Santa Clara, California
United States
33
2011-05-19
33
2013-09-24
These are the the leading inventors for applications assigned to Brion Technologies, Inc.:
Brion Technologies, Inc. based in Santa Clara, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Illumination optimization
#2 | 2010-07-01 ✅ Patent 8,239,786 granted on 2012-08-07Local multivariable solver for optical proximity correction in lithographic processing method, and device manufactured thereby
#3 | 2010-06-24 ✅ Patent 9,360,766 granted on 2016-06-07Method and system for lithography process-window-maximixing optical proximity correction
#4 | 2010-05-27 ✅ Patent 8,447,095 granted on 2013-05-21Harmonic resist model for use in a lithographic apparatus and a device manufacturing method
#5 | 2010-04-20 ✅ Patent 7,703,069 granted on 2010-04-20Three-dimensional mask model for photolithography simulation
#6 | 2010-04-08 ✅ Patent 8,182,969 granted on 2012-05-22Lithographic processing method, and device manufactured thereby
#7 | 2010-04-06 ✅ Patent 7,694,267 granted on 2010-04-06Method for process window optimized optical proximity correction
#8 | 2009-07-07 ✅ Patent 7,558,419 granted on 2009-07-07System and method for detecting integrated circuit pattern defects
#9 | 2008-12-18 ✅ Patent 7,707,538 granted on 2010-04-27Multivariable solver for optical proximity correction
#10 | 2008-12-04 ✅ Patent 7,882,480 granted on 2011-02-01System and method for model-based sub-resolution assist feature generation
#11 | 2007-03-15 ✅ Patent 7,617,477 granted on 2009-11-10Method for selecting and optimizing exposure tool using an individual mask error model
#12 | 2007-03-15 ✅ Patent 7,587,704 granted on 2009-09-08System and method for mask verification using an individual mask error model
#13 | 2007-03-01 ✅ Patent 7,695,876 granted on 2010-04-13Method for identifying and using process window signature patterns for lithography process control
#14 | 2007-02-15 ✅ Patent 7,749,666 granted on 2010-07-06System and method for measuring and analyzing lithographic parameters and determining optimal process corrections
#15 | 2007-02-08 ✅ Patent 7,488,933 granted on 2009-02-10Method for lithography model calibration
#16 | 2007-02-08 ✅ Patent 7,747,978 granted on 2010-06-29System and method for creating a focus-exposure model of a lithography process
#17 | 2006-12-07 ✅ Patent 7,853,920 granted on 2010-12-14Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing
#18 | 2006-12-07 ✅ Patent 7,564,017 granted on 2009-07-21System and method for characterizing aerial image quality in a lithography system
#19 | 2006-01-05 ✅ Patent 7,053,355 granted on 2006-05-30System and method for lithography process monitoring and control
#20 | 2005-12-29 ✅ Patent 7,171,334 granted on 2007-01-30Method and apparatus for synchronizing data acquisition of a monitored IC fabrication process
#21 | 2005-11-29 ✅ Patent 6,969,864 granted on 2005-11-29System and method for lithography process monitoring and control
#22 | 2005-11-29 ✅ Patent 6,969,837 granted on 2005-11-29System and method for lithography process monitoring and control
#23 | 2005-10-25 ✅ Patent 6,959,255 granted on 2005-10-25Method and apparatus for monitoring integrated circuit fabrication
#24 | 2005-07-28 ✅ Patent 7,120,895 granted on 2006-10-10System and method for lithography simulation
#25 | 2005-06-14 ✅ Patent 6,906,305 granted on 2005-06-14System and method for aerial image sensing
#26 | 2005-06-09 ✅ Patent 7,233,874 granted on 2007-06-19Method and apparatus for monitoring integrated circuit fabrication
#27 | 2005-06-09 ✅ Patent 7,117,478 granted on 2006-10-03System and method for lithography simulation
#28 | 2005-05-10 ✅ Patent 6,892,156 granted on 2005-05-10Method and apparatus for monitoring integrated circuit fabrication
#29 | 2005-05-05 ✅ Patent 7,111,277 granted on 2006-09-19System and method for lithography simulation
#30 | 2005-04-28 ✅ Patent 7,114,145 granted on 2006-09-26System and method for lithography simulation
#31 | 2005-04-26 ✅ Patent 6,884,984 granted on 2005-04-26System and method for lithography process monitoring and control
#32 | 2005-04-12 ✅ Patent 6,879,924 granted on 2005-04-12Method and apparatus for monitoring integrated circuit fabrication
#33 | 2005-04-07 ✅ Patent 7,003,758 granted on 2006-02-21System and method for lithography simulation
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