Inventor profile of:

Been-Der Chen

City:

Milpitas, California

Country:

United States

Published Applications:

26

Last publication date:

2026-05-21

Top Assignees for applications by Been-Der Chen

The entities that hold a legal rights for patent applications filed by inventor Chen Been-Der:

Recent patent applications by Chen Been-Der

Been-Der Chen from Milpitas, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-05-21
US20260141162A1
Physics

METHOD FOR IMPROVING CONSISTENCY IN MASK PATTERN GENERATION

#2 | 2026-01-01
US20260004045A1
Physics

METHOD FOR GENERATING PATTERNING DEVICE PATTERN AT PATCH BOUNDARY

#3 | 2025-06-12
US20250189881A1
Physics

LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS

#4 | 2025-05-08
US20250147433A1
Physics

FIELD OF VIEW SELECTION FOR METROLOGY ASSOCIATED WITH SEMICONDUCTOR MANUFACTURING

#5 | 2024-11-07
US20240370621A1
Physics

PATTERN SELECTION SYSTEMS AND METHODS

#6 | 2024-04-11
US20240119582A1
Physics

A MACHINE LEARNING MODEL USING TARGET PATTERN AND REFERENCE LAYER PATTERN TO DETERMINE OPTICAL PROXIMITY CORRECTION FOR MASK

#7 | 2024-03-21
US20240095437A1
Physics

METHOD FOR GENERATING PATTERNING DEVICE PATTERN AT PATCH BOUNDARY

#8 | 2023-02-09
US20230044490A1
Physics

METHOD FOR IMPROVING CONSISTENCY IN MASK PATTERN GENERATION

#9 | 2022-04-21
US20220121804A1
Physics

Method for determining curvilinear patterns for patterning device

#10 | 2022-03-31
US20220100079A1
Physics

Method for generating patterning device pattern at patch boundary

#11 | 2021-02-18
US20210048753A1
Physics

Method for determining curvilinear patterns for patterning device

#12 | 2020-12-03
US20200380362A1
Physics

METHODS FOR TRAINING MACHINE LEARNING MODEL FOR COMPUTATION LITHOGRAPHY

#13 | 2020-06-18
US20200193080A1
Physics

Method and system for pattern configuration

#14 | 2020-02-13
US20200050099A1
Physics

ASSIST FEATURE PLACEMENT BASED ON MACHINE LEARNING

#15 | 2014-12-04
US20140359543A1
Physics

Method and apparatus for cost function based simultaneous OPC and SBAR optimization

#16 | 2014-11-27
US20140351772A1
Physics

Method and apparatus for model based flexible MRC

#17 | 2013-11-21
US20130311960A1
Physics

Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)

#18 | 2013-11-21
US20130311959A1
Physics

Multivariable solver for optical proximity correction

#19 | 2013-05-02
US20130111421A1
Physics

Method and apparatus for model based flexible MRC

#20 | 2013-02-14
US20130042212A1
Physics

Multivariable solver for optical proximity correction

#21 | 2013-01-03
US20130000505A1
Physics

Method and apparatus for cost function based simultaneous OPC and SBAR optimization

#22 | 2012-10-25
US20120272196A1
Physics

Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby

#23 | 2011-07-14
US20110173578A1
Physics

Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)

#24 | 2010-07-01
US20100167184A1
Physics

Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby

#25 | 2010-06-24
US20100161093A1
Physics

Multivariable solver for optical proximity correction

#26 | 2008-12-18
US20080309897A1
Physics

Multivariable solver for optical proximity correction

InventorID:

1138 ⎘