Shingo Ikeda

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2025-11-27

Top Assignees for applications by Shingo Ikeda

The entities that hold a legal rights for patent applications filed by inventor Ikeda Shingo:

ASM JAPAN K.K. 4 Tokyo, Japan
CYGAMES, INC. 3 Tokyo, Japan
Kyushu University, National University Corporation 2 Higashi-ku, Japan
TOYO INK SC HOLDINGS CO., LTD. 2 Tokyo, Japan
TOYOCHEM CO., LTD. 1 Tokyo, Japan
TOYOCOLOR CO., LTD. 1 Tokyo, Japan
CANON KABUSHIKI KAISHA 1 Tokyo, Japan

Recent patent applications by Ikeda Shingo

Shingo Ikeda from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2025-11-27

US20250360408A1

Human necessities

NON-TRANSITORY COMPUTER READABLE MEDIUM, INFORMATION PROCESSING METHOD, AND GAME APPARATUS

#2 | 2024-12-12

US20240408501A1

Human necessities

NON-TRANSITORY COMPUTER READABLE MEDIUM, INFORMATION PROCESSING METHOD, AND INFORMATION PROCESSING SYSTEM

#3 | 2023-11-02

US20230347252A1

Human necessities

PROGRAM, ELECTRONIC DEVICE, METHOD, AND SYSTEM

#4 | 2016-06-02

US20160156039A1

Electricity

Binder composition for non-aqueous secondary battery electrode

#5 | 2012-04-19

US20120095131A1

Electricity

BINDER COMPOSITION FOR NON-AQUEOUS SECONDARY BATTERY ELECTRODE

#6 | 2007-01-11

US20070008849A1

Physics

Information recording/reproducing apparatus having control circuit of spindle motor

#7 | 2006-11-30

US20060269690A1

Chemistry; metallurgy

Formation technology for nanoparticle films having low dielectric constant

#8 | 2006-05-18

US20060105583A1

Chemistry; metallurgy

Formation technology of nano-particle films having low dielectric constant

#9 | 2006-02-02

US20060021701A1

Electricity

Dual-chamber plasma processing apparatus

#10 | 2005-02-17

US20050034667A1

Chemistry; metallurgy

Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation

InventorID:

1549899 ⎘