207126 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Making masks on semiconductor bodies for further photolithographic processing not provided for in group or comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane Process specially adapted to improve the resolution of the mask
Lithography using high selectivity spacers for pitch reduction
#602Patterned mask using cured spin-on-glass composition
#603Method for integrated circuit patterning
#604Misalignment/alignment compensation method, semiconductor lithography system, and method of semiconductor patterning
#605SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
#606METHOD OF FORMING CARBON-CONTAINING THIN FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE METHOD
#607Methods for isolating portions of a loop of pitch-multiplied material and related structures
#608Devices and methods of forming fins at tight fin pitches
#609Method of forming trench in semiconductor substrate
#610High density field effect transistor design including a broken gate line
#611Method of manufacturing semiconductor device
#612Plasma etch processes for opening mask layers
#613Method of manufacturing hollow-structure metal grating
#614Method of manufacturing hollow-structure metal grating
#615Methods for fabricating integrated circuits using improved masks
#616Method of manufacturing metal grating
#617METHOD OF FABRICATING SEMICONDUCTOR DEVICE
#618Method of etching a boron doped carbon hardmask
#619Stable metal compounds as hardmasks and filling materials, their compositions and methods of use
#620MASK FOR EXPOSURE, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING DISPLAY PANEL USING THE MASK
#621Self-assembled monolayer for pattern formation
#622Methods of fabricating semiconductor devices and devices fabricated thereby
#623Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures
#624Photolithographic methods of producing structures in radiation-emitting semiconductor components
#625METHOD OF FORMING PATTERN
#626Process for improving critical dimension uniformity of integrated circuit arrays
#627Methods of fabricating fine patterns
#628Pattern forming method and method of manufacturing semiconductor device
#629Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
#630Methods of forming patterns
#631Methods and structures for protecting one area while processing another area on a chip
#632Integrated circuit fabrication
#633Methods for reducing line width roughness and/or critical dimension nonuniformity in a patterned photoresist layer
#634Methods for forming semiconductor devices and semiconductor device structures
#635Low-temperature sidewall image transfer process using ALD metals, metal oxides and metal nitrides
#636Semiconductor device and method of manufacturing the same
#637Double self aligned via patterning
#638Dry non-plasma treatment system and method of using
#639METHOD FOR PREFERENTIAL SHRINK AND BIAS CONTROL IN CONTACT SHRINK ETCH
#640CONFORMAL AMORPHOUS CARBON FOR SPACER AND SPACER PROTECTION APPLICATIONS
#641Method of manufacturing dual gate oxide devices
#642Methods of fabricating substrates
#643Semiconductor device and method forming patterns with spaced pads in trim region
#644Method of forming an integrated circuit using a patterned mask layer
#645Method for improving CD micro-loading in photomask plasma etching
#646Plasma pre-treatment for improved uniformity in semiconductor manufacturing
#647Systems and methods for fabricating semiconductor devices having larger die dimensions
#648Semiconductor structures including tight pitch contacts
#649Semiconductor device structures comprising a polymer bonded to a base material and methods of fabrication
#650Lithography method and device
#651Semiconductor constructions and methods of forming semiconductor constructions
#652Methods of forming hole patterns of semiconductor devices
#653Double-pattern gate formation processing with critical dimension control
#654Boron-doped carbon-based hardmask etch processing
#655Method of forming interconnection lines
#656Method of forming patterns for semiconductor device
#657Methods of forming patterns
#658Self-aligned devices and methods of manufacture
#659Method for forming a mask by etching conformal film on patterned ashable hardmask
#660Semiconductor devices having fine patterns
#661Pattern improvement in multiprocess patterning
#662Methods of fabricating semiconductor devices using double patterning technology
#663Semiconductor device manufacturing method
#664Methods of forming patterns, and methods of forming integrated circuitry
#665Methods of forming a pattern on a substrate
#666Methods of forming semiconductor structures with sulfur dioxide etch chemistries
#667Method of forming pattern in substrate
#668Methods of improving long range order in self-assembly of block copolymer films with ionic liquids and materials produced therefrom
#669Patterning methods and methods of forming electrically conductive lines
#670Dual hard mask lithography process
#671Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
#672Processes for NAND flash memory fabrication
#673Methods for single exposure—self-aligned double, triple, and quadruple patterning
#674Method for separately processing regions on a patterned medium
#675Method for manufacturing semiconductor device
#676Methods of forming patterns, and methods of forming integrated circuitry
#677Methods of forming a pattern on a substrate
#678Method of manufacturing semiconductor device
#679Self-assembled monolayer for pattern formation
#680Method for providing vias
#681Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures
#682Method for metallizing textured surfaces
#683METHOD FOR SHRINK AND TUNE TRENCH/VIA CD
#684Image transfer process employing a hard mask layer
#685Method of simultaneously forming multiple structures having different critical dimensions using sidewall transfer
#686IMAGE TRANSFER PROCESS EMPLOYING A HARD MASK LAYER
#687Method of manufacturing semiconductor device using sidewall films for pitch multiplication in forming interconnects
#688Methods of forming a pattern on a substrate
#689Methods of forming semiconductor constructions
#690Method for selectively modifying spacing between pitch multiplied structures
#691Integrated circuit fabrication
#692Self-aligned NAND flash select-gate wordlines for spacer double patterning
#693Methods of forming a masking pattern for integrated circuits
#694Mask material conversion
#695Efficient pitch multiplication process
#696Method of forming trench in semiconductor substrate
#697Method of forming a semiconductor device
#698Method for forming fine pitch structures
#699Method for forming fine patterns of semiconductor device
#700Semiconductor device and manufacturing method of semiconductor device
#701Method of manufacturing a memory device using fine patterning techniques
#702Patterned structure of semiconductor device and fabricating method thereof
#703Semiconductor device, memory system and method of manufacturing the semiconductor device
#704Dual hard mask lithography process
#705Lateral-dimension-reducing metallic hard mask etch
#706Mask pattern forming method, fine pattern forming method, and film deposition apparatus
#707Method of fabricating a semiconductor structure with ion-implanted conductive layer
#708Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the same
#709Methods of forming patterns
#710CONFORMAL AMORPHOUS CARBON FOR SPACER AND SPACER PROTECTION APPLICATIONS
#711Methods for isolating portions of a loop of pitch-multiplied material and related structures
#712Structures comprising masks comprising carbon
#713Semiconductor device and method of manufacturing the same
#714Method of forming pattern for semiconductor device
#715Method for forming contact hole
#716Methods for adhering materials, for enhancing adhesion between materials, and for patterning materials, and related semiconductor device structures
#717Inverse spacer processing
#718METHODS OF FORMING A PATTERN AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME
#719Semiconductor device and method forming patterns with spaced pads in trim region
#720Process for improving critical dimension uniformity of integrated circuit arrays
#721Simplified pitch doubling process flow
#722Method of forming an integrated circuit
#723Method of forming a semiconductor memory device
#724Sidewall image transfer process with multiple critical dimensions
#725Method for forming high density patterns
#726Multi-layer pattern for alternate ALD processes
#727Manufacturing method of semiconductor device and semiconductor device
#728Pattern forming method
#729Apparatus for the deposition of a conformal film on a substrate and methods therefor
#730Methods to increase pattern density and release overlay requirement by combining a mask design with special fabrication processes
#731DESIGN METHOD OF WIRING LAYOUT, SEMICONDUCTOR DEVICE, PROGRAM FOR SUPPORTING DESIGN OF WIRING LAYOUT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#732Method for forming pattern and mask pattern, and method for manufacturing semiconductor device
#733Semiconductor device and method of manufacturing the same
#734Semiconductor device including conductive lines and pads
#735Method for producing semiconductor components on a substrate, and substrate comprising semiconductor components
#736METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE
#737Methods of forming semiconductor devices having narrow conductive line patterns
#738Methods of forming fine patterns for semiconductor device
#739Method for reducing a minimum line width in a spacer-defined double patterning process
#740Lithography method and device
#741METHOD OF FORMING MASK PATTERN AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#742DEVICE HAVING AND METHOD FOR FORMING FINS WITH MULTIPLE WIDTHS
#743Methods to reduce the critical dimension of semiconductor devices and related semiconductor devices
#744Method for forming small dimension openings in the organic masking layer of tri-layer lithography
#745Methods of fabricating substrates
#746Semiconductor device manufacturing method
#747SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS
#748Method for manufacturing semiconductor device and apparatus for manufacturing semiconductor device
#749Self aligning via patterning
#750Methods of fabricating substrates
#751Method for forming hard mask in semiconductor device fabrication
#752Pattern forming method
#753PROTUBERANT STRUCTURE AND METHOD FOR MAKING THE SAME
#754PROTUBERANT STRUCTURE AND METHOD FOR MAKING THE SAME
#755ETCH WITH HIGH ETCH RATE RESIST MASK
#756Methods of forming a pattern on a substrate
#757METHODS OF FABRICATING SEMICONDUCTOR DEVICES INCLUDING FINE PATTERNS
#758Device having and method for forming fins with multiple widths
#759METHOD OF FABRICATING SEMICONDUCTOR DEVICE
#760Method of fabricating semiconductor device
#761Spacer process for on pitch contacts and related structures
#762Integrated circuit having pitch reduced patterns relative to photoithography features
#763Method for fabricating semiconductor device
#764Shrinkage of critical dimensions in a semiconductor device by selective growth of a mask material
#765Methods of patterning materials
#766SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
#767Template and pattern forming method
#768Integrated circuit structure having arrays of small, closely spaced features
#769METHOD OF MANUFACTURING NONVOLATILE SEMICONDUCTOR STORAGE DEVICE
#770Pattern forming method and method for producing device
#771Solution processible hardmasks for high resolution lithography
#772Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
#773Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
#774Amorphous carbon deposition method for improved stack defectivity
#775Method for forming fine patterns of a semiconductor device
#776Device component forming method with a trim step prior to sidewall image transfer (SIT) processing
#777Device with gaps for capacitance reduction
#778Method of manufacturing semiconductor device
#779Method of forming mask pattern
#780Substrate processing method
#781Integrated circuit fabrication
#782SEMICONDUCTOR DEVICE MANUFACTURING METHOD
#783Method and algorithm for random half pitched interconnect layout with constant spacing
#784Method of forming openings
#785Two-dimensional patterning employing self-assembled material
#786Pattern formation employing self-assembled material
#787Pattern formation employing self-assembled material
#788PITCH DIVISION PATTERNING TECHNIQUES
#789METHODS FOR FABRICATING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEVICES USING THE SAME
#790Integrated circuit pattern and method
#791Multiple patterning method
#792Feature size reduction
#793Processes to pattern small features for advanced patterning needs
#794Multiple patterning using improved patternable low-κ dielectric materials
#795Superfine pattern mask, method for production thereof, and method employing the same for forming superfine pattern
#796Slimming method of carbon-containing thin film and oxidation apparatus
#797METHOD OF FORMING PATTERNS OF SEMICONDUCTOR DEVICE
#798Method for fabricating large-area nanoscale pattern
#799Self-aligned NAND flash select-gate wordlines for spacer double patterning
#800METHOD OF FORMING PATTERNS OF SEMICONDUCTOR DEVICE
#801Method of forming semiconductor memory device
#802Methods of forming patterns
#803Pattern formation employing self-assembled material
#804Methods for increased array feature density
#805Methods of forming topographical features using segregating polymer mixtures
#806Two-dimensional patterning employing self-assembled material
#807Self-aligned devices and methods of manufacture
#808Topography based patterning
#809Methods for linewidth modification and apparatus implementing the same
#810Method for patterning sublithographic features
#811NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING SAME
#812Methods for pitch reduction
#813Method for improving self-assembled polymer features
#814Microelectronic fabrication methods using composite layers for double patterning
#815Method of fabricating semiconductor device
#816Substrate processing method
#817Resist feature and removable spacer pitch doubling patterning method for pillar structures
#818SELF ALIGNED TRIPLE PATTERNING
#819One-dimensional arrays of block copolymer cylinders and applications thereof
#820Multiple edge enabled patterning
#821Methods of Forming a Pattern of Semiconductor Devices
#822Pitch multiplied mask patterns for isolated features
#823Pitch reduction using oxide spacer
#824Semiconductor device and method of double photolithography process for forming patterns of the semiconductor device
#825Method of forming a pattern structure for a semiconductor device
#826Methods of forming openings
#827STRUCTURES WITH INCREASED PHOTO-ALIGNMENT MARGINS
#828Spacer double patterning that prints multiple CD in front-end-of-line
#829Methods for patterning microelectronic devices using two sacrificial layers
#830METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#831Method of Forming Fine Patterns
#832Method of forming semiconductor structures with contact holes
#833Method of pitch dimension shrinkage
#834Method of fine patterning semiconductor device
#835Amorphous carbon deposition method for improved stack defectivity
#836Method for selectively modifying spacing between pitch multiplied structures
#837Method of Forming Fine Patterns
#838METHOD FOR FORMING CONTACT HOLE OF SEMICONDUCTOR DEVICE
#839Method of forming a micro-pattern for semiconductor devices
#840Simplified pitch doubling process flow
#841METHOD FOR FORMING PATTERN OF SEMICONDUCTOR DEVICE
#842Method of fine patterning semiconductor device
#843Methods of Forming a Photoresist Pattern Using Plasma Treatment of Photoresist Patterns
#844Method of manufacturing semiconductor device including sequentially forming first and second mask material layers and forming a dotted photoresist pattern on the second mask material layer
#845Efficient pitch multiplication process
#846Semiconductor structures including tight pitch contacts
#847Double patterning strategy for contact hole and trench in photolithography
#848Semiconductor device and manufacturing method thereof
#849Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same
#850METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#851Double patterning method for creating a regular array of pillars with dual shallow trench isolation
#852Method for forming fine pattern
#853METHOD OF FABRICATING A SEMICONDUCTOR DEVICE
#854On-track process for patterning hardmask by multiple dark field exposures
#855System and method for self-aligned dual patterning
#856Precisely tuning feature sizes on hard masks via plasma treatment
#857METHOD OF FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE
#858Methods of forming fine patterns in integrated circuit devices and methods of manufacturing integrated circuit devices including the same
#859Semiconductor device manufacturing methods
#860Photolithography Method
#861Aspect ratio adjustment of mask pattern using trimming to alter geometry of photoresist features
#862Method for forming narrow structures in a semiconductor device
#863Pitch division patterning techniques
#864Mask material conversion
#865Methods Of Patterning Materials, And Methods Of Forming Memory Cells
#866Self-aligned spatial frequency doubling
#867Method for forming fine pattern in semiconductor device
#868Methods of manufacturing semiconductors using dummy patterns
#869Method for reducing line width roughness with plasma pre-etch treatment on photoresist
#870Method of manufacturing semiconductor device
#871MULTIPLE DEPOSITION FOR INTEGRATION OF SPACERS IN PITCH MULTIPLICATION PROCESS
#872Sidewall image transfer using the lithographic stack as the mandrel
#873Device having and method for forming fins with multiple widths for an integrated circuit
#874SEMICONDUCTOR DEVICE MANUFACTURING METHOD
#875Method of forming semiconductor device
#876Split charge storage node outer spacer process
#877Pattern improvement in multiprocess patterning
#878Semiconductor device fabrication method using multiple resist patterns
#879Semiconductor device having fine pattern wiring lines integrally formed with contact plug and method of manufacturing same
#880Methods of forming a pattern and methods of fabricating a semiconductor device having a pattern
#881METHOD OF FABRICATING SEMICONDUCTOR DEVICE
#882Double patterning strategy for contact hole and trench in photolithography
#883Template and pattern forming method
#884Methods and structures for enhancing perimeter-to-surface area homogeneity
#885Pattern forming method and manufacturing method of semiconductor device
#886METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#887Dual exposure track only pitch split process
#888Multiple patterning using improved patternable low-k dielectric materials
#889Method of forming minute patterns in semiconductor device using double patterning
#890Method and algorithm for random half pitched interconnect layout with constant spacing
#891Pitch multiplication using self-assembling materials
#892Mask trimming
#893Methods of forming fine patterns of semiconductor device
#894Methods for fabricating semiconductor devices
#895Method of forming pitch multiplied contacts
#896FREQUENCY DOUBLING USING SPACER MASK
#897Methods to reduce the critical dimension of semiconductor devices and related semiconductor devices
#898Self-aligned spacer multiple patterning methods
#899Patterning method
#900METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE