207474 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof; Manufacture of specific parts of devices defined in group; Making of isolation regions between components; Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using selective deposition of single crystal silicon, i.e. SEG techniques
SEED STRUCTURES IN SEMICONDUCTOR DEVICES AND FABRICATION THEREOF
#2FACET SUPPRESSION FOR EPITAXIAL GROWTH
#3INERTIAL SENSOR, METHOD OF MANUFACTURING INERTIAL SENSOR, AND INERTIAL MEASUREMENT UNIT
#4COMPOSITE SUBSTRATE AND PRODUCTION METHOD THEREFOR
#5Selective capping processes and structures formed thereby
#6Semiconductor devices
#7Selective capping processes and structures formed thereby
#8Device substrate with high thermal conductivity and method of manufacturing the same
#9Oxidized cavity structures within and under semiconductor devices
#10Methods of forming semiconductor devices
#11Epitaxial oxide fin segments to prevent strained semiconductor fin end relaxation
#12Selective capping processes and structures formed thereby
#13Selective capping processes and structures formed thereby
#14Semiconductor nanowire fabrication
#15PREPARATION OF SILICON-GERMANIUM-ON-INSULATOR STRUCTURES
#16Method of fabricating crystalline island on substrate
#17Semiconductor nanowire fabrication
#18Method for forming a multiple layer epitaxial layer on a wafer
#19Localized region of isolated silicon over recessed dielectric layer
#20Method of producing a silicon-on-insulator article
#21Multiple layer substrate
#22Composite substrate and method for manufacturing same
#23Semiconductor device and method for forming the same
#24Method for making a semi-conducting substrate located on an insulation layer
#25SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
#26Method of manufacturing a base substrate for a semi-conductor on insulator type substrate
#27Method for making a semi-conducting substrate located on an insulation layer
#28LOW COST SOI SUBSTRATES FOR MONOLITHIC SOLAR CELLS
#29Threshold voltage consistency and effective width in same-substrate device groups
#30METHOD OF FORMING ISOLATION LAYER IN SEMICONDCUTOR DEVICE
#31Method for manufacturing semiconductor device
#32Semiconductor device having an element isolating insulating film
#33Thin layer structure and method of forming the same
#34Implantation-less approach to fabricating strained semiconductor on isolation wafers
#35Semiconductor device incorporating a defect controlled strained channel structure and method of making the same
#36Microelectronic structure with a high germanium concentration silicon germanium alloy including a graded buffer layer
#37Optical system with a high germanium concentration silicon germanium alloy including a graded buffer layer
#38Semiconductor device incorporating a defect controlled strained channel structure and method of making the same
#39Semiconductor device and method of manufacturing the same