207466 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof; Manufacture of specific parts of devices defined in group; Making of isolation regions between components; Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials Concurrent filling of a plurality of trenches having a different trench shape or dimension, e.g. rectangular and V-shaped trenches, wide and narrow trenches, shallow and deep trenches
DUAL SHALLOW TRENCH ISOLATION STRUCTURE
#902Semiconductor device and method of producing the same
#903Semiconductor device and method of producing the same
#904Nonvolatile semiconductor memory device and manufacturing method thereof
#905Impurity control in HDP-CVD DEP/ETCH/DEP processes
#906MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
#907Method of fabricating an integrated circuit
#908Ultrathin SOI CMOS devices employing differential STI liners
#909METHOD OF DEPOSITING SILICON OXIDE FILMS
#910Electrical fuse having a cavity thereupon
#911Semiconductor device having trench isolation region and methods of fabricating the same
#912METHOD FOR MANUFACTURING SHALLOW TRENCH ISOLATION
#913Field effect transistors having protruded active regions and methods of fabricating such transistors
#914Semiconductor device and method of fabricating the same
#915Method of forming a field effect transistor
#916Semiconductor device and method of manufacturing the same
#917GAPFILL EXTENSION OF HDP-CVD INTEGRATED PROCESS MODULATION SIO2 PROCESS
#918Semiconductor devices and methods of manufacture thereof
#919Dual trench isolation for CMOS with hybrid orientations
#920Tunnel and gate oxide comprising nitrogen for use with a semiconductor device and a process for forming the device
#921Semiconductor integrated circuit device and process for manufacturing the same
#922Self-aligned and extended inter-well isolation structure
#923Semiconductor device and method of producing the same
#924Production of a carrier wafer contact in trench insulated integrated SOI circuits having high-voltage components
#925EXTENDED DEPTH INTER-WELL ISOLATION STRUCTURE
#926High power device isolation and integration
#927Semiconductor device with MISFET that includes embedded insulating film arranged between source/drain regions and channel
#928CMOS structure for body ties in ultra-thin SOI (UTSOI) substrates
#929METHODS FOR FABRICATING SEMICONDUCTOR DEVICE STRUCTURES WITH REDUCED SUSCEPTIBILITY TO LATCH-UP AND SEMICONDUCTOR DEVICE STRUCTURES FORMED BY THE METHODS
#930Method for selectively etching portions of a layer of material based upon a density or size of semiconductor features located thereunder
#931METHOD FOR REMOVING MATERIAL FROM A SEMICONDUCTOR
#932Active structure of a semiconductor device
#933Semiconductor device having tiles for dual-trench integration and method therefor
#934Method and structure for controlling stress in a transistor channel
#935Semiconductor device having dual-STI and manufacturing method thereof
#936PROCESS FOR THE FORMATION OF DIELECTRIC ISOLATION STRUCTURES IN SEMICONDUCTOR DEVICES
#937Semiconductor device and a method of manufacturing the same and designing the same
#938Shallow trench isolation dummy pattern and layout method using the same
#939Semiconductor device fabrication method
#940METHODS FOR FABRICATING SEMICONDUCTOR DEVICE STRUCTURES WITH REDUCED SUSCEPTIBILITY TO LATCH-UP AND SEMICONDUCTOR DEVICE STRUCTURES FORMED BY THE METHODS
#941Methods of forming semiconductor devices including multistage planarization and crystalization of a semiconductor layer
#942INTEGRATED CIRCUIT AND METHOD OF MANUFACTURING AN INTEGRATED CIRCUIT
#943MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING STI TECHNIQUE
#944Method for forming isolation structure of different widths in semiconductor device
#945Multiple-depth STI trenches in integrated circuit fabrication
#946Methods of uniformly removing silicon oxide and a method of removing a sacrificial oxide
#947Integrated assist features for epitaxial growth
#948SEMICONDUCTOR DEVICES INCLUDING TRENCH ISOLATION STRUCTURES AND METHODS OF FORMING THE SAME
#949Isolation regions for semiconductor devices and their formation
#950Methods of forming shallow trench isolation structures in semiconductor devices
#951METHOD FOR FABRICATING AN ISOLATION LAYER IN A SEMICONDUCTOR DEVICE
#952Method of forming isolation structure of flash memory device
#953Method for manufacturing device isolation film of semiconductor device
#954Device patterned with sub-lithographic features with variable widths
#955Semiconductor manufacturing method and semiconductor device
#956Semiconductor device
#957Semiconductor device
#958Semiconductor device isolation structures
#959METHOD OF FABRICATING ISOLATION LAYER OF SEMICONDUCTOR DEVICE
#960Process for self-aligned manufacture of integrated electronic devices
#961Rotational shear stress for charge carrier mobility modification
#962Manufacturing method of high voltage semiconductor device that includes forming a nitride layer on shallow trench isolations
#963SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
#964Method of fabricating semiconductor integrated circuit device
#965Method of making a semiconductor device comprising isolation trenches inducing different types of strain
#966Semiconductor device
#967Semiconductor device
#968Semiconductor structures for latch-up suppression and methods of forming such semiconductor structures
#969DUAL TRENCH ISOLATION FOR CMOS WITH HYBRID ORIENTATIONS
#970Chemical mechanical polishing process for forming shallow trench isolation structure
#971Semiconductor device fabrication methods
#972Method of fabricating a semiconductor device with a trench isolation structure and resulting semiconductor device
#973Semiconductor device isolation structures and methods of fabricating such structures
#974Semiconductor device using fuse/anti-fuse system
#975Nano imprint technique with increased flexibility with respect to alignment and feature shaping
#976Semiconductor device manufactured with a double shallow trench isolation process
#977Application of different isolation schemes for logic and embedded memory
#978Dielectric deposition and etch back processes for bottom up gapfill
#979Method for fabricating semiconductor device
#980Variable overlap of dummy shapes for improved rapid thermal anneal uniformity
#981Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same
#982Transistor and method of providing interlocking strained silicon on a silicon substrate
#983Semiconductor device and method of manufacturing same
#984Method of fabricating a semiconductor device with a trench isolation structure and resulting semiconductor device
#985METHOD FOR IN-LINE CONTROLLING HYBRID CHEMICAL MECHANICAL POLISHING PROCESS
#986Method of fabricating semiconductor device with STI structure
#987Methods of manufacturing semiconductor memory devices with unit cells having charge trapping layers
#988Semiconductor device with STI structure
#989Method of forming the semiconductor device
#990Semiconductor device
#991Patterning sub-lithographic features with variable widths
#992Dual depth shallow trench isolation and methods to form same
#993DUAL GATE OXIDE STRUCTURE IN SEMICONDUCTOR DEVICE AND METHOD THEREOF
#994Semiconductor structures for latch-up suppression and methods of forming such semiconductor structures
#995Well isolation trenches (WIT) for CMOS devices
#996Semiconductor device and its manufacturing method
#997METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE HAVING A SILICON OXYNITRIDE FILM
#998Semiconductor device and a method of manufacturing the same and designing the same
#999Isolation trench fill using oxide liner and nitride etch back technique with dual trench depth capability
#1000Method of fabricating a groove-like structure in a semiconductor device
#1001Method of making an isolation trench and resulting isolation trench
#1002Isolation regions and their formation
#1003Isolation trench having first and second trench areas of different widths
#1004Manufacturing method of semiconductor device
#1005Methods of fabricating isolation regions of semiconductor devices and structures thereof
#1006Vertical gated access transistor
#1007Method of manufacturing a semiconductor device and semiconductor device obtained by means of said method
#1008Methods for fabricating semiconductor device structures with reduced susceptibility to latch-up and semiconductor device structures formed by the methods
#1009Method of fabricating semiconductor integrated circuit device with 99.99 wt% cobalt
#1010Semiconductor structures for latch-up suppression and methods of forming such semiconductor structures
#1011Nonvolatile semiconductor memory device having element isolating region of trench type
#1012Semiconductor integrated circuit device and method of fabricating the same
#1013Semiconductor device and method for fabricating the same
#1014Method of manufacturing semiconductor device
#1015Nonvolatile semiconductor memory device having element isolating region of trench type
#1016Method of forming isolation layer of semiconductor device
#1017Method for fabricating isolation structures for flash memory semiconductor devices
#1018Method of simultaneously fabricating isolation structures having rounded and unrounded corners
#1019Method for forming a silicon oxide layer using spin-on glass
#1020Fabrication of semiconductor devices
#1021Method of forming a trench for use in manufacturing a semiconductor device
#1022Cooling semiconductor device and manufacturing method thereof
#1023Integrated circuit device with a circuit element formed on an active region having rounded corners
#1024Rotational shear stress for charge carrier mobility modification
#1025Method of forming a field effect transistor
#1026Method of forming dual gate dielectric layer
#1027Methods of forming isolation regions and structures thereof
#1028Recessed shallow trench isolation
#1029Dielectric Gap Fill With Oxide Selectively Deposited Over Silicon Liner
#1030Semiconductor device and method of fabricating the same including trenches of different aspect ratios
#1031Method of manufacturing an isolation layer of a flash memory
#1032Semiconductor device and method of fabricating the same
#1033Semiconductor integrated circuit device and process for manufacturing the same
#1034Methods of forming fine patterns, and methods of forming trench isolation layers using the same
#1035Semiconductor devices including trench isolation structures and methods of forming the same
#1036Isolation for semiconductor devices
#1037Nonvolatile semiconductor memory device having element isolating region of trench type
#1038Nonvolatile semiconductor memory device having element isolating region of trench type
#1039Different STI depth for Ron improvement for LDMOS integration with submicron devices
#1040Dual trench isolation for CMOS with hybrid orientations
#1041Method of fabricating a semiconductor device having first and second trenches using non-concurrently formed hard mask patterns
#1042Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry
#1043Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry
#1044Method of fabricating a semiconductor device and a method of generating a mask pattern
#1045Method of forming an isolation layer and method of manufacturing a field effect transistor using the same
#1046Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry
#1047Compositions and methods for chemical mechanical polishing silica and silicon nitride
#1048Method of manufacturing semiconductor device
#1049Method of manufacturing semiconductor device
#1050Monitoring the reduction in thickness as material is removed from a wafer composite and test structure for monitoring removal of material
#1051Isolation layers for semiconductor devices including first and second sub-trenches and methods of forming the same
#1052Semiconductor processing methods
#1053Semiconductor device and fabrication method therefor
#1054Method for manufacturing gate dielectric layer
#1055Semiconductor device and fabrication process thereof
#1056Method of forming trench type isolation film of semiconductor device
#1057Isolation structure and method of forming the same
#1058Methods of forming integrated circuit devices
#1059Trench isolation structure in a semiconductor device and method for fabricating the same
#1060Polish method for semiconductor device planarization
#1061Methods of forming field effect transistors and methods of forming field effect transistor gates and gate lines
#1062Method of fabricating semiconductor device
#1063Method of manufacturing non-volatile semiconductor memory
#1064Method of manufacturing semiconductor device
#1065Double trench for isolation of semiconductor devices
#1066Self-aligned STI SONOS
#1067Field effect transistor and method for the production thereof
#1068Field effect transistor and method for fabricating it
#1069Methods of filling openings with oxide, and methods of forming trenched isolation regions
#1070Methods of forming trench isolation in the fabrication of integrated circuitry and methods of fabricating integrated circuitry
#1071Non-critical complementary masking method for poly-1 definition in flash memory device fabrication
#1072Methods of fabricating trench isolation structures having varying depth
#1073Semiconductor device and its manufacture method
#1074Methods of forming trench isolation in the fabrication of integrated circuitry and methods of fabricating integrated circuitry
#1075Structure and method for placement, sizing and shaping of dummy structures
#1076Semiconductor device and fabrication method of the same
#1077Method for manufacturing a semiconductor device
#1078Semiconductor device and a method of manufacturing the same and designing the same
#1079Nonvolatile semiconductor memory device having element isolating region of trench type
#1080Semiconductor integrated circuit device and process for manufacturing the same
#1081A CMOS STRUCTURE FOR BODY TIES IN ULTRA-THIN SOI (UTSOI) SUBSTRATES
#1082Dry-etching method
#1083Isolation regions for semiconductor devices and their formation
#1084Method of manufacturing semiconductor device
#1085Semiconductor device and method of manufacturing the same
#1086Semiconductor manufacturing method for device isolation
#1087Monitoring pattern for optimization of chemical mechanical polishing process of trench isolation layer and related methods
#1088Semiconductor device and method for fabricating the same
#1089Composite pattern for monitoring various defects of semiconductor device
#1090Forming of trenches or wells having different destinations in a semiconductor substrate
#1091Semiconductor process for forming stress absorbent shallow trench isolation structures
#1092Semiconductor component with trench insulation and corresponding production method
#1093Method for forming STI structures with controlled step height
#1094Application of different isolation schemes for logic and embedded memory
#1095Semiconductor device and method of providing regions of low substrate capacitance
#1096Integrated BiCMOS semiconductor circuit
#1097Method of manufacturing semiconductor device
#1098Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry
#1099Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry
#1100Dual depth trench isolation
#1101Multiple-depth STI trenches in integrated circuit fabrication
#1102Semiconductor device and method for fabricating the same
#1103Semiconductor device having dual-STI and manufacturing method thereof
#1104Integrated circuit devices including a dummy gate structure below a passive electronic element
#1105Method for manufacturing device isolation film of semiconductor device
#1106Semiconductor device with shallow trench isolation which controls mechanical stresses
#1107Methods of forming shallow trench isolation structures in semiconductor devices
#1108Method for forming device isolation layer of semiconductor device
#1109Semiconductor device and method of fabricating the same
#1110Chemical mechanical polishing for forming a shallow trench isolation structure
#1111Method for manufacturing non-volatile semiconductor memory device, and non-volatile semiconductor memory device
#1112Method and apparatus for a semiconductor device having low and high voltage transistors
#1113Method for forming device isolation film of semiconductor device
#1114Semiconductor device with resistor element and dummy active region
#1115Semiconductor device and method for manufacturing the same
#1116Method of forming dual gate dielectric layer
#1117Method of manufacturing a semiconductor device
#1118Semiconductor device
#1119Dielectric gap fill with oxide selectively deposited over silicon liner
#1120Semiconductor device and method of fabricating the same
#1121Methods of forming semiconductor constructions
#1122Method of manufacturing a semiconductor integrated circuit device that includes forming an isolation trench around active regions and filling the trench with two insulating films
#1123Method of manufacturing a semiconductor integrated circuit device that includes forming dummy patterns in an isolation region prior to filling with insulating material
#1124Nonvolatile semiconductor memory device having element isolating region of trench type
#1125Method of fabricating semiconductor device with STI structure
#1126Semiconductor device and method of fabricating the same
#1127Semiconductor device and method of producing the same
#1128Model-based insertion of irregular dummy features
#1129Shallow Trench Isolation Method for a Semiconductor Wafer
#1130Embedded semiconductor product with dual depth isolation regions
#1131Compositions and methods for chemical mechanical polishing silica and silicon nitride
#1132HDP-CVD deposition process for filling high aspect ratio gaps
#1133Filling high aspect ratio isolation structures with polysilazane based material
#1134Method of forming a trench structure
#1135Semiconductor device and, manufacturing method thereof
#1136Semiconductor device and process for producing the same
#1137Method to avoid a laser marked area step height
#1138Methods for filling high aspect ratio trenches in semiconductor layers
#1139Method and structure for controlling stress in a transistor channel
#1140Strained channel transistor and methods of manufacture
#1141Method of manufacturing a trench isolation region in a semiconductor device
#1142Shallow trench isolation method for reducing oxide thickness variations at different pattern densities
#1143Chemical mechanical polishing process for forming shallow trench isolation structure
#1144Method for manufacturing a semiconductor integrated circuit device that includes covering the bottom of an isolation trench with spin-on glass and etching back the spin-on glass to a predetermined depth
#1145Application of different isolation schemes for logic and embedded memory
#1146Method for manufacturing semiconductor device
#1147Method for fabricating shallow trench isolation structure of semiconductor device
#1148Method for isolating semiconductor devices with use of shallow trench isolation method
#1149Semiconductor devices and manufacturing methods thereof
#1150Method for fabricating a semiconductor device
#1151Gap-fill method using high density plasma chemical vapor deposition process and method of manufacturing integrated circuit device
#1152Methods of forming polished material and methods of forming isolation regions
#1153Methods of forming shallow trench isolation
#1154Non-volatile semiconductor memory devices having self-aligned gate conductive layers and methods of fabricating such devices
#1155Method of integrating high voltage metal oxide semiconductor devices and submicron metal oxide semiconductor devices
#1156Semiconductor device and manufacturing method thereof
#1157Semiconductor device and method of fabricating the same
#1158Semiconductor device having a dummy active region for controlling high density plasma chemical vapor deposition
#1159Semiconductor device
#1160STI forming method for improving STI step uniformity
#1161Method of fabricating a semiconductor device with a trench isolation structure and resulting semiconductor device
#1162Method of fabricating semiconductor integrated circuit device
#1163Method for forming alignment pattern of semiconductor device
#1164Method for forming isolation layer of semiconductor device
#1165Method for fabricating semiconductor device with trench isolation structure
#1166Semiconductor device and method of fabricating the same
#1167Shallow trench isolation dummy pattern and layout method using the same
#1168Semiconductor integrated circuit device including dummy patterns located to reduce dishing
#1169Method of simultaneously fabricating isolation structures having rounded and unrounded corners
#1170Deep trench isolation of embedded DRAM for improved latch-up immunity
#1171Method of forming a field effect transistor
#1172RFID tag with tunable antenna and associated reader
#1173Method of manufacturing a semiconductor device that includes a process for forming a high breakdown voltage field effect transistor
#1174Methods of forming field effect transistor gate lines
#1175Semiconductor device with self-aligned junction contact hole and method of fabricating the same
#1176Planarizing method employing hydrogenated silicon nitride planarizing stop layer
#1177Method of forming field effect transistors
#1178Method of forming a field effect transistor
#1179Test region layout for shallow trench isolation
#1180Nonvolatile semiconductor memory device having element isolating region of trench type
#1181Application of different isolation schemes for logic and embedded memory
#1182Dual gate oxide structure in semiconductor device and method thereof
#1183Trench isolation employing a high aspect ratio trench
#1184Methods of simultaneously fabricating isolation structures having varying dimensions
#1185Method for high aspect ratio HDP CVD gapfill
#1186Method for fabricating semiconductor device by forming trenches in different depths at a cellregion and a peripheral region for reducing self aligned source resistance at the cell region
#1187Structure and method for placement, sizing and shaping of dummy structures
#1188Semiconductor device and method for manufacturing the same
#1189Multilayered CMP stop for flat planarization
#1190Method for manufacturing differential isolation structures in a semiconductor electronic device and corresponding structure
#1191Trench isolation having a self-adjusting surface seal and method for producing one such trench isolation
#1192Method of doping sidewall of isolation trench
#1193Chemical mechanical polishing in forming semiconductor device
#1194Method for forming a silicon oxide layer using spin-on glass
#1195Semiconductor device fabrication method
#1196Dual depth trench isolation
#1197Method for fabricating trench isolation
#1198Process for the formation of dielectric isolation structures in semiconductor devices
#1199Method of forming trench isolations
#1200Methods for filling high aspect ratio trenches in semiconductor layers