Veldhoven
Netherlands
662
2026-04-16
582
2026-01-20
These are the the leading inventors for applications assigned to ASML Holding N.V.:
ASML Holding N.V. based in Veldhoven, NL has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
FAST UNIFORMITY DRIFT CORRECTION
#2 | 2025-11-20MODE CONTROL OF PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION SOURCES
#3 | 2025-11-06SUB MICRON PARTICLE DETECTION ON BURL TOPS BY APPLYING A VARIABLE VOLTAGE TO AN OXIDIZED WAFER
#4 | 2025-10-09CONTAMINANT IDENTIFICATION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
#5 | 2025-10-02OPTIMIZATION USING A NON-UNIFORM ILLUMINATION INTENSITY PROFILE
#6 | 2025-09-04SUBSTRATE HOLDER FOR USE IN A LITHOGRAPHIC APPARATUS
#7 | 2025-06-05SYSTEMS FOR CLEANING A PORTION OF A LITHOGRAPHY APPARATUS
#8 | 2024-12-19APPARATUS FOR AND METHOD OF LITHOGRAPHY SUPPORT CLEANING
#9 | 2024-11-07 β Patent 12,529,967 granted on 2026-01-20METHOD TO MANUFACTURE NANO RIDGES IN HARD CERAMIC COATINGS
#10 | 2024-10-31ON CHIP SENSOR FOR WAFER OVERLAY MEASUREMENT
#11 | 2024-09-26 β Patent 12,535,745 granted on 2026-01-27LITHOGRAPHIC APPARATUS, LOCKING DEVICE, AND METHOD
#12 | 2024-09-26 β Patent 12,631,975 granted on 2026-05-19METROLOGY SYSTEMS WITH PHASED ARRAYS FOR CONTAMINANT DETECTION AND MICROSCOPY
#13 | 2024-09-26 β Patent 12,529,963 granted on 2026-01-20FAST UNIFORMITY DRIFT CORRECTION
#14 | 2024-09-12 β Patent 12,422,758 granted on 2025-09-23LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING SENSOR
#15 | 2024-09-05 β Patent 12,578,658 granted on 2026-03-17SYSTEMS, METHODS, AND DEVICES FOR THERMAL CONDITIONING OF RETICLES IN LITHOGRAPHIC APPARATUSES
#16 | 2024-07-25 β Patent 12,596,308 granted on 2026-04-07MODULAR WAFER TABLE AND METHODS OF MANUFACTURING THEREOF
#17 | 2024-07-18METROLOGY SYSTEMS, TEMPORAL AND SPATIAL COHERENCE SCRAMBLER AND METHODS THEREOF
#18 | 2024-07-11 β Patent 12,645,151 granted on 2026-06-02OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
#19 | 2024-05-23METROLOGY SYSTEMS, MEASUREMENT OF WEAR SYSTEMS AND METHODS THEREOF
#20 | 2024-05-16DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD
#21 | 2024-04-25OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
#22 | 2024-04-25 β Patent 12,591,132 granted on 2026-03-31METHODS AND APPARATUSES FOR SPATIALLY FILTERING OPTICAL PULSES
#23 | 2024-03-28APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A PELLICLE
#24 | 2024-03-21 β Patent 12,572,083 granted on 2026-03-10INTENSITY ORDER DIFFERENCE BASED METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
#25 | 2024-03-07 β Patent 12,461,448 granted on 2025-11-04MULTI-CHANNEL LIGHT SOURCE FOR PROJECTION OPTICS HEATING
#26 | 2024-03-07 β Patent 12,399,000 granted on 2025-08-26SYSTEMS AND METHODS FOR MEASURING INTENSITY IN A LITHOGRAPHIC ALIGNMENT APPARATUS
#27 | 2024-02-15 β Patent 11,960,216 granted on 2024-04-16Invariable magnification multilevel optical device with telecentric converter
#28 | 2024-02-01 β Patent 12,287,591 granted on 2025-04-29Lithographic apparatus, metrology systems, and methods thereof
#29 | 2024-01-25 β Patent 12,631,968 granted on 2026-05-19METROLOGY SYSTEM AND COHERENCE ADJUSTERS
#30 | 2024-01-11 β Patent 12,429,780 granted on 2025-09-30MULTIPLE OBJECTIVES METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
#31 | 2024-01-04 β Patent 12,535,743 granted on 2026-01-27RADIATION SOURCE ARRANGEMENT AND METROLOGY DEVICE
#32 | 2023-12-14 β Patent 12,287,585 granted on 2025-04-29Polarization selection metrology system, lithographic apparatus, and methods thereof
#33 | 2023-11-09 β Patent 12,306,544 granted on 2025-05-20Metrology tool with position control of projection system
#34 | 2023-11-02 β Patent 12,140,870 granted on 2024-11-12Double-scanning opto-mechanical configurations to improve throughput of particle inspection systems
#35 | 2023-10-26LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF
#36 | 2023-10-12 β Patent 12,326,670 granted on 2025-06-10LITHOGRAPHIC APPARATUS, METROLOGY SYSTEM, AND INTENSITY IMBALANCE MEASUREMENT FOR ERROR CORRECTION
#37 | 2023-10-05 β Patent 12,393,126 granted on 2025-08-19SUB MICRON PARTICLE DETECTION ON BURL TOPS BY APPLYING A VARIABLE VOLTAGE TO AN OXIDIZED WAFER
#38 | 2023-10-05 β Patent 12,474,633 granted on 2025-11-18POD HANDLING SYSTEMS AND METHODS FOR A LITHOGRAPHIC DEVICE
#39 | 2023-09-21LITHOGRAPHIC APPARATUS AND METHODS FOR MULTI-EXPOSURE OF A SUBSTRATE
#40 | 2023-09-07 β Patent 12,386,270 granted on 2025-08-12MODE CONTROL OF PHOTONIC CRYSTAL FIBER BASED BROADBAND RADIATION SOURCES
#41 | 2023-08-31 β Patent 12,135,505 granted on 2024-11-05Spectrometric metrology systems based on multimode interference and lithographic apparatus
#42 | 2023-08-24 β Patent 12,216,414 granted on 2025-02-04Self-referencing integrated alignment sensor
#43 | 2023-08-24 β Patent 12,298,257 granted on 2025-05-13Monolithic particle inspection device
#44 | 2023-07-27 β Patent 12,523,941 granted on 2026-01-13LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILLUMINATION
#45 | 2023-07-06 β Patent 12,585,198 granted on 2026-03-24LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING METROLOGY SYSTEM AND METHOD
#46 | 2023-07-06 β Patent 12,306,541 granted on 2025-05-20Lithographic apparatus, metrology systems, illumination switches and methods thereof
#47 | 2023-06-15OPTICAL APPARATUS AND LITHOGRAPHIC APPARATUS USING THE OPTICAL APPARATUS
#48 | 2023-06-08 β Patent 12,474,647 granted on 2025-11-18GENERATING AN ALIGNMENT SIGNAL BASED ON LOCAL ALIGNMENT MARK DISTORTIONS
#49 | 2023-05-11 β Patent 12,379,655 granted on 2025-08-05CONTAMINANT IDENTIFICATION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
#50 | 2023-05-04 β Patent 12,442,759 granted on 2025-10-14CONTAMINANT ANALYZING METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
#51 | 2023-04-13 β Patent 11,841,628 granted on 2023-12-12Apparatus for and method of sensing alignment marks
#52 | 2023-04-06 β Patent 11,803,119 granted on 2023-10-31Contaminant detection metrology system, lithographic apparatus, and methods thereof
#53 | 2023-03-23IMPROVED ALIGNMENT OF SCATTEROMETER BASED PARTICLE INSPECTION SYSTEM
#54 | 2023-03-16 β Patent 12,158,705 granted on 2024-12-03End-of-life monitoring of dynamic gas lock membranes and pupil facet mirrors and detection of membrane rupture in lithographic apparatuses
#55 | 2023-03-09 β Patent 12,189,312 granted on 2025-01-07Reticle gripper damper and isolation system for lithographic apparatuses
#56 | 2023-03-02 β Patent 12,332,570 granted on 2025-06-17LITHOGRAPHIC SYSTEM PROVIDED WITH A DEFLECTION APPARATUS FOR CHANGING A TRAJECTORY OF PARTICULATE DEBRIS
#57 | 2023-02-23 β Patent 12,140,872 granted on 2024-11-12Optical designs of miniaturized overlay measurement system
#58 | 2023-02-23 β Patent 12,124,173 granted on 2024-10-22Lithographic apparatus, metrology systems, illumination sources and methods thereof
#59 | 2023-02-23 β Patent 12,405,227 granted on 2025-09-02METHOD FOR REGION OF INTEREST PROCESSING FOR RETICLE PARTICLE DETECTION
#60 | 2023-02-02LITHOGRAPHIC APPARATUS AND METHOD FOR DRIFT COMPENSATION
#61 | 2023-02-02WAFER CLAMP HARD BURL PRODUCTION AND REFURBISHMENT
#62 | 2023-01-26 β Patent 12,189,310 granted on 2025-01-07Systems and methods for manufacturing a double-sided electrostatic clamp
#63 | 2023-01-19 β Patent 12,032,299 granted on 2024-07-09Metrology method and associated metrology and lithographic apparatuses
#64 | 2023-01-12 β Patent 12,174,552 granted on 2024-12-24Lithographic apparatus and electrostatic clamp designs
#65 | 2023-01-12 β Patent 12,124,177 granted on 2024-10-22Overlay measurement system using lock-in amplifier technique
#66 | 2022-12-22 β Patent 11,892,779 granted on 2024-02-06Optical component and clamp used in lithographic apparatus
#67 | 2022-12-15 β Patent 11,803,130 granted on 2023-10-31Phase modulators in alignment to decrease mark size
#68 | 2022-12-08 β Patent 11,703,771 granted on 2023-07-18Variable diffraction grating
#69 | 2022-12-08 β Patent 12,235,595 granted on 2025-02-25Systems for cleaning a portion of a lithography apparatus
#70 | 2022-12-08 β Patent 12,339,583 granted on 2025-06-24OPTIMIZATION USING A NON-UNIFORM ILLUMINATION INTENSITY PROFILE
#71 | 2022-11-24 β Patent 11,789,368 granted on 2023-10-17Lithographic apparatus, metrology system, and illumination systems with structured illumination
#72 | 2022-11-10 β Patent 12,321,104 granted on 2025-06-03Substrate holder for use in a lithographic apparatus
#73 | 2022-11-03 β Patent 12,585,201 granted on 2026-03-24METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK STRUCTURE
#74 | 2022-11-03 β Patent 12,405,535 granted on 2025-09-02A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS
#75 | 2022-10-27 β Patent 12,393,046 granted on 2025-08-19METROLOGY SYSTEMS, COHERENCE SCRAMBLER ILLUMINATION SOURCES AND METHODS THEREOF
#76 | 2022-09-22 β Patent 11,754,935 granted on 2023-09-12Lithographic patterning device multichannel position and level gauge
#77 | 2022-09-22 β Patent 11,841,626 granted on 2023-12-12Alignment sensor based on wavelength-scanning
#78 | 2022-09-15 β Patent 11,899,380 granted on 2024-02-13Apparatus for and method of sensing alignment marks
#79 | 2022-09-15 β Patent 12,124,172 granted on 2024-10-22Lithographic apparatus and ultraviolet radiation control system
#80 | 2022-09-08 β Patent 12,066,762 granted on 2024-08-20On chip sensor for wafer overlay measurement
#81 | 2022-09-08METROLOGY SYSTEM AND METHOD
#82 | 2022-08-25 β Patent 11,687,009 granted on 2023-06-27Mode control of photonic crystal fiber based broadband radiation sources
#83 | 2022-08-25 β Patent 12,487,081 granted on 2025-12-02ON CHIP WAFER ALIGNMENT SENSOR
#84 | 2022-08-18 β Patent 11,982,946 granted on 2024-05-14Metrology targets
#85 | 2022-08-11 β Patent 12,066,758 granted on 2024-08-20Pellicle and pellicle assembly
#86 | 2022-07-28SPLIT DOUBLE SIDED WAFER AND RETICLE CLAMPS
#87 | 2022-07-14 β Patent 12,292,697 granted on 2025-05-06Self-referencing interferometer and dual self-referencing interferometer devices
#88 | 2022-07-07 β Patent 11,887,881 granted on 2024-01-30Lithographic apparatus, substrate table, and non-uniform coating method
#89 | 2022-07-07 β Patent 11,656,555 granted on 2023-05-23Lithographic apparatus and illumination uniformity correction system
#90 | 2022-06-09 β Patent 11,526,091 granted on 2022-12-13Sensor apparatus and method for lithographic measurements
#91 | 2022-06-09 β Patent 11,537,055 granted on 2022-12-27Lithographic apparatus, metrology apparatus, optical system and method
#92 | 2022-05-12ELECTROSTATIC CLAMP FOR A LITHOGRAPHIC APPARATUS
#93 | 2022-05-05 β Patent 11,971,665 granted on 2024-04-30Wafer alignment using form birefringence of targets or product
#94 | 2022-05-05LASER ROUGHENING: ENGINEERING THE ROUGHNESS OF THE BURL TOP
#95 | 2022-04-14 β Patent 11,927,889 granted on 2024-03-12Intermediate layer for mechanical interface
#96 | 2022-03-31APPARATUS FOR AND METHOD OF SIMULTANEOUSLY ACQUIRING PARALLEL ALIGNMENT MARKS
#97 | 2022-03-17 β Patent 11,988,971 granted on 2024-05-21Lithographic apparatus, substrate table, and method
#98 | 2022-03-10 β Patent 11,550,231 granted on 2023-01-10Apparatus for and method of in-situ particle removal in a lithography apparatus
#99 | 2022-03-03 β Patent 11,493,852 granted on 2022-11-08Noise correction for alignment signal
#100 | 2022-03-03 β Patent 12,117,737 granted on 2024-10-15Apparatus and method for cleaning a support structure in a lithographic system
Also check out ASML HOLDING N.V.'s (Veldhoven, Netherlands) applicant profile with 214 patent applications submitted.
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