242041 ⎘
Semiconductor device manufacturing: process; Masking; Radiation resist Utilizing antireflective layer
Method of forming fine patterns of semiconductor device
#2Material with tunable index of refraction
#3Anti-reflective coatings using vinyl ether crosslinkers
#4Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
#5Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
#6Hardmask composition having antireflective properties and method of patterning material on substrate using the same
#7Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
#8Polymer for organic anti-reflective coating layer and composition including the same
#9Method for fabricating a semiconductor device by considering the extinction coefficient during etching of an interlayer insulating film
#10Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound
#11Antireflective coating compositions
#12Methods of forming dual-damascene metal interconnect structures using multi-layer hard masks
#13Graded topcoat materials for immersion lithography
#14Pattern formation in semiconductor fabrication
#15Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
#16Top antireflective coating composition containing hydrophobic and acidic groups
#17Ultra dark polymer
#18Self-segregating multilayer imaging stack with built-in antireflective properties
#19ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS
#20Deep trench in a semiconductor structure
#21Method for fabricating a semiconductor device by considering the extinction coefficient during etching of an interlayer insulating film
#22Anti-reflection film forming material, and method for forming resist pattern using the same
#23Method of fabricating semiconductor device
#24Fabrication of semiconductor devices using anti-reflective coatings
#25In situ deposition of a low κ dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application
#26Antireflective coating composition, antireflective coating, and patterning process
#27Method of pattern formation in semiconductor fabrication
#28Copolymer and composition for organic and antireflective layer
#29GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
#30Process of making a semiconductor device using multiple antireflective materials
#31Graded topcoat materials for immersion lithography
#32Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same
#33Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application
#34Forming fine pattern of semiconductor device using three mask layers and CMP of spin-on carbon layer
#35Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structure
#36Graded spin-on organic antireflective coating for photolithography
#37Polymer for organic anti-reflective coating layer and composition including the same
#38Method of depositing thin film and method of manufacturing semiconductor using the same
#39Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
#40Antireflective coating compositions
#41Monomer for forming organic anti-reflective coating layer, polymer thereof and composition including the same
#42Antireflective coating compositions
#43Positive-working photoimageable bottom antireflective coating
#44Method of forming a semiconductor device
#45Condensation type polymer-containing anti-reflective coating for semiconductor
#46Positive-working photoimageable bottom antireflective coating
#47Antireflective composition for photoresists
#48Top antireflective coating composition containing hydrophobic and acidic groups
#49Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application
#50Graded spin-on organic antireflective coating for photolithography
#51Sulfonate-containing anti-reflective coating forming composition for lithography
#52Anti-reflective coating composition and production method for pattern using the same
#53Process of making a semiconductor device using multiple antireflective materials
#54Method for direct electroplating of copper onto a non-copper plateable layer
#55Methods for metal ARC layer formation
#56Semiconductor device having an organic anti-reflective coating (ARC) and method therefor
#57Ultra dark polymer
#58Anti-reflective coatings using vinyl ether crosslinkers
#59Integrated circuit capacitor having antireflective dielectric
#60Anti-reflective coatings
#61Antireflective film and exposure method
#62Hardmask etch for gate polyetch
#63Top antireflective coating composition with low refractive index at 193nm radiation wavelength
#64Method of fabricating semiconductor device
#65Anti-reflective coating forming composition containing polyamic acid
#66Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
#67Deep trench formation in semiconductor device fabrication
#68Masking methods
#69Method of patterning a low-k dielectric using a hard mask
#70Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compound
#71Integrated circuit capacitor having antireflective dielectric
#72Fabrication of semiconductor devices using anti-reflective coatings
#73System and method for manufacturing semiconductor devices using a vacuum chamber
#74Low refractive index polymers as underlayers for silicon-containing photoresists
#75Low refractive index polymers as underlayers for silicon-containing photoresists
#76Multi-layer film stack for extinction of substrate reflections during patterning
#77In situ deposition of a low K dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application
#78Multi-layer film stack for extinction of substrate reflections during patterning
#79Deep trench formation in semiconductor device fabrication
#80Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same
#81Anti-reflective coatings using vinyl ether crosslinkers
#82Three-level unitary interconnect structure
#83Positive-working photoimageable bottom antireflective coating
#84Nitrogen-free ARC layer and a method of manufacturing the same
#85Silicon carbide deposition for use as a low dielectric constant anti-reflective coating
#86Semiconductor device having an organic anti-reflective coating (ARC) and method therefor
#87Methods of fabricating contact interfaces
#88Method for forming openings in low-k dielectric layers
#89Method for fabricating semiconductor device with fine patterns
#90Masking methods
#91Semiconductor device having an organic anti-reflective coating (ARC) and method therefor
#92Rework process of patterned photo-resist layer