ClassID:

208275

H01L29/158 - CPC Classification

Classification description:

Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor; Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed; Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices Structures without potential periodicity in a direction perpendicular to a major surface of the substrate, i.e. vertical direction, e.g. lateral superlattices, lateral surface superlattices [LSS]

Recent Application in this class:
#1
20250056825
2025-02-13

METHOD FOR MAKING NANOSTRUCTURE TRANSISTORS WITH OFFSET SOURCE/DRAIN DOPANT BLOCKING STRUCTURES INCLUDING A SUPERLATTICE

#2
20250056824
2025-02-13

METHOD FOR MAKING NANOSTRUCTURE TRANSISTORS WITH FLUSH SOURCE/DRAIN DOPANT BLOCKING STRUCTURES INCLUDING A SUPERLATTICE

#3
20240379766
2024-11-14

DMOS DEVICES INCLUDING A SUPERLATTICE AND FIELD PLATE FOR DRIFT REGION DIFFUSION

#4
20240322015
2024-09-26

Method for making nanostructure transistors with source/drain trench contact liners

#5
20240322014
2024-09-26

Method for making nanostructure transistors with flush source/drain dopant blocking structures including a superlattice

#6
20240304493
2024-09-12

METHOD FOR MAKING RADIO FREQUENCY SILICON-ON-INSULATOR (RFSOI) STRUCTURE INCLUDING A SUPERLATTICE

#7
20230411458
2023-12-21

Semiconductor device-including source and drain regions and superlattice pattern having a pillar shape

#8
20230395665
2023-12-07

Superlattice structure including two-dimensional material and device including the superlattice structure

#9
20230197833
2023-06-22

NANORIBBON-BASED QUANTUM DOT DEVICES

#10
20230164996
2023-05-25

Three dimensional memory device containing resonant tunneling barrier and high mobility channel and method of making thereof

#11
20230138899
2023-05-04

Semiconductor epitaxy structure

#12
20230064512
2023-03-02

Lateral bipolar transistor structure with superlattice layer and method to form same

#13
20220278204
2022-09-01

Semiconductor device including superlattice pattern

#14
20220109051
2022-04-07

Superlattice structure including two-dimensional material and device including the superlattice structure

#15
20220013658
2022-01-13

Quantum well stacks for quantum dot devices

#16
20210343841
2021-11-04

Semiconductor device including superlattice pattern

#17
20210257461
2021-08-19

Method for forming super-junction corner and termination structure with graded sidewalls

#18
20210005719
2021-01-07

2D crystal hetero-structures and manufacturing methods thereof

#19
20200350423
2020-11-05

Quantum well stacks for quantum dot devices

#20
20200321436
2020-10-08

Hexagonal arrays for quantum dot devices

#21
20200287036
2020-09-10

Source to channel junction for III-V metal-oxide-semiconductor field effect transistors (MOSFETs)

#22
20200161431
2020-05-21

Super-junction corner and termination structure with graded sidewalls

#23
20200152776
2020-05-14

Semiconductor process for quantum structures with staircase active well

#24
20200013720
2020-01-09

Stretchable form of single crystal silicon for high performance electronics on rubber substrates

#25
20190371892
2019-12-05

Superlattice structure including two-dimensional material and device including the superlattice structure

#26
20190305088
2019-10-03

Super-junction corner and termination structure with improved breakdown and robustness

#27
20190165106
2019-05-30

Group III-N nanowire transistors

#28
20190157402
2019-05-23

Power semiconductor device having a field electrode

#29
20190058038
2019-02-21

Forming a superjunction transistor device

#30
20190051647
2019-02-14

Semiconductor device and a manufacturing method therefor

#31
20180323071
2018-11-08

Stress relieving semiconductor layer

#32
20180308928
2018-10-25

Semiconductor device structure having carrier-trapping layers with different grain sizes

#33
20180294335
2018-10-11

Polarization-doped enhancement mode HEMT

#34
20180269291
2018-09-20

2D crystal hetero-structures and manufacturing methods thereof

#35
20180026143
2018-01-25

Super-junction schottky diode

#36
20180019310
2018-01-18

Power semiconductor device having a field electrode

#37
20180019160
2018-01-18

Semiconductor device and manufacturing method therefor

#38
20180012979
2018-01-11

Heterojunction bipolar transistor

#39
20180006147
2018-01-04

Method of manufacturing a super junction semiconductor device and super junction semiconductor device

#40
20170288022
2017-10-05

Group III-N nanowire transistors

#41
20170229611
2017-08-10

Stress relieving semiconductor layer

#42
20170117398
2017-04-27

METHOD FOR FORMATION OF VERTICAL CYLINDRICAL GaN QUANTUM WELL TRANSISTOR

#43
20170092661
2017-03-30

THIN FILM TRANSISTOR, ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE

#44
20170084735
2017-03-23

Silicon carbide semiconductor device and method for producing the same

#45
20170062587
2017-03-02

Method of Manufacturing a Semiconductor Device by Plasma Doping

#46
20170018624
2017-01-19

Horizontal gate all around device isolation

#47
20160336407
2016-11-17

Semiconductor devices with superlattice layers providing halo implant peak confinement and related methods

#48
20160336406
2016-11-17

Semiconductor devices with superlattice and punch-through stop (PTS) layers at different depths and related methods

#49
20160322488
2016-11-03

Method of manufacturing a semiconductor device including a gate electrode on a protruding group III-V material layer

#50
20160315153
2016-10-27

Group III-N nanowire transistors

#51
20160247885
2016-08-25

Stress relieving semiconductor layer

#52
20160211331
2016-07-21

Stress relieving semiconductor layer

#53
20160204202
2016-07-14

Quantum dot channel (QDC) quantum dot gate transistors, memories and other devices

#54
20160181407
2016-06-23

Method to fabricate quantum dot field-effect transistors without bias-stress effect

#55
20150270348
2015-09-24

SEMICONDUCTOR DEVICE INCLUDING SUPERLATTICE SIGE/SI FIN STRUCTURE

#56
20150214351
2015-07-30

Semiconductor device including superlattice SiGe/Si fin structure

#57
20150069327
2015-03-12

FIN FIELD-EFFECT TRANSISTORS WITH SUPERLATTICE CHANNELS

#58
20150001462
2015-01-01

Stretchable form of single crystal silicon for high performance electronics on rubber substrates

#59
20140070167
2014-03-13

Solid state cloaking for electrical charge carrier mobility control

#60
20140064312
2014-03-06

Epitaxial growth of in-plane nanowires and nanowire devices

#61
20130320512
2013-12-05

Semiconductor Device and Method of Manufacturing a Semiconductor Device

#62
20130119347
2013-05-16

Semiconductor device including a gate electrode on a protruding group III-V material layer and method of manufacturing the semiconductor device

#63
20110310920
2011-12-22

Epitaxial growth of in-plane nanowires and nanowire devices

#64
20110215299
2011-09-08

SEMICONDUCTOR DEVICE INCLUDING A SUPERLATTICE AND DOPANT DIFFUSION RETARDING IMPLANTS AND RELATED METHODS

#65
20100059863
2010-03-11

Stretchable form of single crystal silicon for high performance electronics on rubber substrates

#66
20080315170
2008-12-25

Quantum coherent switch utilizing commensurate nanoelectrode and charge density periodicities

#67
20080246022
2008-10-09

Method for producing planar transporting resonance heterostructures

#68
20080179664
2008-07-31

Semiconductor device with a vertical MOSFET including a superlattice and related methods

#69
20070012999
2007-01-18

Method for making a semiconductor device including regions of band-engineered semiconductor superlattice to reduce device-on resistance

#70
20070012911
2007-01-18

Semiconductor device including regions of band-engineered semiconductor superlattice to reduce device-on resistance

#71
20060286785
2006-12-21

Stretchable form of single crystal silicon for high performance electronics on rubber substrates

#72
20050042386
2005-02-24

Method of production of nano particle dispersed composite material

#73
20050018275
2005-01-27

Quantum coherent switch utilizing commensurate nanoelectrode and charge density periodicities

#74
15655532
2018-11-13

Semiconductor device with a buried junction layer having an interspersed pattern of doped and counter-doped materials

#75
15349092
2018-03-27

Power schottky diodes having local current spreading layers and methods of forming such devices