207547 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof; Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
Process of forming an electronic device including insulating layers having different strains
#2402Method for producing a transistor with metallic source and drain
#2403SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
#2404Method of adjusting the threshold voltage of a transistor by a buried trapping layer
#2405Method for manufacturing SOI substrate and SOI substrate
#2406SRAM device
#2407Field effect resistor for ESD protection
#2408Process to fabricate a metal high-K transistor having first and second silicon sidewalls for reduced parasitic capacitance
#2409Contact optimization for enhancing stress transfer in closely spaced transistors
#2410Non-insulating stressed material layers in a contact level of semiconductor devices
#2411Semiconductor device and method for fabricating the same
#2412Front and backside processed thin film electronic devices
#2413Semiconductor device
#2414Semiconductor device
#2415SEMICONDUCTOR DEVICE INCLUDING INDEPENDENT ACTIVE LAYERS AND METHOD FOR FABRICATING THE SAME
#2416Metal gate transistor and resistor and method for fabricating the same
#2417Electronic device, method for manufacturing the same, and silicon substrate for electronic device
#2418Method for producing an integrated field-effect transistor
#2419Method for releasing the suspended structure of a NEMS and/or NEMS component
#2420Semiconductor device including storage device and method for driving the same
#2421Semiconductor device having an enlarged space area surrounding an isolation trench for reducing thermal resistance and improving heat dissipation
#2422Charging protection device
#2423Nonvolatile semiconductor memory device
#2424Method for manufacturing semiconductor device
#2425Semiconductor structure for fabricating a handle wafer contact in a trench insulated SOI disc
#2426Semiconductor dynamic quantity sensor and method of manufacturing the same
#2427REDUCTION OF STI CORNER DEFECTS DURING SPE IN SEMICONDCUTOR DEVICE FABRICATION USING DSB SUBSTRATE AND HOT TECHNOLOGY
#2428Epitaxy silicon on insulator (ESOI)
#2429Method for manufacturing semiconductor substrate, and semiconductor device
#2430Method for fabrication of a semiconductor device and structure
#2431Semiconductor device and manufacturing method thereof
#2432Memory arrays, semiconductor constructions and electronic systems with transistor gates extending partially over SOI and unit cells within active region pedestals
#2433Substrates for monolithic optical circuits and electronic circuits
#2434Method for fabrication of a semiconductor device and structure
#2435Reverse construction memory cell
#2436Enhancing uniformity of a channel semiconductor alloy by forming STI structures after the growth process
#2437Reduced silicon thickness of N-channel transistors in SOI CMOS devices
#2438High-voltage SOI MOS device structure and method of fabrication
#2439Method for fabrication of a semiconductor device and structure
#2440Electronically scannable multiplexing device
#2441Inverter, logic circuit including an inverter and methods of fabricating the same
#2442Structure and method to form EDRAM on SOI substrate
#2443Method of reducing stacking faults through annealing
#2444Stressed semiconductor using carbon and method for producing the same
#2445Threshold voltage adjustment through gate dielectric stack modification
#2446Semiconductor device including a MOS transistor and production method therefor
#2447NROM flash memory devices on ultrathin silicon
#2448Nonvolatile semiconductor memory device and method for manufacturing the same
#2449Fabrication methods for radiation hardened isolation structures
#2450SOI (silicon on insulator) structure semiconductor device and method of manufacturing the same
#2451SRAM memory cell provided with transistors having a vertical multichannel structure
#2452Semiconductor device having increased gate length implemented by surround gate transistor arrangements
#2453Method of manufacturing a semiconductor device having fin-field effect transistor
#2454SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#2455Semiconductor device and manufacturing method thereof
#2456Apparatus of memory array using finfets
#2457SEMICONDUCTOR DEVICE AND DISPLAY DEVICE
#2458Trench structure and method of forming the trench structure
#2459Nonvolatile ferroelectric memory device
#2460Nanowire devices for enhancing mobility through stress engineering
#2461Apparatus of memory array using FinFETs
#2462Methods of forming printable integrated circuit devices by selective etching to suspend the devices from a handling substrate and devices formed thereby
#2463Method and structure for performing a chemical mechanical polishing process
#2464SOI radio frequency switch with enhanced electrical isolation
#2465Semiconductor integrated circuit, manufacturing method thereof, and semiconductor device using semiconductor integrated circuit
#2466Method of forming an electrical contact between a support wafer and the surface of a top silicon layer of a silicon-on-insulator wafer and an electrical device including such an electrical contact
#2467Integrated semiconductor device and method of manufacturing the same
#2468Method of manufacturing laminated wafer by high temperature laminating method
#2469Method for forming CMOS transistors having metal-containing gate electrodes formed on a high-K gate dielectric material
#2470Semiconductor device and production method therefor
#2471Semiconductor device and manufacturing method thereof
#2472Reducing transistor junction capacitance by recessing drain and source regions
#2473Replacement gate CMOS
#2474Through-gate implant for body dopant
#2475Structure for heavy ion tolerant device, method of manufacturing the same and structure thereof
#2476Semiconductor device and method for manufacturing the same
#2477Memory device having buried boosting plate and methods of operating the same
#2478Semiconductor device with selectively modulated gate work function
#2479SOI (silicon on insulator) substrate improvements
#2480Method and structure for performing a chemical mechanical polishing process
#2481Method and structure for performing a chemical mechanical polishing process
#2482System for fabricating nanocoils using a wet etch technique
#2483Semiconductor device and manufacturing methods with using non-planar type of transistors
#2484Field effect transistors with vertically oriented gate electrodes and methods for fabricating the same
#2485Semiconductor storage device
#2486Semiconductor storage device
#2487Production method for surrounding gate transistor semiconductor device
#2488Method of forming a semiconductor device
#2489Methods of fabrication of semiconductor devices with low capacitance
#2490Semiconductor device and production method therefor
#2491Semiconductor device including a nonvolatile memory element having first, second and third insulating films
#2492eDRAM memory cell structure and method of fabricating
#2493Semiconductor structure
#2494Semiconductor integrated circuit device and method of manufacturing the same
#2495Production method for semiconductor device
#2496High power device isolation and integration
#2497Body contacts for FET in SOI SRAM array
#2498Semiconductor storage device
#2499Method of manufacturing semiconductor devices
#2500SOI radio frequency switch with reduced signal distortion
#2501Semiconductor-on-insulator substrate and structure including multiple order radio frequency harmonic supressing region
#2502CMOS semiconductor device
#2503Semiconductor surround gate SRAM storage device
#2504Multiple crystallographic orientation semiconductor structures
#2505Gate dielectric/isolation structure formation in high/low voltage regions of semiconductor device
#2506Semiconductor device having a germanium layer as a channel and method for manufacturing the same
#2507Semiconductor device
#2508Reduction of thickness variations of a threshold semiconductor alloy by reducing patterning non-uniformities prior to depositing the semiconductor alloy
#2509Increased depth of drain and source regions in complementary transistors by forming a deep drain and source region prior to a cavity etch
#2510Embedded DRAM memory cell with additional patterning layer for improved strap formation
#2511Stacked transistors and electronic devices including the same
#2512LAMINATED FILM MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE
#2513INTERLAYER DIELECTRIC UNDER STRESS FOR AN INTEGRATED CIRCUIT
#2514Method and structure for performing a chemical mechanical polishing process
#2515METHOD OF SELECTIVE OXYGEN IMPLANTATION TO DIELECTRICALLLY ISOLATE SEMICONDUCTOR DEVICES USING NO EXTRA MASKS
#2516Method To Create SOI Layer For 3D-Stacking Memory Array
#2517Low cost fabrication of double box back gate silicon-on-insulator wafers with built-in shallow trench isolation in back gate layer
#2518Semiconductor device having switching element and method for fabricating semiconductor device having switching element
#2519Semiconductor on insulator (SOI) device including a discharge path for a decoupling capacitor
#2520LASER-IRRADIATED THIN FILMS HAVING VARIABLE THICKNESS
#2521Semiconductor device and method for manufacturing the same
#2522Semiconductor memory device having a floating storage bulk region capable of holding/emitting excessive majority carriers
#2523SEMICONDUCTOR DEVICE HAVING DUMMY BIT LINE STRUCTURE
#2524Method of fabricating hetero-junction bipolar transistor (HBT)
#2525Microelectromechanical systems structures and self-aligned high aspect-ratio combined poly and single-crystal silicon fabrication processes for producing same
#2526LOW COST FABRICATION OF DOUBLE BOX BACK GATE SILICON-ON-INSULATOR WAFERS WITH SUBSEQUENT SELF ALIGNED SHALLOW TRENCH ISOLATION
#2527Semiconductor device, method for manufacturing the same, and multilayer substrate having the same
#2528Low cost fabrication of double box back gate silicon-on-insulator wafers with built-in shallow trench isolation in back gate layer
#2529Method for manufacturing SOI substrate and semiconductor device
#2530Nonvolatile semiconductor memory device and method of manufacturing the same
#2531Silicon-On-Insulator Junction Field-Effect Transistor Having A Fully Depleted Body and Fabrication Method Therefor
#2532Junction Field-Effect Transistor Having Insulator-Isolated Source/Drain Regions and Fabrication Method Therefor
#2533Reduction of threshold voltage variation in transistors comprising a channel semiconductor alloy by reducing deposition non-uniformities
#2534Method for manufacturing CMOS circuits and CMOS circuits manufactured thereof
#2535SOI device with a buried insulating material having increased etch resistivity
#2536Method of fabricating a semiconductor on insulator device having a frontside substrate contact
#2537Transistor device comprising an embedded semiconductor alloy having an asymmetric configuration
#2538Metal High-K (MHK) Dual Gate Stress Engineering Using Hybrid Orientation (HOT) CMOS
#2539SOI radio frequency switch with enhanced signal fidelity and electrical isolation
#2540SOI radio frequency switch for reducing high frequency harmonics
#2541Semiconductor device and its manufacturing method
#2542Back gate doping for SOI substrates
#2543Technique for providing stress sources in transistors in close proximity to a channel region by recessing drain and source regions
#2544SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
#2545Stacked non-volatile memory device and methods for fabricating the same
#2546Method and structure for integrating capacitor-less memory cell with logic
#2547Method for forming semiconductor devices with active silicon height variation
#2548Anisotropic stress generation by stress-generating liners having a sublithographic width
#2549Vertical floating body cell of a semiconductor device and method for fabricating the same
#2550CMOS transistors with differential oxygen content high-K dielectrics
#2551Methods for producing a semiconductor device having planarization films
#2552SOI substrates and SOI devices, and methods for forming the same
#2553Method for reducing agglomeration of Si layer, method for manufacturing semiconductor device and vacuum treatment apparatus
#2554Process for production of SOI substrate and process for production of semiconductor device
#2555SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#2556Memory element with small threshold voltage variance and high-speed logic element with low power consumption
#2557Multi-thickness semiconductor with fully depleted devices and photonic integration
#2558Semiconductor device manufacturing method and semiconductor device
#2559Semiconductor device including a current mirror circuit
#2560Semiconductor device and method for manufacturing the same
#2561Semiconductor device with ESD protection function and ESD protection circuit
#2562Semiconductor devices and semiconductor device manufacturing methods
#2563Depletion-type NAND flash memory
#2564RESTRICTED STRESS REGIONS FORMED IN THE CONTACT LEVEL OF A SEMICONDUCTOR DEVICE
#2565SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
#2566Semiconductor device
#2567SEMICONDUCTOR-ON-INSULATOR (SOI) DEVICES USING VOID SPACES
#2568MICROWAVE ACTIVATION ANNEALING PROCESS
#2569Method for manufacturing semiconductor device
#2570Method for manufacturing semiconductor devices using embrittled layers
#2571Method for fabricating partial SOI substrate
#2572Nonvolatile semiconductor memory device and manufacturing method thereof
#2573Semiconductor device and method of manufacturing the same
#2574High performance capacitors in planar back gates CMOS
#2575CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials
#2576Method of manufacturing semiconductor storage device
#2577Semiconductor structure and method of forming the structure
#2578Semiconductor memory device
#2579Method of forming a guard ring or contact to an SOI substrate
#2580Recessed drain and source areas in combination with advanced silicide formation in transistors
#2581Ultrathin SOI CMOS devices employing differential STI liners
#2582Semiconductor device with increased channel area and fabrication method thereof
#2583Trench memory with self-aligned strap formed by self-limiting process
#2584Method for producing stacked and self-aligned components on a substrate
#2585APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
#2586Method of operating semiconductor device
#2587Semiconductor device having buried insulation films and method of manufacturing the same
#2588Semiconductor device with increased channel area
#2589Manufacturing method of semiconductor device comprising silicide layer with varied thickness
#2590Semiconductor device having controllable transistor threshold voltage
#2591SOI substrate contact with extended silicide area
#2592Manufacturing method of semiconductor substrate and semiconductor device
#2593SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
#2594Layer transfer process and functionally enhanced integrated circuits produced thereby
#2595eFuse and Resistor Structures and Method for Forming Same in Active Region
#2596Semiconductor device comprising a buried poly resistor
#2597SOI device with contact trenches formed during epitaxial growing
#2598Recessed gate silicon-on-insulator floating body device with self-aligned lateral isolation
#2599ULTRA-THIN OXIDE BONDING FOR SI TO SI DUAL ORIENTATION BONDING
#2600Semiconductor device with increased channel area and decreased leakage current
#2601Asymmetric channel doping for improved memory operation for floating body cell (FBC) memory
#2602Stacked semiconductor device and related method
#2603SOI device with more immunity from substrate voltage
#2604Method for producing a thyristor
#2605Semiconductor device
#2606Method and system for monolithic integration of photonics and electronics in CMOS processes
#2607Transistor, inverter including the same and methods of manufacturing transistor and inverter
#2608Structured strained substrate for forming strained transistors with reduced thickness of active layer
#2609Semiconductor device having vertical field effect transistor and method of manufacturing the same
#2610Method of manufacturing semiconductor device over SOI substrate
#2611Deep trench capacitor for SOI CMOS devices for soft error immunity
#2612SOI MuGFETs having single gate electrode level
#2613Logic switch and circuits utilizing the switch
#2614Semiconductor device and methods for fabricating same
#2615Method for simultaneously tensile and compressive straining the channels of NMOS and PMOS transistors respectively
#2616Method of producing a field effect transistor arrangement
#2617Dynamic memory cell methods
#2618Computing apparatus employing dynamic memory cell structures
#2619INTEGRATING FABRICATION OF PHOTODETECTOR WITH FABRICATION OF CMOS DEVICE ON A SILICON-ON-INSULATOR SUBSTRATE
#2620Method for fabricating semiconductor device having radiation hardened insulators
#2621SEMICONDUCTOR DEVICE
#2622Method of forming a high performance fet and a high voltage fet on a SOI substrate
#2623Dynamic random access memory cell and manufacturing method thereof
#2624Implementing decoupling capacitors with hot-spot thermal reduction on integrated circuit chips
#2625Semiconductor device including gate electrode having a laminate structure and plug electrically connected thereto
#2626Component comprising a thin-film transistor and CMOS-transistors and methods for production
#2627Semiconductor device and semiconductor device production system
#2628Self-aligned in-laid split gate memory and method of making
#2629Semiconductor devices with extended active regions
#2630Performance enhancement in PMOS and NMOS transistors on the basis of silicon/carbon material
#2631Transistor device and method of manufacturing such a transistor device
#2632Implementing Reduced Hot-Spot Thermal Effects for SOI Circuits
#2633SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING
#2634Direct contact to area efficient body tie process flow
#2635Memory device
#2636Three-dimensional silicon on oxide device isolation
#2637Localized biasing for silicon on insulator structures
#2638Trench capacitor for high voltage processes and method of manufacturing the same
#2639Backside illuminated image sensor with reduced dark current
#2640Metal high-k transistor having silicon sidewall for reduced parasitic capacitance
#2641Integration of a floating body memory on SOI with logic transistors on bulk substrate
#2642Dielectric layer above floating gate for reducing leakage current
#2643Planar Metal-Insulator-Metal Circuit Element and Method for Planar Integration of Same
#2644Manufacturing a semiconductor device via etching a semiconductor chip to a first layer
#2645THIN FILM TRANSISTOR ARRAY DEVICES
#2646Organic transistor having a non-planar semiconductor-insulating layer interface
#2647Method for manufacturing SOI substrate
#2648SEMICONDUCTOR DEVICE, INTEGRATED CIRCUIT, AND SEMICONDUCTOR MANUFACTURING METHOD
#2649CMOS devices incorporating hybrid orientation technology (HOT) with embedded connectors
#2650Memory device and method for manufacturing the same
#2651Memory device and method for manufacturing the same
#2652Silicon-on-insulator structures for through via in silicon carriers
#2653SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#2654SEMICONDUCTOR DEVICE AND SEMICONDUCTOR SUBSTRATE
#2655Strained-silicon-on-insulator single-and double-gate MOSFET and method for forming the same
#2656Semiconductor structure including gate electrode having laterally variable work function
#2657Defect-free hybrid orientation technology for semiconductor devices
#2658THIN SILICON SINGLE DIFFUSION FIELD EFFECT TRANSISTOR FOR ENHANCED DRIVE PERFORMANCE WITH STRESS FILM LINERS
#2659ISOLATING BACK GATES OF FULLY DEPLETED SOI DEVICES
#2660Method for manufacturing semiconductor device
#2661Integrated circuit chip with FETs having mixed body thicknesses and method of manufacture thereof
#2662Structure and design structure having isolated back gates for fully depleted SOI devices
#2663Switching device and testing apparatus
#2664Method to reduce parastic capacitance in a metal high dielectric constant (MHK) transistor
#2665Structures having lattice-mismatched single-crystalline semiconductor layers on the same lithographic level and methods of manufacturing the same
#2666Bipolar transistor and back-gated transistor structure and method
#2667Two-step STI formation process
#2668Methods for fabricating SOI devices
#2669Shallow trench isolation process utilizing differential liners
#2670Method for electronically pinning a back surface of a back-illuminated imager fabricated on a UTSOI wafer
#2671Storage cell having a T-shaped gate electrode and method for manufacturing the same
#2672Microstructure device including a compressively stressed low-k material layer
#2673Methods of Fabricating Transistors and Structures Thereof
#2674High-efficiency thinned imager with reduced boron updiffusion
#2675Stacked transistors and process
#2676ULTRA-THIN SOI CMOS WITH RAISED EPITAXIAL SOURCE AND DRAIN AND EMBEDDED SIGE PFET EXTENSION
#2677SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
#2678SOI deep trench capacitor employing a non-conformal inner spacer
#2679Method for Making Transistors and the Device Thereof
#2680Semiconductor substrate, semiconductor device, and method for manufacturing the semiconductor device
#2681Transistor with high-k dielectric sidewall spacer
#2682Structure and method for semiconductor power devices
#2683Semiconductor device and method for manufacturing the same
#2684Optical communication integration
#2685Method for manufacturing SOI substrate and semiconductor device
#2686Semiconductor device including a P-type field-effect transistor
#2687Integrated circuit including a body transistor and method
#2688Nonvolatile semiconductor memory device and manufacturing method thereof
#2689Method for forming doped polysilicon via connecting polysilicon layers
#2690Semiconductor device with multi-trench separation region
#2691SOI transistor with merged lateral bipolar transistor
#2692Metallized conductive strap spacer for SOI deep trench capacitor
#2693Method of adjusting FDSOI threshold voltage through oxide charges generation in the buried oxide
#2694Structure and method for elimination of process-related defects in poly/metal plate capacitors
#2695METHODS OF FORMING HIGH-K/METAL GATES FOR NFETS AND PFETS
#2696Semiconductor device and method for manufacturing same
#2697Simultaneous buried strap and buried contact via formation for SOI deep trench capacitor
#2698Increasing stress transfer efficiency in a transistor by reducing spacer width during the drain/source implantation sequence
#2699Method, structure and design structure for customizing history effects of SOI circuits
#2700SOI TRANSISTOR WITH FLOATING BODY FOR INFORMATION STORAGE HAVING ASYMMETRIC DRAIN/SOURCE REGIONS