Eindhoven
Netherlands
97
2025-11-13
The entities that hold a legal rights for patent applications filed by inventor Van Der Schaar Maurits:
Maurits Van Der Schaar from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
SINGLE PAD OVERLAY MEASUREMENT
#2 | 2025-08-14METROLOGY TARGET AND ASSOCIATED METROLOGY METHOD
#3 | 2025-02-20SUBSTRATE COMPRISING A TARGET ARRANGEMENT, ASSOCIATED PATTERNING DEVICE AND METROLOGY METHOD
#4 | 2023-08-31Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
#5 | 2023-07-27Target for measuring a parameter of a lithographic process
#6 | 2023-06-15Method and apparatus for inspection and metrology
#7 | 2023-06-08Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method
#8 | 2023-01-19METROLOGY METHOD, TARGET AND SUBSTRATE
#9 | 2022-11-03Method for applying a deposition model in a semiconductor manufacturing process
#10 | 2022-08-18Metrology targets
#11 | 2022-08-11Metrology method and associated computer product
#12 | 2022-04-14METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET
#13 | 2022-02-24Metrology method, target and substrate
#14 | 2022-02-03Target for measuring a parameter of a lithographic process
#15 | 2021-12-16Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
#16 | 2021-08-19Metrology method, patterning device, apparatus and computer program
#17 | 2021-07-08Metrology using a plurality of metrology target measurement recipes
#18 | 2021-02-25Method and apparatus for illumination adjustment
#19 | 2020-11-12Method for optimization of a lithographic process
#20 | 2020-11-05Metrology method, target and substrate
#21 | 2020-10-01Focus and overlay improvement by modifying a patterning device
#22 | 2020-06-11Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method
#23 | 2020-05-14Method of determining a position of a feature
#24 | 2020-04-09Metrology method, patterning device, apparatus and computer program
#25 | 2020-03-05Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
#26 | 2020-02-13Method of Measuring a Structure, Inspection Apparatus, Lithographic System and Device Manufacturing Method
#27 | 2020-02-06Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
#28 | 2020-01-30Method and apparatus for design of a metrology target
#29 | 2019-11-14Metrology method, target and substrate
#30 | 2019-11-07Method of determining a position of a feature
#31 | 2019-10-17Method for optimization of a lithographic process
#32 | 2019-08-01METHOD OF PATTERNING AT LEAST A LAYER OF A SEMICONDUCTOR DEVICE
#33 | 2019-03-07Methods and apparatus for monitoring a manufacturing process, inspection apparatus, lithographic system, device manufacturing method
#34 | 2019-02-21Metrology method, apparatus and computer program
#35 | 2018-12-27Alternative target design for metrology using modulation techniques
#36 | 2018-12-27Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method
#37 | 2018-12-20POLARIZATION TUNING IN SCATTEROMETRY
#38 | 2018-11-08Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method
#39 | 2018-08-23APPARATUS AND METHOD FOR INFERRING PARAMETERS OF A MODEL OF A MEASUREMENT STRUCTURE FOR A PATTERNING PROCESS
#40 | 2018-08-23Metrology method and apparatus, substrate, lithographic method and associated computer product
#41 | 2018-06-21Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method
#42 | 2018-02-15Method and apparatus for inspection and metrology
#43 | 2018-01-18Method and apparatus for design of a metrology target
#44 | 2017-11-02Metrology method and apparatus, lithographic system, device manufacturing method and substrate
#45 | 2017-10-12Metrology target, method and apparatus, target design method, computer program and lithographic system
#46 | 2017-06-22Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method
#47 | 2017-03-02Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
#48 | 2017-01-12Method of determining edge placement error, inspection apparatus, patterning device, substrate and device manufacturing method
#49 | 2016-06-23Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing Method
#50 | 2016-04-28Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method
#51 | 2016-03-03Metrology method, target and substrate
#52 | 2015-12-03Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus
#53 | 2015-07-02Method and apparatus for design of a metrology target
#54 | 2015-05-28Metrology method and apparatus, lithographic system, device manufacturing method and substrate
#55 | 2014-11-13Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#56 | 2014-11-06Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#57 | 2014-08-21Substrate and patterning device for use in metrology, metrology method and device manufacturing method
#58 | 2014-06-26Inspection methods, inspection apparatuses, and lithographic apparatuses
#59 | 2013-04-25Metrology method and apparatus, and device manufacturing method
#60 | 2013-03-07Substrate and patterning device for use in metrology, metrology method and device manufacturing method
#61 | 2012-02-23Substrate for Use in Metrology, Metrology Method and Device Manufacturing Method
#62 | 2012-02-09Inspection apparatus and method for measuring a property of a substrate
#63 | 2012-01-19Method and apparatus for determining an overlay error
#64 | 2011-12-08Lithographic system, lithographic method and device manufacturing method
#65 | 2011-12-01Calibration method, inspection method and apparatus, lithographic apparatus, and lithographic processing cell
#66 | 2011-10-20Apparatus and method for inspecting a substrate
#67 | 2011-09-22Inspection method for lithography
#68 | 2011-08-25Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus
#69 | 2011-08-25Sub-wavelength segmentation in measurement targets on substrates
#70 | 2011-08-11Alignment system, lithographic system and method
#71 | 2011-06-16Inspection apparatus for lithography
#72 | 2011-06-09Inspection method and apparatus, and corresponding lithographic apparatus
#73 | 2011-05-12Method and apparatus for measuring line end shortening, substrate and patterning device
#74 | 2011-05-05Apparatus and method of measuring a property of a substrate
#75 | 2011-03-31Method and apparatus for angular-resolved spectroscopic lithography characterization
#76 | 2011-02-03Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
#77 | 2011-01-27Method of Determining Overlay Error and a Device Manufacturing Method
#78 | 2010-11-11Method of determining overlay error and a device manufacturing method
#79 | 2010-11-04Method of measurement, an inspection apparatus and a lithographic apparatus
#80 | 2010-06-10Method of forming a marker, substrate having a marker and device manufacturing method
#81 | 2010-04-15Process, apparatus, and device for determining intra-field correction to correct overlay errors between overlapping patterns
#82 | 2009-04-16Alignment Method and Apparatus, Lithographic Apparatus, Metrology Apparatus and Device Manufacturing Method
#83 | 2009-03-19Method of measuring the overlay error, an inspection apparatus and a lithographic apparatus
#84 | 2009-01-29Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement
#85 | 2008-12-18Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#86 | 2008-10-02Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus
#87 | 2008-09-11Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods
#88 | 2008-09-04Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell
#89 | 2008-07-24Method of measurement, an inspection apparatus and a lithographic apparatus
#90 | 2008-07-10Lithographic apparatus, device manufacturing method and device for correcting overlay errors between overlapping patterns
#91 | 2008-06-26Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#92 | 2008-06-19Method of measurement, an inspection apparatus and a lithographic apparatus
#93 | 2008-06-05Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#94 | 2008-06-05Lithographic apparatus and device manufacturing method
#95 | 2008-03-27Method and apparatus for angular-resolved spectroscopic lithography characterization
#96 | 2008-03-20Inspection apparatus, an apparatus for projecting an image and a method of measuring a property of a substrate
#97 | 2008-02-21Method and apparatus for angular-resolved spectroscopic lithography characterization
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