ClassID:

242034

Y10S438/945 - CPC Classification

Classification description:

Semiconductor device manufacturing: process; Masking Special, e.g. metal

Recent Application in this class:
#1
20170002127
2017-01-05

Process for the nanostructuring of a block copolymer film using a nonstructured block copolymer based on styrene and on methyl methacrylate, and nanostructured block copolymer film

#2
20130049158
2013-02-28

Formation of metal nanospheres and microspheres

#3
20130049150
2013-02-28

Formation of metal nanospheres and microspheres

#4
20120171791
2012-07-05

Method for fabricating light emitting diode chip

#5
20120099011
2012-04-26

CMOS imager with integrated circuitry

#6
20120041121
2012-02-16

Method for manufacturing porous structure and method for forming pattern

#7
20120037595
2012-02-16

Method for manufacturing porous structure and method for forming pattern

#8
20120037594
2012-02-16

Method for manufacturing porous structure and method for forming pattern

#9
20120034770
2012-02-09

Liquid crystal display device and method of fabricating the same

#10
20110228153
2011-09-22

CMOS imager with integrated circuitry

#11
20110039361
2011-02-17

Liquid crystal display device and method of fabricating the same

#12
20100193917
2010-08-05

Methods of isolating array features during pitch doubling processes and semiconductor device structures having isolated array features

#13
20100193913
2010-08-05

Method for producing semiconductor device

#14
20100171167
2010-07-08

Gated semiconductor device and method of fabricating same

#15
20100120216
2010-05-13

Transistor fabrication method

#16
20100048004
2010-02-25

Method for manufacturing semiconductor device using multiple ion implantation masks

#17
20090284623
2009-11-19

CMOS imager with integrated circuitry

#18
20090243114
2009-10-01

Densely packed metal segments patterned in a semiconductor die

#19
20090233391
2009-09-17

Liquid crystal display device and method of fabricating the same

#20
20090162959
2009-06-25

Method for fabricating light emitting diode element

#21
20090130380
2009-05-21

Method for manufacturing porous structure and method for forming pattern

#22
20080308906
2008-12-18

GaN substrate, substrate with epitaxial layer, semiconductor device, and method of manufacturing GaN substrate

#23
20080296732
2008-12-04

Methods of isolating array features during pitch doubling processes and semiconductor device structures having isolated array features

#24
20080280403
2008-11-13

TRANSISTOR FABRICATION METHOD

#25
20080248620
2008-10-09

Gated semiconductor device and method of fabricating same

#26
20080233488
2008-09-25

Mask with hydrophobic surface

#27
20080213956
2008-09-04

Field effect transistor device including an array of channel elements

#28
20080032437
2008-02-07

Exposure method for upper layer of hole of semiconductor device

#29
20070224835
2007-09-27

Semiconductor device and method of manufacturing semiconductor device

#30
20070114534
2007-05-24

Polycrystalline silicon thin film, fabrication method thereof, and thin film transistor without directional dependency on active channels fabricated using the same

#31
20070066006
2007-03-22

Method and structure for electrostatic discharge protection of photomasks

#32
20070051311
2007-03-08

System for and method of forming via holes by multiple deposition events in a continuous inline shadow mask deposition process

#33
20070020936
2007-01-25

Methods of etching features into substrates

#34
20060275990
2006-12-07

Semiconductor device and method of producing same

#35
20060264018
2006-11-23

Masking methods

#36
20060249784
2006-11-09

Field effect transistor device including an array of channel elements and methods for forming

#37
20060231525
2006-10-19

Method for manufacturing porous structure and method for forming pattern

#38
20060205220
2006-09-14

Stabilized photoresist structure for etching process

#39
20060166517
2006-07-27

Phase-shifting mask and semiconductor device

#40
20060157443
2006-07-20

Pattern reversal process for self aligned imprint lithography and device

#41
20060141761
2006-06-29

System for and method of forming via holes by multiple deposition events in a continuous inline shadow mask deposition process

#42
20060094251
2006-05-04

Multi-layer film stack for extinction of substrate reflections during patterning

#43
20060089003
2006-04-27

Method for removing polymer as etching residue

#44
20060086954
2006-04-27

Multi-layer film stack for extinction of substrate reflections during patterning

#45
20050285120
2005-12-29

Polycrystalline silicon thin film, fabrication method thereof, and thin film transistor without directional dependency on active channels fabricated using the same

#46
20050247671
2005-11-10

Method of making a textured surface

#47
20050224455
2005-10-13

Method for making a semiconductor device using treated photoresist as an implant mask

#48
20050181630
2005-08-18

Method of making a semiconductor device using treated photoresist

#49
20050145169
2005-07-07

Apparatus for improving stencil/screen print quality

#50
20050145119
2005-07-07

Apparatus for fluid pressure imprint lithography

#51
20050142699
2005-06-30

Method and structure for electrostatic discharge protection of photomasks

#52
20050112792
2005-05-26

CMOS imager with integrated non-volatile memory

#53
20050093025
2005-05-05

Method for making nanoscale wires and gaps for switches and transistors

#54
20050042879
2005-02-24

Masking methods

#55
20050032264
2005-02-10

Method of manufacturing a semiconductor device with outline of cleave marking regions and alignment or registration features