Mechanicville, New York
United States
25
2025-04-03
The entities that hold a legal rights for patent applications filed by inventor Labonte Andre P.:
Andre P. Labonte from Mechanicville, US has applied for patents for these inventions. The list has both pending applications and granted patents:
CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIALS TO REDUCE THICKNESS LOSS
#2 | 2024-09-05Method for manufacturing optical device structures
#3 | 2024-08-15UNIFORM SIGE CHANNEL IN NANOSHEET ARCHITECTURE
#4 | 2023-01-26Method for manufacturing optical device structures
#5 | 2022-02-17Method for manufacturing optical device structures
#6 | 2020-11-19Methods of forming variable-depth device structures
#7 | 2020-10-22Sacrificial gate spacer regions for gate contacts formed over the active region of a transistor
#8 | 2020-05-14Interconnect structures of semiconductor devices having a via structure through an upper conductive line
#9 | 2020-05-07Interconnect structure having reduced resistance variation and method of forming same
#10 | 2020-02-20Contact structures
#11 | 2019-11-28Gate tie-down enablement with inner spacer
#12 | 2018-12-27Gate tie-down enablement with inner spacer
#13 | 2018-10-04Methods of forming a semiconductor device with a gate contact positioned above the active region
#14 | 2018-05-31Gate tie-down enablement with inner spacer
#15 | 2018-04-17Methods of forming a gate contact for a transistor above an active region and the resulting device
#16 | 2017-12-28Gate tie-down enablement with inner spacer
#17 | 2017-09-28Gate tie-down enablement with inner spacer
#18 | 2017-06-15Local interconnect structure including non-eroded contact via trenches
#19 | 2017-06-15Gate tie-down enablement with inner spacer
#20 | 2017-06-08Gate tie-down enablement with inner spacer
#21 | 2017-02-16Gate tie-down enablement with inner spacer
#22 | 2017-02-16Gate tie-down enablement with inner spacer
#23 | 2017-02-14Local interconnect structure including non-eroded contact via trenches
#24 | 2016-07-19Gate tie-down enablement with inner spacer
#25 | 2015-10-29Self-aligned gate contact formation
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