Robert D. Clark

Transistor stack of vertical channel ferroelectric FETs and methods of forming the transistor stack

SELECTIVE FILM FORMATION USING A SELF-ASSEMBLED MONOLAYER

LIQUID PHASE CONFORMAL SILICON OXIDE SPIN-ON DEPOSITION

Crystalline dielectric systems for interconnect circuit manufacturing

Atomic layer etching using a boron-containing gas and hydrogen fluoride gas

Atomic layer etching using a boron-containing gas and hydrogen fluoride gas

Wrap-around contact integration scheme

Self-aligned spacer formation

Solid source doping for source and drain extension doping

Metal-insulator-semiconductor (MIS) contacts and method of forming

Selective bottom-up metal feature filling for interconnects

GERMANIUM-CONTAINING SEMICONDUCTOR DEVICE AND METHOD OF FORMING

Sidewall protection scheme for contact formation

Method of controlling solid phase diffusion of boron dopants to form ultra-shallow doping regions

Liquid phase atomic layer deposition

METHOD OF FORMING THIN METAL AND SEMI-METAL LAYERS BY THERMAL REMOTE OXYGEN SCAVENGING

Atomic Layer Deposition of Aluminum-doped High-k Films

Method of enhancing high-k film nucleation rate and electrical mobility in a semiconductor device by microwave plasma treatment

Method of surface functionalization for high-K deposition

METHOD FOR FORMING ULTRA-SHALLOW BORON DOPING REGIONS BY SOLID PHASE DIFFUSION

Processing system for electromagnetic wave treatment of a substrate at microwave frequencies

Method for forming ultra-shallow doping regions by solid phase diffusion

Hybrid gate last integration scheme for multi-layer high-k gate stacks

Method for forming ultra-shallow boron doping regions by solid phase diffusion

Nitridation of atomic layer deposited high-k dielectrics using trisilylamine

Method for depositing dielectric films

Method of integrating buried threshold voltage adjustment layers for CMOS processing

Method of forming thin metal and semi-metal layers by thermal remote oxygen scavenging

Diffused cap layers for modifying high-k gate dielectrics and interface layers

Method for forming ultra-shallow boron doping regions by solid phase diffusion

Method for forming ultra-shallow doping regions by solid phase diffusion

METHOD FOR FORMING A PATTERN AND A SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Method of integrating stress into a gate stack

METHOD OF FORMING MIXED RARE EARTH OXIDE AND ALUMINATE FILMS BY ATOMIC LAYER DEPOSITION

Method of forming high-dielectric constant films for semiconductor devices