John M. White

APPARATUS AND METHOD FOR LOADING A SUBSTRATE INTO A VACUUM PROCESSING MODULE, APPARATUS AND METHOD FOR TREATMENT OF A SUBSTRATE FOR A VACUUM DEPOSITION PROCESS IN A VACUUM PROCESSING MODULE, AND SYSTEM FOR VACUUM PROCESSING OF A SUBSTRATE

#14 | 2018-09-13

US20180258519A1

APPARATUS FOR VACUUM DEPOSITION ON A SUBSTRATE AND METHOD FOR MASKING THE SUBSTRATE DURING VACUUM DEPOSITION

#15 | 2018-06-14

US20180166616A1

Collimated OLED light field display

#16 | 2018-06-14

US20180166316A1

Substrate carrier system with protective covering

#17 | 2018-03-15

US20180075958A1

PERMANENT MAGNETIC CHUCK FOR OLED MASK CHUCKING

#18 | 2018-02-22

US20180053676A1

Bipolar electrostatic chuck and method for using the same

#19 | 2018-02-22

US20180053675A1

Bipolar electrostatic chuck and method for using the same

#20 | 2018-02-22

US20180051811A1

Door seal for vacuum chamber

#21 | 2018-01-25

US20180025890A1

Plasma uniformity control by gas diffuser hole design

#22 | 2017-11-16

US20170327946A1

RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus

#23 | 2017-11-09

US20170322606A1

Physics

Dual loop susceptor temperature control system

#24 | 2017-11-09

US20170321323A1

Full-area counter-flow heat exchange substrate support

#25 | 2017-06-22

US20170178867A1

GAS DIFFUSER HAVING GROOVED HOLLOW CATHODES

#26 | 2017-06-08

US20170162678A1

Multilayer passivation or etch stop TFT

#27 | 2017-03-16

US20170076968A1

Substrate carrier system and method for using the same

#28 | 2017-02-16

US20170047867A1

ELECTROSTATIC CHUCK WITH ELECTROSTATIC FLUID SEAL FOR CONTAINING BACKSIDE GAS

#29 | 2016-12-15

US20160362788A1

Atomic layer deposition processing chamber permitting low-pressure tool replacement

#30 | 2016-11-03

US20160319422A1

THIN FILM ENCAPSULATION PROCESSING SYSTEM AND PROCESS KIT PERMITTING LOW-PRESSURE TOOL REPLACEMENT

#31 | 2016-10-20

US20160305025A1

GROUND RETURN FOR PLASMA PROCESSES

#32 | 2016-08-18

US20160238951A1

Physics

ROLL TO ROLL MASK-LESS LITHOGRAPHY WITH ACTIVE ALIGNMENT

#33 | 2016-07-21

US20160211162A1

Substrate carrier with integrated electrostatic chuck

#34 | 2016-07-21

US20160208380A1

GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LARGE-AREA PLASMA REACTOR

#35 | 2016-07-07

US20160196997A1

Substrate carrier with integrated electrostatic chuck

#36 | 2016-02-25

US20160056019A1

Plasma uniformity control by gas diffuser hole design

#37 | 2016-02-11

US20160043319A1

ACTIVELY-ALIGNED FINE METAL MASK

#38 | 2016-01-14

US20160013320A1

Multilayer passivation or etch stop TFT

#39 | 2015-12-17

US20150364350A1

HEATING AND COOLING OF SUBSTRATE SUPPORT

#40 | 2015-12-03

US20150348812A1

Performing operations; transporting

Permanent magnetic chuck for OLED mask chucking

#41 | 2015-12-03

US20150343580A1

Electromagnetic chuck for OLED mask chucking

#42 | 2015-11-26

US20150340204A1

Performing operations; transporting

Transmission line RF applicator for plasma chamber

#43 | 2015-10-01

US20150273490A1

Tightly fitted ceramic insulator on large area electrode

#44 | 2015-08-06

US20150221507A1

Indium gallium zinc oxide layers for thin film transistors

#45 | 2014-09-18

US20140264354A1

Buffer layers for metal oxide semiconductors for TFT

#46 | 2014-09-11

US20140251216A1

FLIP EDGE SHADOW FRAME

#47 | 2014-08-21

US20140230730A1

Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition

#48 | 2014-08-07

US20140216929A1

DOPED ZINC TARGET

#49 | 2014-08-07

US20140216344A1

RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus

#50 | 2014-01-23

US20140023460A1

Slit valve door with moving mating part

#51 | 2013-11-14

US20130302999A1

SiOprocess chemistry development using microwave plasma CVD

#52 | 2013-10-10

US20130263782A1

Flip edge shadow frame

#53 | 2013-09-05

US20130228124A1

Substrate support with ceramic insulation

#54 | 2013-08-29

US20130221833A1

Transmission line RF applicator for plasma chamber

#55 | 2013-08-15

US20130206068A1

LINEAR PECVD APPARATUS

#56 | 2013-07-25

US20130186859A1

Asymmetrical RF Drive for Electrode of Plasma Chamber

#57 | 2013-06-06

US20130140009A1

ROBUST OUTLET PLUMBING FOR HIGH POWER FLOW REMOTE PLASMA SOURCE

#58 | 2013-05-23

US20130126331A1

Guided wave applicator with non-gaseous dielectric for plasma chamber

#59 | 2013-03-21

US20130071581A1

PLASMA MONITORING AND MINIMIZING STRAY CAPACITANCE

#60 | 2013-03-21

US20130068161A1

GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LARGE-AREA PLASMA REACTOR

#61 | 2012-12-27

US20120326592A1

Transmission Line RF Applicator for Plasma Chamber

#62 | 2012-12-06

US20120304934A1

POROUS CERAMIC GAS DISTRIBUTION FOR PLASMA SOURCE ANTENNA

#63 | 2012-08-30

US20120217874A1

Plasma source with vertical gradient

#64 | 2012-08-16

US20120208306A1

Method for encapsulating an organic light emitting diode

#65 | 2012-07-05

US20120171391A1

Thin film deposition using microwave plasma

#66 | 2012-06-14

US20120149194A1

Substrate support with gas introduction openings

#67 | 2012-05-03

US20120103989A1

Method and apparatus for sealing an opening of a processing chamber

#68 | 2012-05-03

US20120103264A1

METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS

#69 | 2012-04-05

US20120082802A1

Power loading substrates to reduce particle contamination

#70 | 2012-03-15

US20120061605A1

Gate valve

#71 | 2012-02-09

US20120031335A1

Vertical inline CVD system

#72 | 2012-02-09

US20120031333A1

Vertical inline CVD system

#73 | 2012-02-02

US20120024693A1

Reactive sputtering chamber with gas distribution tubes

#74 | 2012-01-12

US20120006493A1

HEATING AND COOLING OF SUBSTRATE SUPPORT

#75 | 2011-12-08

US20110297921A1

Water-barrier encapsulation method

#76 | 2011-12-01

US20110290183A1

Plasma uniformity control by gas diffuser hole design

#77 | 2011-11-24

US20110287374A1

Performing operations; transporting

Floating slit valve for transfer chamber interface

#78 | 2011-11-24

US20110284100A1

Tightly fitted ceramic insulator on large area electrode

#79 | 2011-10-06

US20110241892A1

Frequency monitoring to detect plasma process abnormality

#80 | 2011-07-07

US20110164955A1

PROCESSING CHAMBER WITH TRANSLATING WEAR PLATE FOR LIFT PIN

#81 | 2011-06-23

US20110146577A1

SHOWERHEAD WITH INSULATED CORNER REGIONS

#82 | 2011-06-09

US20110135844A1

Large area plasma processing chamber with at-electrode RF matching

#83 | 2011-04-28

US20110095402A1

Fixed constructions

Gate dielectric film with controlled structural and physical properties over a large surface area substrate

#84 | 2011-02-24

US20110041873A1

Method of cleaning a CVD processing chamber

#85 | 2010-12-30

US20100327162A1

In-line electron beam test system

#86 | 2010-12-09

US20100311249A1

Multi-gas flow diffuser

#87 | 2010-11-18

US20100288197A1

Anodized showerhead

#88 | 2010-11-11

US20100282603A1

HEATED SUBSTRATE SUPPORT FOR CHEMICAL VAPOR DEPOSITION

#89 | 2010-11-11

US20100281683A1

ELECTRONIC DEVICE MANUFACTURING CHAMBER AND METHODS OF FORMING THE SAME

#90 | 2010-09-30

US20100245084A1

Detecting plasma chamber malfunction

#91 | 2010-08-19

US20100206483A1

RF bus and RF return bus for plasma chamber electrode

#92 | 2010-08-05

US20100196626A1

Ground return for plasma processes

#93 | 2010-07-22

US20100181024A1

Diffuser support

#94 | 2010-06-10

US20100144160A1

PLASMA REACTOR SUBSTRATE MOUNTING SURFACE TEXTURING

#95 | 2010-06-03

US20100136261A1

MODULATION OF RF RETURNING STRAPS FOR UNIFORMITY CONTROL

#96 | 2010-04-15

US20100092658A1

COATING OF MASKED SUBSTRATES

#97 | 2010-04-15

US20100089319A1

RF RETURN PATH FOR LARGE PLASMA PROCESSING CHAMBER

#98 | 2010-04-01

US20100080933A1

Multi-electrode PECVD source

#99 | 2010-03-04

US20100050534A1

Slit valve door able to compensate for chamber deflection

#100 | 2010-01-21

US20100013626A1