Inventor profile of:

Paul R. McHugh

City:

Kalispell, Montana

Country:

United States

Published Applications:

110

Last publication date:

2026-01-22

Top Assignees for applications by Paul R. McHugh

The entities that hold a legal rights for patent applications filed by inventor McHugh Paul R.:

Recent patent applications by McHugh Paul R.

Paul R. McHugh from Kalispell, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-01-22
US20260026286A1
Electricity

ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT

#2 | 2025-12-11
US20250377258A1
Physics

RAPID SEAL LEAK TEST USING HE OR CO2 GAS DETECTION

#3 | 2025-11-13
US20250347022A1
Chemistry; metallurgy

COPLANARITY IMPROVEMENT OF HIGH-RATE CU PILLAR PROCESSES USING HIGH AGITATION TO ENABLE USE OF HIGH ACID, LOW CU CHEMISTRIES

#4 | 2025-11-13
US20250347020A1
Chemistry; metallurgy

ELECTROPLATING CO-PLANARITY IMPROVEMENT BY DIE SHIELDING

#5 | 2025-10-30
US20250336664A1
Electricity

GAS ATOMIZED PREWETTING CHAMBER AND CLEANING SYSTEM AND METHOD

#6 | 2025-06-12
US20250188640A1
Chemistry; metallurgy

FLOW-THROUGH EDGE SHIELD TO LESSEN CURRENT CROWDING EFFECTS DURING WAFER ELECTROPLATING

#7 | 2025-04-10
US20250118572A1
Electricity

ANNEAL CHAMBER

#8 | 2025-04-10
US20250116028A1
Chemistry; metallurgy

ELECTROPLATING CHAMBER USING JET ARRAY TO ENABLE HIGH MASS-TRANSFER

#9 | 2025-02-13
US20250051951A1
Chemistry; metallurgy

PLATING AND DEPLATING CURRENTS FOR MATERIAL CO-PLANARITY IN SEMICONDUCTOR PLATING PROCESSES

#10 | 2025-01-02
US20250006519A1
Electricity

ELECTROPLATING WETTING CHAMBER WITH REDUCED BUBBLE ENTRAPMENT

#11 | 2024-12-12
US20240413011A1
Electricity

AUTOMATED DIAL-IN OF ELECTROPLATING PROCESS PARAMETERS BASED ON WAFER RESULTS FROM EX-SITU METROLOGY

#12 | 2023-12-21
US20230411222A1
Electricity

MODEL-BASED PARAMETER ADJUSTMENTS FOR DEPOSITION PROCESSES

#13 | 2023-10-05
US20230313406A1
Chemistry; metallurgy

ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENTRATIONS

#14 | 2023-10-05
US20230313405A1
Chemistry; metallurgy

ELECTROPLATING SYSTEMS AND METHODS WITH INCREASED METAL ION CONCENTRATIONS

#15 | 2023-09-07
US20230279576A1
Chemistry; metallurgy

Plating and deplating currents for material co-planarity in semiconductor plating processes

#16 | 2023-08-17
US20230257900A1
Chemistry; metallurgy

Parameter adjustment model for semiconductor processing chambers

#17 | 2023-06-22
US20230193504A1
Chemistry; metallurgy

Mechanically-driven oscillating flow agitation

#18 | 2023-06-01
US20230167573A1
Chemistry; metallurgy

Electroplating system

#19 | 2023-03-23
US20230092346A1
Chemistry; metallurgy

ELECTROPLATING CO-PLANARITY IMPROVEMENT BY DIE SHIELDING

#20 | 2022-05-12
US20220145489A1
Chemistry; metallurgy

Electroplating system

#21 | 2022-05-12
US20220145485A1
Chemistry; metallurgy

Mechanically-driven oscillating flow agitation

#22 | 2022-04-28
US20220127747A1
Chemistry; metallurgy

Multi-compartment electrochemical replenishment cell

#23 | 2021-11-11
US20210348296A1
Chemistry; metallurgy

Electroplating system

#24 | 2021-04-08
US20210102307A1
Chemistry; metallurgy

Mechanically-driven oscillating flow agitation

#25 | 2019-05-23
US20190153611A1
Chemistry; metallurgy

Electroplating apparatus with electrolyte agitation

#26 | 2017-12-21
US20170365492A1
Electricity

WAFER PROCESSOR DOOR INTERFACE

#27 | 2017-12-14
US20170357158A1
Physics

Removing photoresist from a wafer

#28 | 2017-11-23
US20170335484A1
Chemistry; metallurgy

Electroplating apparatus with current crowding adapted contact ring seal and thief electrode

#29 | 2017-10-05
US20170283976A1
Chemistry; metallurgy

Electroplating wafers having a pattern induced non-uniformity

#30 | 2017-05-18
US20170137959A1
Chemistry; metallurgy

Inert anode electroplating processor and replenisher with anionic membranes

#31 | 2017-03-02
US20170058424A1
Chemistry; metallurgy

Electroplating processor with current thief electrode

#32 | 2017-02-23
US20170051423A1
Chemistry; metallurgy

Adaptive electric field shielding in an electroplating processor using agitator geometry and motion control

#33 | 2017-01-26
US20170022624A1
Chemistry; metallurgy

Electroplating apparatus with electrolyte agitation

#34 | 2017-01-19
US20170016137A1
Chemistry; metallurgy

Inert anode electroplating processor and replenisher

#35 | 2017-01-12
US20170009368A1
Chemistry; metallurgy

Electroplating apparatus with membrane tube shield

#36 | 2016-12-08
US20160355941A1
Chemistry; metallurgy

METHOD OF FORMING METAL AND METAL ALLOY FEATURES

#37 | 2016-12-01
US20160348263A1
Chemistry; metallurgy

Electroplating apparatus

#38 | 2016-10-20
US20160305038A1
Chemistry; metallurgy

Electroplating wafers having a notch

#39 | 2016-08-18
US20160237584A1
Chemistry; metallurgy

ELECTROPLATING WITH REDUCED AIR BUBBLE DEFECTS

#40 | 2016-07-28
US20160215409A1
Chemistry; metallurgy

Electroplating apparatus with notch adapted contact ring seal and thief electrode

#41 | 2016-07-21
US20160208402A1
Chemistry; metallurgy

Electroplating apparatus with membrane tube shield

#42 | 2015-03-19
US20150075976A1
Chemistry; metallurgy

ELECTROPLATING PROCESSOR WITH GEOMETRIC ELECTROLYTE FLOW PATH

#43 | 2014-12-18
US20140367264A1
Chemistry; metallurgy

AUTOMATIC IN-SITU CONTROL OF AN ELECTRO-PLATING PROCESSOR

#44 | 2014-09-18
US20140266219A1
Physics

DETECTING ELECTROLYTE MENISCUS IN ELECTROPLATING PROCESSORS

#45 | 2014-03-06
US20140061053A1
Chemistry; metallurgy

Electroplating systems and methods for high sheet resistance substrates

#46 | 2013-11-14
US20130299354A1
Electricity

Electrochemical processor

#47 | 2013-11-14
US20130299343A1
Chemistry; metallurgy

Electroplating processor with geometric electrolyte flow path

#48 | 2013-06-13
US20130146447A1
Chemistry; metallurgy

Electro processor with shielded contact ring

#49 | 2013-05-30
US20130134035A1
Chemistry; metallurgy

Contact ring for an electrochemical processor

#50 | 2013-03-28
US20130075265A1
Chemistry; metallurgy

APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSING OF MICROFEATURE WAFERS

#51 | 2012-11-22
US20120292181A1
Chemistry; metallurgy

Electrochemical processor

#52 | 2012-11-22
US20120292179A1
Chemistry; metallurgy

Electrochemical processor

#53 | 2012-08-09
US20120199475A1
Chemistry; metallurgy

PROCESSING APPARATUS WITH VERTICAL LIQUID AGITATION

#54 | 2012-03-01
US20120052204A1
Electricity

WORKPIECE WETTING AND CLEANING

#55 | 2010-05-13
US20100116671A1
Electricity

Apparatus and method for electrochemically depositing metal on a semiconductor workpiece

#56 | 2010-04-01
US20100078334A1
Chemistry; metallurgy

Electro-chemical processor

#57 | 2008-09-11
US20080217167A9
Electricity

APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSING OF MICROELECTRONIC WORKPIECES

#58 | 2008-09-11
US20080217166A9
Electricity

APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSSING OF MICROELECTRONIC WORKPIECES

#59 | 2008-09-11
US20080217165A9
Electricity

APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSING OF MICROELECTRONIC WORKPIECES

#60 | 2008-07-31
US20080179180A1
Chemistry; metallurgy

Apparatus and methods for electrochemical processing of microfeature wafers

#61 | 2008-07-01
US10733807
-

Integrated microfeature workpiece processing tools with registration systems for paddle reactors

#62 | 2008-03-20
US20080067072A1
Chemistry; metallurgy

Method of forming metal and metal alloy features

#63 | 2008-02-28
US20080048306A1
Electricity

Electro-chemical processor

#64 | 2008-02-21
US20080041727A1
Chemistry; metallurgy

Method and system for depositing alloy composition

#65 | 2008-01-17
US20080011609A1
Chemistry; metallurgy

Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpieces

#66 | 2008-01-17
US20080011450A1
Electricity

Apparatus and Method for Thermally Controlled Processing of Microelectronic Workpieces

#67 | 2008-01-10
US20080006617A1
Mechanical engineering

Thermal wafer processor

#68 | 2008-01-03
US20080003781A1
Chemistry; metallurgy

Electro-chemical processor

#69 | 2007-11-15
US20070261964A1
Chemistry; metallurgy

Reactors, systems, and methods for electroplating microfeature workpieces

#70 | 2007-09-27
US20070221502A1
Physics

TUNING ELECTRODES USED IN A REACTOR FOR ELECTROCHEMICALLY PROCESSING A MICROELECTRONIC WORKPIECE

#71 | 2007-09-11
US10400186
-

Workpiece processor having processing chamber with improved processing fluid flow

#72 | 2007-09-04
US9872151
-

Apparatus and methods for electrochemical processing of microelectronic workpieces

#73 | 2007-08-07
US10295302
-

Apparatus and method for thermally controlled processing of microelectronic workpieces

#74 | 2007-07-24
US10426029
-

Method and apparatus for controlling vessel characteristics, including shape and thieving current for processing microfeature workpieces

#75 | 2007-07-05
US20070151844A1
Chemistry; metallurgy

Apparatus and method for agitating liquids in wet chemical processing of microfeature workpieces

#76 | 2007-04-26
US20070089991A1
Chemistry; metallurgy

Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece

#77 | 2007-03-13
US9866391
-

Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece

#78 | 2007-02-15
US20070034516A1
Physics

Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece

#79 | 2007-01-09
US9866463
-

Turning electrodes used in a reactor for electrochemically processing a microelectronic workpiece

#80 | 2006-10-12
US20060226019A1
Chemistry; metallurgy

Die-level wafer contact for direct-on-barrier plating

#81 | 2006-10-03
US10377397
-

Apparatus and method for electrochemically depositing metal on a semiconductor workpiece

#82 | 2006-09-05
US9902491
-

Methods and apparatus for processing microelectronic workpieces using metrology

#83 | 2006-03-28
US9849505
-

Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece

#84 | 2006-01-05
US20060000716A1
Chemistry; metallurgy

Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece

#85 | 2005-11-03
US20050245083A1
Electricity

Apparatus and method for electrochemically depositing metal on a semiconductor workpiece

#86 | 2005-10-13
US20050224340A1
Chemistry; metallurgy

System for electrochemically processing a workpiece

#87 | 2005-09-29
US20050211551A1
Electricity

Apparatus and methods for electrochemical processing of microelectronic workpieces

#88 | 2005-09-22
US20050205419A1
Electricity

Apparatus and methods for electrochemical processsing of microelectronic workpieces

#89 | 2005-09-22
US20050205409A1
Electricity

Apparatus and methods for electrochemical processing of microelectronic workpieces

#90 | 2005-09-08
US20050194248A1
Electricity

Apparatus and methods for electrochemical processing of microelectronic workpieces

#91 | 2005-09-01
US20050189227A1
Chemistry; metallurgy

Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece

#92 | 2005-09-01
US20050189215A1
Chemistry; metallurgy

Apparatus and methods for electrochemical processing of microelectronic workpieces

#93 | 2005-09-01
US20050189214A1
Electricity

Apparatus and methods for electrochemical processing of microelectronic workpieces

#94 | 2005-08-25
US20050183959A1
Chemistry; metallurgy

Tuning electrodes used in a reactor for electrochemically processing a microelectric workpiece

#95 | 2005-08-18
US20050178667A1
Chemistry; metallurgy

Method and systems for controlling current in electrochemical processing of microelectronic workpieces

#96 | 2005-08-04
US20050167274A1
Chemistry; metallurgy

Tuning electrodes used in a reactor for electrochemically processing a microelectronics workpiece

#97 | 2005-08-04
US20050167273A1
Chemistry; metallurgy

Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece

#98 | 2005-08-04
US20050167265A1
Chemistry; metallurgy

System for electrochemically processing a workpiece

#99 | 2005-05-26
US20050109633A1
Chemistry; metallurgy

System for electrochemically processing a workpiece

#100 | 2005-05-26
US20050109629A1
Chemistry; metallurgy

System for electrochemically processing a workpiece

InventorID:

159875 ⎘