Inventor profile of:

Prashanth KOTHNUR

City:

San Jose, California

Country:

United States

Published Applications:

40

Last publication date:

2026-01-29

Top Assignees for applications by Prashanth KOTHNUR

The entities that hold a legal rights for patent applications filed by inventor KOTHNUR Prashanth:

Recent patent applications by KOTHNUR Prashanth

Prashanth KOTHNUR from San Jose, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-01-29
US20260029784A1
Physics

ECO-EFFICIENCY (SUSTAINABILITY) DASHBOARD FOR SEMICONDUCTOR MANUFACTURING

#2 | 2025-07-10
US20250226186A1
Electricity

HEATERS AND PLASMA GENERATORS FOR GAS ACTIVATION, AND RELATED CHAMBER AND FOR SEMICONDUCTOR MANUFACTURING

#3 | 2025-06-26
US20250210319A1
Electricity

ELECTRODE CONFIGURATIONS AND MAGNET CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATED METHODS AND APPARATUS, FOR SEMICONDUCTOR MANUFACTURING

#4 | 2025-06-26
US20250210314A1
Electricity

PLASMA INJECTION CONFIGURATIONS FOR PROCESSING CHAMBERS, AND RELATED APPARATUS, CHAMBER KITS, AND METHODS

#5 | 2025-06-26
US20250210304A1
Electricity

Electrode and Coil Configurations For Processing Chambers and Related Chamber Kits, Apparatus, and Methods For Semiconductor Manufacturing

#6 | 2025-06-19
US20250201594A1
Electricity

MODULAR PROCESSING CHAMBERS AND RELATED HEATING CONFIGURATIONS, METHODS, APPARATUS, AND MODULES FOR SEMICONDUCTOR MANUFACTURING

#7 | 2025-05-15
US20250155883A1
Physics

PROCESS MODELING PLATFORM FOR SUBSTRATE MANUFACTURING SYSTEMS

#8 | 2025-05-08
US20250146119A1
Chemistry; metallurgy

DUAL COLLIMATOR PHYSICAL VAPOR DEPOSITIONS PROCESSING CHAMBER

#9 | 2025-03-13
US20250086342A1
Physics

COMPREHENSIVE MODELING PLATFORM FOR MANUFACTURING EQUIPMENT

#10 | 2025-02-13
US20250053715A1
Physics

VIRTUAL MEASUREMENT OF CONDITIONS PROXIMATE TO A SUBSTRATE WITH PHYSICS-INFORMED COMPRESSED SENSING

#11 | 2024-09-19
US20240310819A1
Physics

ECO-EFFICIENCY (SUSTAINABILITY) DASHBOARD FOR SEMICONDUCTOR MANUFACTURING

#12 | 2023-03-23
US20230092987A1
Chemistry; metallurgy

Methods of using a segmented showerhead for uniform delivery of multiple pre-cursors

#13 | 2023-03-16
US20230078146A1
Physics

Virtual measurement of conditions proximate to a substrate with physics-informed compressed sensing

#14 | 2023-02-09
US20230042777A1
Chemistry; metallurgy

METHODS FOR FORMING FILMS ON SUBSTRATES

#15 | 2022-12-01
US20220380888A1
Chemistry; metallurgy

Methods for shaping magnetic fields during semiconductor processing

#16 | 2022-11-03
US20220351988A1
Electricity

APPARATUS AND METHOD FOR CONTROLLING A FLOW PROCESS MATERIAL TO A DEPOSITION CHAMBER

#17 | 2022-10-27
US20220341029A1
Chemistry; metallurgy

EM SOURCE FOR ENHANCED PLASMA CONTROL

#18 | 2022-10-27
US20220341025A1
Chemistry; metallurgy

Apparatus for reducing tungsten resistivity

#19 | 2022-10-20
US20220334569A1
Physics

Eco-efficiency (sustainability) dashboard for semiconductor manufacturing

#20 | 2022-08-04
US20220245307A1
Physics

HYBRID PHYSICS/MACHINE LEARNING MODELING OF PROCESSES

#21 | 2022-03-17
US20220081756A1
Chemistry; metallurgy

Methods and apparatus for reducing tungsten resistivity

#22 | 2022-02-03
US20220037136A1
Electricity

Deposition system with multi-cathode and method of manufacture thereof

#23 | 2021-03-11
US20210069745A1
Performing operations; transporting

VAPOR DELIVERY METHODS AND APPARATUS

#24 | 2021-01-21
US20210017639A1
Chemistry; metallurgy

EM source for enhanced plasma control

#25 | 2020-12-03
US20200381222A1
Electricity

Plasma density control on substrate edge

#26 | 2020-12-03
US20200378000A1
Chemistry; metallurgy

Methods for forming films on substrates

#27 | 2020-03-19
US20200087790A1
Chemistry; metallurgy

Segmented showerhead for uniform delivery of multiple precursors

#28 | 2020-02-13
US20200051794A1
Electricity

Methods and apparatus for producing low angle depositions

#29 | 2020-02-13
US20200048767A1
Chemistry; metallurgy

Showerhead for providing multiple materials to a process chamber

#30 | 2019-12-19
US20190382890A1
Chemistry; metallurgy

Apparatus and method for controlling a flow process material to a deposition chamber

#31 | 2019-11-21
US20190353919A1
Physics

MULTI-ZONE COLLIMATOR FOR SELECTIVE PVD

#32 | 2018-10-11
US20180294146A1
Electricity

Plasma density control on substrate edge

#33 | 2017-07-27
US20170211175A1
Chemistry; metallurgy

SPUTTER SOURCE FOR SEMICONDUCTOR PROCESS CHAMBERS

#34 | 2016-06-16
US20160172168A1
Electricity

Apparatus for PVD dielectric deposition

#35 | 2016-02-04
US20160035547A1
Electricity

Magnetron assembly for physical vapor deposition chamber

#36 | 2015-12-24
US20150371827A1
Electricity

Bias voltage frequency controlled angular ion distribution in plasma processing

#37 | 2015-10-01
US20150279635A1
Electricity

Deposition system with multi-cathode and method of manufacture thereof

#38 | 2015-04-30
US20150114823A1
Electricity

Bipolar collimator utilized in a physical vapor deposition chamber

#39 | 2014-09-18
US20140262767A1
Electricity

Sputter source for semiconductor process chambers

#40 | 2009-10-08
US20090250334A1
Electricity

Plasma generator systems and methods of forming plasma

InventorID:

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