Dresden
Germany
14
2020-07-16
The entities that hold a legal rights for patent applications filed by inventor Schedel Thorsten:
Thorsten Schedel from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Photomask assembly with reflective photomask and method of manufacturing a reflective photomask
#2 | 2017-04-20Reflective photomask and reflection-type mask blank
#3 | 2010-04-15Interconnect structures and methods
#4 | 2009-07-02Method for Enhancing the Adhesion of a Passivation Layer on a Semiconductor Device
#5 | 2007-07-24Method for adjusting a substrate in an appliance for carrying out exposure
#6 | 2007-01-04Method for the preferred processing of workpieces of highest priority
#7 | 2005-12-27Method for exposing at least one or at least two semiconductor wafers
#8 | 2005-12-08Method for purging an optical lens
#9 | 2005-11-24Method for determining the relative positional accuracy of two structure elements on a wafer
#10 | 2005-06-21Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer
#11 | 2005-05-19Method for producing a mask adapted to an exposure apparatus
#12 | 2005-05-10Method for adjusting processing parameters of at least one plate-shaped object in a processing tool
#13 | 2005-05-03Method for exposing a semiconductor wafer
#14 | 2005-03-01Method for aligning and exposing a semiconductor wafer
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