
#265Memory arrays, and methods of forming memory arrays
#266Semiconductor memory device
#267Semiconductor memory device having vertical semiconductor films with narrowing widths and gate insulating films with different thickness
#268Method of forming an array of elevationally-extending strings of programmable memory cells and method of forming an array of elevationally-extending strings of memory cells
#269Epitaxy lateral overgrowth for 3D NAND
#270Gate-last process for vertical transport field-effect transistor
#271Methods of forming crystalline semiconductor material, and methods of forming transistors
#272Semiconductor structure and method for forming same
#273Method for reducing contact resistance in semiconductor structures
#274Semiconductor device and manufacturing method of a semiconductor device
#275Heterogeneous metal line compositions for advanced integrated circuit structure fabrication
#276Field-effect transistors with a grown silicon-germanium channel
#277Integrated system for semiconductor process
#278Method of selective silicon germanium epitaxy at low temperatures
#279Trench contact structures for advanced integrated circuit structure fabrication
#280Semiconductor device, method of manufacturing the same and electronic device including the same
#281Semiconductor device, method of manufacturing the same, and electronic device including the device
#282Method for manufacturing silicon single crystal, flow straightening member, and single crystal pulling device
#283Semiconductor device and manufacturing method thereof
#284Semiconductor device and method of manufacturing the same
#285Fabrication method for a 3-dimensional NOR memory array
#286MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
#287Integrated CMOS source drain formation with advanced control
#288Fin cut and fin trim isolation for advanced integrated circuit structure fabrication
#2893D semiconductor memory device and structure
#290Devices having a semiconductor material that is semimetal in bulk and methods of forming the same
#291THREE-DIMENSIONAL NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE HAVING REPLACEMENT GATE
#292Embedded memory using SOI structures and methods
#293Method for manufacturing nitride semiconductor substrate and nitride semiconductor substrate
#294Semiconductor devices
#295Self aligned top extension formation for vertical transistors
#296Semiconductor devices and manufacturing methods of the same
#297Embedded source/drain structure for tall FinFet and method of formation
#298Method for producing a semiconductor chip and semiconductor chip
#299Methods for solving epitaxial growth loading effect at different pattern density regions
#300Phase filter for enhanced defect detection in multilayer structure