Daegu
South Korea
8
2026-05-07
The entities that hold a legal rights for patent applications filed by inventor YANG Chul-Kyu:
Chul-Kyu YANG from Daegu, KR has applied for patents for these inventions. The list has both pending applications and granted patents:
BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH HARD MASK FILM CONTAINING CHROME AND NIOBIUM
#2 | 2025-07-17REVERSE PHOTOMASK THAT PHASE SHIFT FILM PATTERN IS USED FOR REFLECTIVE PATTERN, AND BLANKMASK FOR MANUFACTURING THE SAME
#3 | 2025-04-17PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH ABSORBING FILM OF CrSb
#4 | 2024-10-03PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
#5 | 2024-10-03BLANKMASK FOR EUV LITHOGRAPHY WITH ABSORBING FILM, AND PHOTOMASK FABRICATED WITH THE SAME
#6 | 2024-04-18PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
#7 | 2015-09-24Blankmask and photomask using the same
#8 | 2015-04-02Blankmask and photomask
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