Daegu-si
South Korea
14
2022-07-28
The entities that hold a legal rights for patent applications filed by inventor SHIN Cheol:
Cheol SHIN from Daegu-si, KR has applied for patents for these inventions. The list has both pending applications and granted patents:
Phase shift blankmask and photomask for EUV lithography
#2 | 2022-03-10BLANKMASK AND PHOTOMASK
#3 | 2022-02-10PELLICLE FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING THE SAME
#4 | 2021-07-08Reflective type blankmask and photomask for EUV
#5 | 2021-07-08Reflective type blankmask and photomask for EUV
#6 | 2021-05-06Blankmask and photomask for extreme ultraviolet lithography
#7 | 2021-04-29Half-tone attenuated phase shift blankmask and photomask for EUV lithography
#8 | 2020-12-03BLANKMASK AND PHOTOMASK
#9 | 2020-01-16Blankmask and photomask, and methods of fabricating the same
#10 | 2018-11-22PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK
#11 | 2018-11-22PHASE-SHIFT BLANKMASK AND METHOD OF FABRICATING THE SAME
#12 | 2017-01-26Blankmask and photomask using the same
#13 | 2016-10-06Phase shift blankmask and photomask
#14 | 2016-02-25Phase-shift blankmask and photomask
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