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Inventor profile of:

Liesbeth Witters

City:

Linden

Country:

Belgium

Published Applications:

6

Last publication date:

2016-05-05

Top Assignees for applications by Liesbeth Witters

The entities that hold a legal rights for patent applications filed by inventor Witters Liesbeth:

  • IMEC VZW 5 Leuven, Belgium
  • SAMSUNG ELECTRONICS CO., LTD. 1 Suwon-si, South Korea
  • SAMSUNG ELECTRONICS CO., LTD. 1 Gyeonggi-Do, South Korea

Recent patent applications by Witters Liesbeth

Liesbeth Witters from Linden, BE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2016-05-05
US20160126131A1
Electricity

Method for forming a transistor structure comprising a fin-shaped channel structure

#2 | 2016-01-28
US20160027780A1
Electricity

Method for forming a germanium channel layer for an NMOS transistor device, NMOS transistor device and CMOS device

#3 | 2016-01-28
US20160027779A1
Electricity

Method for providing an NMOS device and a PMOS device on a silicon substrate and silicon substrate comprising an NMOS device and a PMOS device

#4 | 2015-08-13
US20150228502A1
Electricity

Contact formation in Ge-containing semiconductor devices

#5 | 2015-03-19
US20150076620A1
Electricity

METHOD FOR MANUFACTURING TRANSISTORS AND ASSOCIATED SUBSTRATE

#6 | 2014-12-25
US20140377936A1
Electricity

Method for forming a strained semiconductor structure

InventorID:

1014984 ⎘

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