Monte Sereno, California
United States
35
2022-06-23
The entities that hold a legal rights for patent applications filed by inventor Yam Mark:
Mark Yam from Monte Sereno, US has applied for patents for these inventions. The list has both pending applications and granted patents:
INJECTION MOLD COOLING TECHNIQUES
#2 | 2021-02-25Annealing apparatus using two wavelengths of radiation
#3 | 2019-05-09Method of thermal processing structures formed on a substrate
#4 | 2018-04-12Annealing apparatus using two wavelengths of radiation
#5 | 2015-03-12Annealing apparatus using two wavelengths of radiation
#6 | 2015-02-26Thermal processing by scanning a laser line beam
#7 | 2015-02-10Single-chamber sequential curing of semiconductor wafers
#8 | 2012-10-18Annealing apparatus using two wavelengths of continuous wave laser radiation
#9 | 2012-09-20Annealing apparatus using two wavelengths of continuous wave laser radiation
#10 | 2012-09-20Annealing apparatus using two wavelengths of laser radiation
#11 | 2012-09-20Annealing apparatus using two wavelengths of continuous wave laser radiation
#12 | 2012-08-16Scanned laser light source
#13 | 2012-06-14Method of thermal processing structures formed on a substrate
#14 | 2012-03-20Single-chamber sequential curing of semiconductor wafers
#15 | 2011-04-28Thermal flux processing by scanning a focused line beam
#16 | 2010-12-23Method of thermal processing structures formed on a substrate
#17 | 2010-10-21Annealing apparatus using two wavelengths of continuous wave laser radiation
#18 | 2009-12-17Method of annealing using two wavelengths of continuous wave laser radiation
#19 | 2008-09-25ABSORBER LAYER FOR DSA PROCESSING
#20 | 2008-02-21Thermal flux processing by scanning a focused line beam
#21 | 2007-12-20Method of laser annealing using two wavelengths of radiation
#22 | 2007-10-18ABSORBER LAYER FOR DSA PROCESSING
#23 | 2007-09-20Method of thermal processing structures formed on a substrate
#24 | 2007-09-13METHOD OF THERMAL PROCESSING STRUCTURES FORMED ON A SUBSTRATE
#25 | 2007-05-24Scanning laser light source
#26 | 2007-05-17Thermal flux processing by scanning a focused line beam
#27 | 2006-12-28ABSORBER LAYER FOR DSA PROCESSING
#28 | 2006-12-21Gate electrode dopant activation method for semiconductor manufacturing
#29 | 2006-10-19Dual wavelength thermal flux laser anneal
#30 | 2006-05-09Stepped reflector plate
#31 | 2006-01-17Thermal flux processing by scanning
#32 | 2005-10-06Thermal flux processing by scanning a focused line beam
#33 | 2005-08-25Gate electrode dopant activation method for semiconductor manufacturing including a laser anneal
#34 | 2005-04-07Absorber layer for DSA processing
#35 | 2005-04-07Absorber layer for DSA processing
1076347 ⎘