Y10S438/948 - CPC Classification Index

ClassID:

242037 ⎘

Y10S438/948 - CPC Classification

Classification description:

Semiconductor device manufacturing: process; Masking Radiation resist

Sub-classes:

Y10S438/949 » Energy beam treating radiation resist on semiconductor 52
Y10S438/95 » Multilayer mask including nonradiation sensitive layer 77
Y10S438/951 » Lift-off 52
Y10S438/952 » Utilizing antireflective layer 92

Recent Application in this class:

20150017808

2015-01-15

Method of forming fine patterns of semiconductor device

20140220786

2014-08-07

Methods for optical proximity correction in the design and fabrication of integrated circuits

20140103251

2014-04-17

Compositions for use in semiconductor devices

20120276744

2012-11-01

Patterning method for high density pillar structures

20120156450

2012-06-21

MULTI-EXPOSURE LITHOGRAPHY EMPLOYING DIFFERENTIALLY SENSITIVE PHOTORESIST LAYERS

20120128942

2012-05-24

Double patterning with inline critical dimension slimming

20120128935

2012-05-24

Sidewall image transfer pitch doubling and inline critical dimension slimming

20110306174

2011-12-15

Patterning method for high density pillar structures

20110198744

2011-08-18

Land grid array package capable of decreasing a height difference between a land and a solder resist

#10

20110171815

2011-07-14

Patterning method for high density pillar structures

#11

20110097835

2011-04-28

Photoresist composition and method of manufacturing a display substrate using the same

#12

20100144155

2010-06-10

Method of manufacturing semiconductor device

#13

20100075478

2010-03-25

Method for photoresist pattern removal

#14

20090311491

2009-12-17

Multi-exposure lithography employing differentially sensitive photoresist layers

#15

20090186484

2009-07-23

Pattern formation method

#16

20090001314

2009-01-01

Compositions for use in semiconductor devices

#17

20080283796

2008-11-20

Compositions for Dissolution of Low-K Dielectric Films, and Methods of Use

#18

20080261386

2008-10-23

Sample wafer fabrication method

#19

20080213956

2008-09-04

Field effect transistor device including an array of channel elements

#20

20080044958

2008-02-21

Method of fabricating complementary metal-oxide semiconductor (CMOS) thin film transistor (TFT)

#21

20070158302

2007-07-12

Systems and methods for gas assisted resist removal

#22

20070152305

2007-07-05

Method for forming a mask pattern for ion-implantation

#23

20070117361

2007-05-24

Method for manufacturing an SOI substrate

#24

20060263982

2006-11-23

Method of fabricating semiconductor device

#25

20060249784

2006-11-09

Field effect transistor device including an array of channel elements and methods for forming

#26

20060199388

2006-09-07

System and method for manufacturing semiconductor devices using a vacuum chamber

#27

20060040215

2006-02-23

Pattern formation method

#28

20050245056

2005-11-03

Ion implantation with multiple concentration levels

#29

20050164128

2005-07-28

Mask for manufacturing semiconductor device and method of manufacture thereof

#30

20050118831

2005-06-02

Gas assisted method for applying resist stripper and gas-resist stripper combinations

#31

20050032264

2005-02-10

Method of manufacturing a semiconductor device with outline of cleave marking regions and alignment or registration features

#32

20050029517

2005-02-10

Method of forming a reflective electrode and a liquid crystal display device