Y10S977/854 - CPC Classification Index

ClassID:

243642 ⎘

Y10S977/854 - CPC Classification

Classification description:

Nanotechnology; Manufacture, treatment, or detection of nanostructure with scanning probe for detection of specific nanostructure sample or nanostructure-related property Semiconductor sample

Recent Application in this class:

20130180018

2013-07-11

Quantitative characterization of metallic and semiconductor single-walled carbon nanotube ratios

20100330345

2010-12-30

Methods utilizing scanning probe microscope tips and products thereof or produced thereby

20100108907

2010-05-06

Charged-particle optical system with dual loading options

20100023287

2010-01-28

Techniques for electrically characterizing tunnel junction film stacks with little or no processing

20090309587

2009-12-17

Techniques for electrically characterizing tunnel junction film stacks with little or no processing

20090267597

2009-10-29

Techniques for electrically characterizing tunnel junction film stacks with little or no processing

20090261820

2009-10-22

Wafer for electrically characterizing tunnel junction film stacks with little or no processing

20080147346

2008-06-19

Method and apparatus for aligning patterns on a substrate

20070075243

2007-04-05

Scanning probe microscopy method and apparatus utilizing sample pitch

#10

20060225164

2006-10-05

Scanning probe characterization of surfaces

#11

20050181132

2005-08-18

Methods utilizing scanning probe microscope tips and products therefor or produced thereby

#12

20050172704

2005-08-11

Methods utilizing scanning probe microscope tips and products thereof or produced thereby

#13

20050130341

2005-06-16

Selective synthesis of semiconducting carbon nanotubes

#14

20050127926

2005-06-16

Method using conductive atomic force microscopy to measure contact leakage current