Scottsdale, Arizona
United States
20
2025-10-23
The entities that hold a legal rights for patent applications filed by inventor Givens Michael Eugene:
Michael Eugene Givens from Scottsdale, US has applied for patents for these inventions. The list has both pending applications and granted patents:
SYSTEMS, METHODS, AND STRUCTURES FOR THRESHOLD VOLTAGE CONTROL
#2 | 2025-09-04METAL OXIDE FILM AND METAL FILM LINER COMBINATION IN A SEMICONDUCTOR STRUCTURE, RELATED DEVICES, RELATED SYSTEMS, AND RELATED METHODS
#3 | 2025-09-04SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
#4 | 2025-08-28METHODS FOR FORMING ASYMMETRICAL DIPOLES FOR CAPACITORS, RELATED DEVICES, AND RELATED SYSTEMS
#5 | 2025-08-14REMOTE DOPING OF A SEMICONDUCTOR STRUCTURE, RELATED DEVICES, RELATED SYSTEMS, AND RELATED METHODS
#6 | 2024-03-21METHOD FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SEMICONDUCTOR DEVICE STRUCTURES
#7 | 2020-10-29Methods for forming a semiconductor device structure and related semiconductor device structures
#8 | 2020-07-16METHOD FOR FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND RELATED SEMICONDUCTOR DEVICE STRUCTURES
#9 | 2020-05-21Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
#10 | 2019-12-12Method of forming a germanium oxynitride film
#11 | 2019-05-30Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
#12 | 2019-03-21Method for forming a semiconductor device structure comprising a gate fill metal
#13 | 2019-01-24Methods for forming a semiconductor device structure and related semiconductor device structures
#14 | 2018-10-25Source/drain performance through conformal solid state doping
#15 | 2018-05-03Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
#16 | 2017-11-02Method of forming a germanium oxynitride film
#17 | 2017-11-02Source/drain performance through conformal solid state doping
#18 | 2017-10-26Deposition of metal borides and silicides
#19 | 2017-10-26Deposition of metal borides
#20 | 2017-04-20IMPLEMENTING ATOMIC LAYER DEPOSITION FOR GATE DIELECTRICS
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