ClassID:

248386

Y10T117/108 - CPC Classification

Classification description:

Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor; Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone Including a solid member other than seed or product contacting the liquid [e.g., crucible, immersed heating element]

Recent Application in this class:
#1
20190136407
2019-05-09

SINGLE CRYSTAL INGOTS WITH REDUCED DISLOCATION DEFECTS AND METHODS FOR PRODUCING SUCH INGOTS

#2
20180100246
2018-04-12

SINGLE CRYSTAL INGOTS WITH REDUCED DISLOCATION DEFECTS AND METHODS FOR PRODUCING SUCH INGOTS

#3
20170186937
2017-06-29

System and fabrication method of piezoelectric stack that reduces driving voltage and clamping effect

#4
20150354087
2015-12-10

Apparatus and process for producing a crystal of semiconductor material

#5
20150159296
2015-06-11

Crystal growth system and method for lead-contained compositions using batch auto-feeding

#6
20140338591
2014-11-20

Converging mirror furnace

#7
20120137975
2012-06-07

Gas flow guiding device for use in crystal-growing furnace

#8
20110303884
2011-12-15

SiC Crystals Having Spatially Uniform Doping Impurities

#9
20100294198
2010-11-25

Crystal growing system having multiple rotatable crucibles and using a temperature gradient method

#10
20100162946
2010-07-01

System for continuous growing of monocrystalline silicon

#11
20100154703
2010-06-24

Silica glass crucible

#12
20100034723
2010-02-11

METHOD AND APPARATUS FOR REFINING A MOLTEN MATERIAL

#13
20100018455
2010-01-28

System for forming SiC crystals having spatially uniform doping impurities

#14
20090241829
2009-10-01

Crystal growth system and method for lead-contained compositions using batch auto-feeding

#15
20090188427
2009-07-30

Device for making monocrystalline or multicrystalline materials, in particular multicrystalline silicon

#16
20090056628
2009-03-05

Process and apparatus for forming nanoparticles using radiofrequency plasmas

#17
20090038934
2009-02-12

APPARATUS AND METHOD FOR DIAMOND PRODUCTION

#18
20080196209
2008-08-21

Method and apparatus for refining a molten material

#19
20080173234
2008-07-24

Crucible and single crystal growth method using crucible

#20
20080134958
2008-06-12

System for continuous growing of monocrystalline silicon

#21
20080134957
2008-06-12

Powder metallurgy crucible for aluminum nitride crystal growth

#22
20080110394
2008-05-15

Semiconductor single crystal production device and producing method therefor

#23
20070277729
2007-12-06

Method and device for producting monocrystals

#24
20070266931
2007-11-22

Device and method for the production of monocrystalline or multicrystalline materials, in particular multicrystalline silicon

#25
20070241481
2007-10-18

Method for the growth of semiconductor ribbons

#26
20070193505
2007-08-23

Apparatus and method for diamond production

#27
20060243984
2006-11-02

Method of and system for forming SiC crystals having spatially uniform doping impurities

#28
20060174822
2006-08-10

Crucible and method of growing single crystal by using crucible

#29
20060051505
2006-03-09

Process and apparatus for forming nanoparticles using radiofrequency plasmas

#30
20050223967
2005-10-13

Powder metallurgy crucible for aluminum nitride crystal growth

#31
20050178316
2005-08-18

Method and apparatus for purification of crystal material and for making crystals therefrom and use of crystals obtained thereby

#32
20050160969
2005-07-28

Apparatus and method for diamond production

#33
20050152820
2005-07-14

High temperature high pressure capsule for processing materials in supercritical fluids

#34
20050092236
2005-05-05

System for continuous growing of monocrystalline silicon