242039 ⎘
Semiconductor device manufacturing: process; Masking; Radiation resist Multilayer mask including nonradiation sensitive layer
METHOD FOR FORMING PATTERNED MASK LAYER
#2Method for forming patterned mask layer
#3Method for forming patterned mask layer
#4SEMICONDUCTOR ELEMENT AND DISPLAY DEVICE USING THE SAME
#5Alternating hardmasks for tight-pitch line formation
#6Semiconductor element and display device using the same
#7Semiconductor element and display device using the same
#8Alternating hardmasks for tight-pitch line formation
#9Alternating hardmasks for tight-pitch line formation
#10Semiconductor element and display device using the same
#11Packaging apparatus for deposition masks
#12Semiconductor element and display device using the same
#13Process variability tolerant hard mask for replacement metal gate finFET devices
#14Triple patterning method
#15Semiconductor element and display device using the same
#16Semiconductor element and display device using the same
#17Method for etching substrate
#18Semiconductor element and display device using the same
#19Method of forming shielded gate power transistor utilizing chemical mechanical planarization
#20Semiconductor device with mushroom electrode and manufacture method thereof
#21Pitch multiplication using self-assembling materials
#22Method for forming active and gate runner trenches
#23Semiconductor element and display device using the same
#24Semiconductor element and display device using the same
#25Method for integrated circuit fabrication using pitch multiplication
#26Semiconductor device with mushroom electrode and manufacture method thereof
#27Method to align mask patterns
#28Integral patterning of large features along with array using spacer mask patterning process flow
#29Semiconductor element and display device using the same
#30Method for an integrated circuit contact
#31Method for forming pattern of a semiconductor device
#32Method of fabricating semiconductor device
#33METHOD OF TRIMMING A HARD MASK LAYER, METHOD FOR FABRICATING A GATE IN A MOS TRANSISTOR, AND A STACK FOR FABRICATING A GATE IN A MOS TRANSISTOR
#34Method of forming a contact hole and method of manufacturing a semiconductor device having the same
#35Hard mask patterns of a semiconductor device and a method for forming the same
#36Power trench gate FET with active gate trenches that are contiguous with gate runner trench
#37Pitch multiplication using self-assembling materials
#38Frequency tripling using spacer mask having interposed regions
#39Method for manufacturing semiconductor device
#40Method of fabricating short-gate-length electrodes for integrated III-V compound semiconductor devices
#41Method of trimming a hard mask layer, method for fabricating a gate in a MOS transistor, and a stack for fabricating a gate in a MOS transistor
#42Method for forming fine pattern in semiconductor device
#43Semiconductor device with mushroom electrode and manufacture method thereof
#44Method of forming hardmask pattern of semiconductor device
#45Method for an integrated circuit contact
#46Guard ring for improved matching
#47Method to align mask patterns
#48Semiconductor device with mushroom electrode and manufacture method thereof
#49Trench-gated FET for power device with active gate trenches and gate runner trench utilizing one-mask etch
#50Method for forming a mask pattern for ion-implantation
#51Method for integrated circuit fabrication using pitch multiplication
#52Pattern density control using edge printing processes
#53Method of fabricating semiconductor device
#54Light emitting device methods
#55Liquid crystal display device and fabricating method thereof
#56Semiconductor device and method of manufacturing the same
#57Method for integrated circuit fabrication using pitch multiplication
#58Method for integrated circuit fabrication using pitch multiplication
#59Method to align mask patterns
#60System and method for manufacturing semiconductor devices using a vacuum chamber
#61Multi-layer film stack for extinction of substrate reflections during patterning
#62Multi-layer film stack for extinction of substrate reflections during patterning
#63Optical coatings
#64Guard ring for improved matching
#65Method for integrated circuit fabrication using pitch multiplication
#66Method to align mask patterns
#67Semiconductor element and display device using the same
#68Gate electrode and manufacturing method thereof, and semiconductor device and manufacturing method thereof
#69Method of forming patterns
#70Controlled dry etch of a film
#71Patterned ceramic films and method for producing the same
#72Resist protect oxide structure of sub-micron salicide process
#73Method of forming a reflective electrode and a liquid crystal display device
#74Controlled dry etch of a film
#75Method for an integrated circuit contact
#76Method for an integrated circuit contact
#77Method for an integrated circuit contact
#78Method for preventing formation of photoresist scum