233419 ⎘
X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Radiation source for lithography process
#302Laser apparatus, EUV light generating system, and electronic device manufacturing method
#303Target expansion rate control in an extreme ultraviolet light source
#304Laser source device, extreme ultraviolet lithography device and method
#305Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#306Extreme ultraviolet light generation apparatus and electronic device manufacturing method
#307EUV collector contamination prevention
#308Lithography scanner
#309Generating extreme ultraviolet radiation with nanoscale antennas
#310Laser sustained plasma and endoscopy light source
#311Method and device for measuring contamination in EUV source
#312High brightness laser-produced plasma light source
#313Polarizer
#314Radiation system
#315Extreme ultraviolet light generation system
#316System and method for pumping laser sustained plasma with an illumination source having modified pupil power distribution
#317Residual gain monitoring and reduction for EUV drive laser
#318EUV LIGHT CONCENTRATING APPARATUS AND LITHOGRAPHY APPARATUS INCLUDING THE SAME
#319Extreme ultraviolet light generation apparatus and maintenance method
#320Shock wave visualization for extreme ultraviolet plasma optimization
#321Apparatus and method for generating an electromagnetic radiation
#322Extreme ultraviolet light generating apparatus
#323Method and apparatus for controlling exhaust pressure for an extreme ultraviolet generation chamber
#324Supply system for an extreme ultraviolet light source
#325Radiation Source Module and Lithographic Apparatus
#326Extreme ultraviolet exposure apparatus and method, and method of manufacturing semiconductor device by using the exposure method
#327Laser system, extreme ultraviolet light generation apparatus, and extreme ultraviolet light generation method
#328Laser source device and extreme ultraviolet lithography device
#329Droplet generator assembly and method for using the same and radiation source apparatus
#330Method for generating extreme ultraviolet radiation and an extreme ultraviolet (EUV) radiation source
#331Particle image velocimetry of extreme ultraviolet lithography systems
#332Optical system, metrology apparatus and associated method
#333Guiding device and associated system
#334Method and device for generating electromagnetic radiation by means of a laser-produced plasma
#335Extreme ultraviolet light generation apparatus
#336Laser apparatus and EUV light generating system
#337Apparatus and method for generating extreme ultraviolet radiation
#338Extreme ultraviolet light generation apparatus
#339Light source for lithography exposure process
#340Laser apparatus for generating extreme ultraviolet light
#341Extreme ultraviolet light sensor unit and extreme ultraviolet light generation apparatus
#342Apparatus and method for generating extreme ultraviolet radiation
#343High brightness short-wavelength radiation source (variants)
#344Process system and operating method thereof
#345Lithography system and method for exposing wafer
#346EUV generation device
#347Extreme ultraviolet light generation system
#348Light generation system using metal-nonmetal compound as precursor and related light generation method
#349EUV radiation source for lithography exposure process
#350Laser apparatus and EUV light generation system
#351Apparatus and method for prevention of contamination on collector of extreme ultraviolet light source
#352Target measuring apparatus and extreme ultraviolet light generation apparatus
#353System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
#354Extreme ultraviolet radiation source and cleaning method thereof
#355EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
#356Target supply device, extreme ultraviolet light generation device, and target supply method
#357EUV radiation modification methods and systems
#358Radial lithographic source homogenizer
#359Method of purifying target material for an EUV light source
#360EUV light source and apparatus for lithography
#361Droplet generator and method of servicing extreme ultraviolet radiation source apparatus
#362EUV light source and apparatus for lithography
#363Method and apparatus for controlling exhaust pressure for an extreme ultraviolet generation chamber
#364Method of operating semiconductor apparatus and semiconductor apparatus
#365Target trajectory metrology in an extreme ultraviolet light source
#366System and method for pumping laser sustained plasma with a frequency converted illumination source
#367Extreme ultraviolet light generation apparatus
#368Droplet discharge apparatus and calculation method
#369Light generator including debris shielding assembly, photolithographic apparatus including the light generator, and method of manufacturing integrated circuit device using the photolithographic apparatus
#370EUV collector contamination prevention
#371Extreme ultraviolet light generation apparatus
#372Extreme ultraviolet light generation system
#373Laser apparatus and extreme ultraviolet light generation system
#374Thomson scattering measurement system and EUV light generation system
#375EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
#376System and method for extreme ultraviolet source control
#377Extreme ultraviolet light generation apparatus
#378System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
#379Inspection device and inspection method
#380Reducing the effect of plasma on an object in an extreme ultraviolet light source
#381Target expansion rate control in an extreme ultraviolet light source
#382Target image capturing device and extreme ultraviolet light generation device
#383Electron beam transport system
#384Laser device and extreme ultraviolet light generation device using delay determination at a shutter
#385EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
#386EUV generating device
#387Target supply device, target material refining method, recording medium having target material refining program recorded therein, and target generator
#388Laser device and extreme ultraviolet light generation device
#389X-ray metrology system with broadband laser produced plasma illuminator
#390Apparatus for delivering gas and illumination source for generating high harmonic radiation
#391Target supply apparatus
#392Apparatus for and method of source material delivery in a laser produced plasma EUV light source
#393Extreme ultraviolet light generation device
#394System and method for extreme ultraviolet source control
#395High-brightness laser produced plasma source and methods for generating radiation and mitigating debris
#396Chamber apparatus, target generation method, and EUV light generation apparatus
#397Extreme ultraviolet light generation method
#398Laser device, and extreme ultraviolet light generation system
#399Methods and systems for aligning master oscillator power amplifier systems
#400Radiation source for lithography process
#401Target generation device and extreme ultraviolet light generation device
#402Optical pulse generation for an extreme ultraviolet light source
#403Droplet generator and method of servicing extreme ultraviolet imaging tool
#404Light source for lithography exposure process
#405Droplet collection device
#406Apparatus and method for generating extreme ultraviolet radiation
#407Apparatus and method for generating extreme ultraviolet radiation
#408Droplet collection device
#409DROPLET DETECTOR AND EUV LIGHT GENERATION DEVICE
#410System and method for generating extreme ultraviolet light
#411Light source for lithography exposure process
#412Extreme UV light generation device
#413Continuous-wave laser-sustained plasma illumination source
#414Optical element angle adjustment device and extreme ultraviolet light generation device
#415Collector pellicle
#416Extreme ultraviolet control system for adjusting droplet illumination parameters
#417Light source, EUV lithography system, and method for generating EUV radiation
#418Method of controlling debris in an EUV light source
#419Chamber device and extreme ultraviolet light generating device
#420Laser produced plasma light source having a target material coated on a cylindrically-symmetric element
#421Target trajectory metrology in an extreme ultraviolet light source
#422Bright and clean x-ray source for x-ray based metrology
#423X-ray spectrometer
#424Laser driven lamp
#425Extreme ultraviolet light generation device and method for controlling extreme ultraviolet light generation device
#426Laser driven lamp
#427Target supply device, processing device and processing method therefor
#428System and method for generating extreme ultraviolet light
#429High power broadband illumination source
#430Extreme ultraviolet light sensor unit and extreme ultraviolet light generation device
#431LASER-DRIVEN LIGHT SOURCE DEVICE
#432Tank, target generation device, and extreme-UV-light generation device
#433Illumination source for an inspection apparatus, inspection apparatus and inspection method
#434EUV light source and apparatus for lithography
#435Laser apparatus and extreme ultraviolet light generating system
#436Exteme ultraviolet radiation producing systems with driver laser systems having optical isolators
#437Methods and apparatus for optical metrology
#438Supply system for an extreme ultraviolet light source
#439Droplet generator for lithographic apparatus, EUV source and lithographic apparatus
#440Extreme ultraviolet light generating apparatus
#441System and method for generating extreme ultraviolet light, and laser apparatus
#442Laser device and laser device control method
#443Droplet timing sensor
#444Reducing the effect of plasma on an object in an extreme ultraviolet light source
#445Extreme ultraviolet light generating apparatus and control method for centroid of extreme ultraviolet light
#446Laser apparatus and extreme ultraviolet light generating system
#447TARGET SUPPLY DEVICE AND EUV LIGHT GENERATION APPARATUS
#448Structure of connection between optical unit and optical path tube
#449Broadband light source including transparent portion with high hydroxide content
#450Apparatus for and method of controlling debris in an EUV light source
#451EUV source generation method and related system
#452Residual gain monitoring and reduction for EUV drive laser
#453Extreme ultraviolet light generation device
#454Radiation system and optical device
#455Target supply device and extreme ultraviolet light generating device
#456Extreme ultraviolet light generation device
#457Amplifying laser pulses having different wavelengths for EUV radiation generation
#458Optical pulse generation for an extreme ultraviolet light source
#459Apparatus for delivering gas and illumination source for generating high harmonic radiation
#460TARGET GENERATION DEVICE AND EUV LIGHT GENERATION DEVICE
#461Extreme ultraviolet light generating apparatus using differing laser beam diameters
#462Calibrating apparatus and method
#463Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus
#464Extreme ultraviolet light generating apparatus
#465EUV source chamber and gas flow regime for lithographic apparatus, multi-layer mirror and lithographic apparatus
#466Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter
#467Reducing an optical power of a reflected light beam
#468Extreme ultraviolet light generation system
#469Extreme ultraviolet light generating apparatus
#470Extreme ultraviolet light generating apparatus
#471Extreme ultraviolet light generating device
#472Extreme ultraviolet light generating device
#473Modular laser-produced plasma X-ray system
#474MODULAR LASER-PRODUCED PLASMA X-RAY SYSTEM
#475Modular laser-produced plasma X-ray system
#476Extreme ultraviolet light generating system
#477Lithographic apparatus
#478Optical waveguide forming method and apparatus
#479EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER OUTPUT DURING EUV NON-OUTPUT PERIODS
#480Extreme ultraviolet light generating apparatus
#481Extreme ultraviolet lithography system with debris trapper on exhaust line
#482Extreme ultraviolet light generation device
#483Integrated rotary structure and fabrication method thereof
#484Radiation source, metrology apparatus, lithographic system and device manufacturing method
#485Extreme ultraviolet light generation device
#486Target storage device
#487System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
#488High-brightness light source
#489Extreme ultraviolet light generation apparatus
#490Target expansion rate control in an extreme ultraviolet light source
#491Discharge electrodes and light source device
#492Illumination source for an inspection apparatus, inspection apparatus and inspection method
#493Extreme ultraviolet light source
#494Source collector apparatus, lithographic apparatus and method
#495Device for controlling temperature of cooling water
#496System and method for generating extreme ultraviolet light
#497Extreme ultraviolet light generation device
#498Device and method for generating UV or X-ray radiation by means of a plasma
#499Target trajectory metrology in an extreme ultraviolet light source
#500Extreme ultraviolet light generation device
#501Illumination source for an inspection apparatus, inspection apparatus and inspection method
#502Optical isolation module
#503Radiation source
#504Laser apparatus and extreme ultraviolet light generation apparatus
#505Radiation system
#506Radiation source
#507Apparatus for and method of source material delivery in a laser produced plasma EUV light source
#508EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
#509Droplet detector and extreme ultraviolet light generating apparatus
#510Chamber device, target generation method, and extreme ultraviolet light generation system
#511Laser apparatus and measurement unit
#512LASER-DRIVEN LIGHT SOURCE DEVICE
#513Beam trap, beam guide device, EUV radiation generating apparatus, and method for absorbing a beam
#514Liquid level detection device, method of detecting liquid level, high temperature plasma raw material supply device and extreme ultra violet light source device
#515Laser-driven high repetition rate source of ultrashort relativistic electron bunches
#516Droplet dispensing device, method for providing droplets, and light source for providing UV or X-ray light
#517Adjusting a beam diameter and an aperture angle of a laser beam
#518Radiation source and lithographic apparatus
#519Laser apparatus and extreme ultraviolet light generation system
#520REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLET LIGHT SOURCE
#521Extreme UV light generation device and target recovery apparatus
#522Imaging spectrometer
#523Beam dump apparatus, laser apparatus equipped with the beam dump apparatus, and extreme ultraviolet light generating apparatus
#524EXTREME ULTRAVIOLET LIGHT GENERATING SYSTEM, EXTREME ULTRAVIOLET LIGHT GENERATING METHOD, AND THOMSON SCATTERING MEASUREMENT SYSTEM
#525Beam delivery system and control method therefor
#526Target supply device, processing device and processing method thefefor
#527Inspection method, inspection apparatus and illumination method and apparatus
#528Extreme ultraviolet light generating apparatus
#529Method and apparatus for purifying target material for EUV light source
#530Methods for 2-color radiography with laser-compton X-ray sources
#531Extreme ultraviolet light generation device
#532Extreme ultraviolet light generation device
#533Extreme ultraviolet light generation apparatus
#534VIBRATOR UNIT AND TARGET SUPPLY DEVICE
#535System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
#536EUV element having barrier to hydrogen transport
#537System and method for generating extreme ultraviolet light employing laser pulse including pedestal
#538Metrology methods, metrology apparatus and device manufacturing method
#539Laser apparatus and extreme ultraviolet light generating apparatus
#540EUV LPP source with improved dose control by tracking dose over specified window
#541Inspection apparatus and method
#542Extreme ultraviolet light generation system and method of generating extreme ultraviolet light
#543Laser sustained plasma light source with graded absorption features
#544Lithographic apparatus, spectral purity filter and device manufacturing method
#545Elongating a travel path of a light beam by an optical delay device
#546Transmission system for transmitting pulse laser beam to extreme ultraviolet light chamber, and laser system
#547System and method for electrodeless plasma ignition in laser-sustained plasma light source
#548Amplifying pulsed laser radiation for EUV radiation production
#549Plasma based light source having a target material coated on a cylindrically-symmetric element
#550Laser produced plasma light source having a target material coated on a cylindrically-symmetric element
#551Droplet generation for a laser produced plasma light source
#552EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD
#553System and method for analyzing a light beam guided by a beam guiding optical unit
#554Optical isolation module
#555Faceted EUV optical element
#556Apparatus for and method of active cleaning of EUV optic with RF plasma field
#557Targets and processes for fabricating same
#558Extreme ultraviolet light generation device
#559Extreme ultraviolet light source device
#560System and method for laser-sustained plasma illumination
#561Reduction of periodic oscillations in a source plasma chamber
#562EUV collector with orientation to avoid contamination
#563Monitoring laser beams
#564Method of improving measurement of energy of extreme ultraviolet radiation generated in a chamber
#565Extreme ultraviolet light generation apparatus
#566Laser apparatus, EUV light generation system, and method of controlling laser apparatus
#567Device for Monitoring the Alignment of a Laser Beam, and EUV Radiation Generating Apparatus having such a Device
#568Extreme ultraviolet light generation apparatus
#569Extreme UV light generator
#570System and method for generating extreme ultraviolet light, and laser apparatus
#571EUV light generator including collecting mirror having drip hole
#572System and method for imaging a sample with an illumination source modified by a spatial selective wavelength filter
#573Extreme ultraviolet light generation apparatus
#574Lithographic system
#575Systems and methods for controlling EUV energy generation using pulse intensity
#576Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation
#577Stabilizing EUV light power in an extreme ultraviolet light source
#578Target expansion rate control in an extreme ultraviolet light source
#579EUV light generator apparatus having a droplet generator configured to control a droplet position using a magnetic field
#580Extreme ultraviolet light generation system
#581System and method for generating extreme ultraviolet light
#582METHOD, APPARATUS AND SYSTEM FOR PROVIDING MULTIPLE EUV BEAMS FOR SEMICONDUCTOR PROCESSING
#583Solution for EUV power increment at wafer level
#584High efficiency laser-sustained plasma light source
#585Target supply device and EUV light generation apparatus
#586Component for a radiation source, associated radiation source and lithographic apparatus
#587Extreme ultraviolet light source, exposure apparatus, and integrated rotary structure fabricating method
#588Method for EUV power improvement with fuel droplet trajectory stabilization
#589Laser apparatus and laser apparatus manufacturing method
#590Protecting a vacuum environment from leakage
#591Apparatus and a method for operating a sealed beam lamp containing an ionizable medium
#592MEASURING ARRANGEMENT FOR USE WHEN DETERMINING TRAJECTORIES OF FLYING OBJECTS
#593Extreme UV radiation light source device
#594Beam propagation camera and method for light beam analysis
#595System for generating extreme ultra violet light
#596Laser apparatus
#597Radiation source
#598Light source apparatus
#599Target supply apparatus, extreme ultraviolet light generating apparatus, and target supply method
#600X-ray pulse source and method for generating X-ray pulses