Assignee profile:

S&S TECH CO., LTD.

City:

Daegu-si

Country:

South Korea

Published Applications:

24

Last publication date:

2024-04-18

Patent Grants:

16

Last grant date:

2026-02-03

Top Inventors for applications by S&S TECH CO., LTD.

These are the the leading inventors for applications assigned to S&S TECH CO., LTD.:

Recent patent applications by S&S TECH CO., LTD.

S&S TECH CO., LTD. based in Daegu-si, KR has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2024-04-18
US20240126163A1
Physics

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

#2 | 2024-04-18 ✅ Patent 12,541,144 granted on 2026-02-03
US20240126162A1
Physics

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

#3 | 2022-08-25 ✅ Patent 11,927,880 granted on 2024-03-12
US20220269160A1
Physics

Phase shift blankmask and photomask for EUV lithography

#4 | 2022-07-28 ✅ Patent 11,940,725 granted on 2024-03-26
US20220236635A1
Physics

Phase shift blankmask and photomask for EUV lithography

#5 | 2022-03-10
US20220075258A1
Physics

BLANKMASK AND PHOTOMASK

#6 | 2022-03-03 ✅ Patent 11,435,661 granted on 2022-09-06
US20220066311A1
Physics

Reflective type blankmask for EUV, and method for manufacturing the same

#7 | 2022-03-03
US20220066310A1
Physics

BLANKMASK WITH BACKSIDE CONDUCTIVE LAYER, AND PHOTOMASK MANUFACTURED WITH THE SAME

#8 | 2022-02-10
US20220043336A1
Physics

PELLICLE FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING THE SAME

#9 | 2021-07-08 ✅ Patent 11,579,521 granted on 2023-02-14
US20210208496A1
Physics

Reflective type blankmask and photomask for EUV

#10 | 2021-05-06 ✅ Patent 11,467,485 granted on 2022-10-11
US20210132487A1
Physics

Blankmask and photomask for extreme ultraviolet lithography

#11 | 2021-04-29 ✅ Patent 11,360,377 granted on 2022-06-14
US20210124254A1
Physics

Half-tone attenuated phase shift blankmask and photomask for EUV lithography

#12 | 2021-04-01
US20210096458A1
Physics

PELLICLE FOR EUV LITHOGRAPHY AND METHOD FOR MANUFACTURING THE SAME

#13 | 2020-12-03
US20200379337A1
Physics

BLANKMASK AND PHOTOMASK

#14 | 2020-01-16 ✅ Patent 10,942,445 granted on 2021-03-09
US20200019053A1
Physics

Blankmask and photomask, and methods of fabricating the same

#15 | 2019-05-16 ✅ Patent 10,859,901 granted on 2020-12-08
US20190146324A1
Physics

Pellicle for EUV lithography and method of fabricating the same

#16 | 2018-11-22
US20180335692A1
Physics

PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK

#17 | 2018-11-22
US20180335691A1
Physics

PHASE-SHIFT BLANKMASK AND METHOD OF FABRICATING THE SAME

#18 | 2018-09-13 ✅ Patent 10,768,523 granted on 2020-09-08
US20180259845A1
Physics

Pellicle for EUV lithography and method of fabricating the same

#19 | 2017-01-26 ✅ Patent 10,036,947 granted on 2018-07-31
US20170023854A1
Physics

Blankmask and photomask using the same

#20 | 2016-02-25 ✅ Patent 9,851,632 granted on 2017-12-26
US20160054650A1
Physics

Phase-shift blankmask and photomask

#21 | 2015-07-30 ✅ Patent 9,389,500 granted on 2016-07-12
US20150212403A1
Physics

Mask blank, photomask, and method for manufacturing same

#22 | 2014-01-02 ✅ Patent 9,229,317 granted on 2016-01-05
US20140004449A1
Physics

Blankmask and method for fabricating photomask using the same

#23 | 2013-10-31 ✅ Patent 9,256,119 granted on 2016-02-09
US20130288165A1
Physics

Phase-shift blankmask and method for fabricating the same

#24 | 2013-04-18 ✅ Patent 8,846,276 granted on 2014-09-30
US20130095415A1
Physics

Blankmask and photomask using the same

Also check out S&S TECH Co., Ltd.'s (Daegu-si, South Korea) applicant profile with 18 patent applications submitted.

AssigneeID:

18506 ⎘