Sandy Hook, Connecticut
United States
18
2019-04-25
The entities that hold a legal rights for patent applications filed by inventor MARKOYA Louis John:
Louis John MARKOYA from Sandy Hook, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Lithographic apparatus, a dryer and a method of removing liquid from a surface
#2 | 2018-09-20Lithographic apparatus and method
#3 | 2017-08-10Lithographic apparatus, a dryer and a method of removing liquid from a surface
#4 | 2015-12-24Lithographic apparatus and method
#5 | 2012-01-19Lithographic apparatus, fluid combining unit and device manufacturing method
#6 | 2011-10-27Systems and methods for thermally-induced aberration correction in immersion lithography
#7 | 2010-08-26FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
#8 | 2010-03-04Liquid immersion lithography system comprising a tilted showerhead relative to a substrate
#9 | 2009-08-27Re-flow and buffer system for immersion lithography
#10 | 2009-07-30IMMERSION LITHOGRAPHY APPARATUS
#11 | 2009-07-23Immersion lithographic apparatus with immersion fluid re-circulating system
#12 | 2009-04-30Systems and methods for insitu lens cleaning using ozone in immersion lithography
#13 | 2008-08-21Systems and methods for insitu lens cleaning in immersion lithography
#14 | 2008-08-14Lithographic apparatus, a dryer and a method of removing liquid from a surface
#15 | 2008-06-12Systems and methods for thermally-induced aberration correction in immersion lithography
#16 | 2008-06-05Lithographic apparatus and device manufacturing method
#17 | 2008-05-22Lithographic apparatus with a fluid combining unit and related device manufacturing method
#18 | 2006-10-26Liquid immersion lithography system having a tilted showerhead relative to a substrate
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