Poughkeepsie, New York
United States
16
2013-04-04
The entities that hold a legal rights for patent applications filed by inventor O'Meara David L.:
David L. O'Meara from Poughkeepsie, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Multi-layer pattern for alternate ALD processes
#2 | 2011-10-06Multilayer sidewall spacer for seam protection of a patterned structure
#3 | 2011-10-06Dual sidewall spacer for seam protection of a patterned structure
#4 | 2007-04-05Method of forming a gate stack containing a gate dielectric layer having reduced metal content
#5 | 2007-03-22Method and system for forming a layer with controllable spstial variation
#6 | 2007-03-22Multi-source method and system for forming an oxide layer
#7 | 2006-10-12Method and system for forming an oxynitride layer
#8 | 2006-07-27Method and control system for treating a hafnium-based dielectric processing system
#9 | 2005-10-06Wafer heater assembly
#10 | 2005-09-29Method and processing system for determining coating status of a ceramic substrate heater
#11 | 2005-09-29Method and processing system for plasma-enhanced cleaning of system components
#12 | 2005-03-31Method and processing system for monitoring status of system components
#13 | 2005-03-31Method for monitoring status of system components
#14 | 2005-03-17Interfacial oxidation process for high-k gate dielectric process integration
#15 | 2005-02-03Method of forming uniform ultra-thin oxynitride layers
#16 | 2005-02-03Formation of ultra-thin oxide layers by self-limiting interfacial oxidation
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