Almere
Netherlands
33
2021-11-25
33
2023-06-20
These are the the leading inventors for applications assigned to ASM IP HOLDINGS B.V.:
ASM IP HOLDINGS B.V. based in Almere, NL has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Storage device for storing wafer cassettes for use with a batch furnace
#2 | 2020-03-26 ✅ Patent 10,734,219 granted on 2020-08-04Plasma film forming method
#3 | 2019-08-01 ✅ Patent 10,535,516 granted on 2020-01-14Method for depositing a semiconductor structure on a surface of a substrate and related semiconductor structures
#4 | 2019-05-30 ✅ Patent 10,720,331 granted on 2020-07-21Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
#5 | 2019-03-28 ✅ Patent 10,658,205 granted on 2020-05-19Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
#6 | 2019-03-21 ✅ Patent 10,607,895 granted on 2020-03-31Method for forming a semiconductor device structure comprising a gate fill metal
#7 | 2019-02-14 ✅ Patent 10,692,741 granted on 2020-06-23Radiation shield
#8 | 2019-01-31 ✅ Patent 10,590,535 granted on 2020-03-17Chemical treatment, deposition and/or infiltration apparatus and method for using the same
#9 | 2019-01-10 ✅ Patent 10,685,834 granted on 2020-06-16Methods for forming a silicon germanium tin layer and related semiconductor device structures
#10 | 2018-12-20 ✅ Patent 10,480,078 granted on 2019-11-19Plasma atomic layer deposition
#11 | 2018-11-08 ✅ Patent 10,770,286 granted on 2020-09-08Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
#12 | 2018-10-25 ✅ Patent 10,665,452 granted on 2020-05-26Source/drain performance through conformal solid state doping
#13 | 2018-10-04 ✅ Patent 10,529,563 granted on 2020-01-07Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
#14 | 2018-06-07 ✅ Patent 10,714,350 granted on 2020-07-14Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
#15 | 2018-05-03 ✅ Patent 10,643,904 granted on 2020-05-05Methods for forming a semiconductor device and related semiconductor device structures
#16 | 2018-04-26 ✅ Patent 10,643,826 granted on 2020-05-05Methods for thermally calibrating reaction chambers
#17 | 2018-01-11 ✅ Patent 10,612,137 granted on 2020-04-07Organic reactants for atomic layer deposition
#18 | 2017-09-07 ✅ Patent 10,566,223 granted on 2020-02-18Systems and methods for dynamic semiconductor process scheduling
#19 | 2017-08-03 ✅ Patent 10,561,975 granted on 2020-02-18Variable conductance gas distribution apparatus and method
#20 | 2017-07-06 ✅ Patent 10,023,960 granted on 2018-07-17Process gas management for an inductively-coupled plasma deposition reactor
#21 | 2017-04-20 ✅ Patent 9,941,425 granted on 2018-04-10Photoactive devices and materials
#22 | 2016-12-20 ✅ Patent 9,523,148 granted on 2016-12-20Process for deposition of titanium oxynitride for use in integrated circuit fabrication
#23 | 2016-09-15 ✅ Patent 10,529,542 granted on 2020-01-07Cross-flow reactor and method
#24 | 2016-06-02 ✅ Patent 9,885,112 granted on 2018-02-06Film forming apparatus
#25 | 2016-01-14 ✅ Patent 9,349,620 granted on 2016-05-24Apparatus and method for pre-baking substrate upstream of process chamber
#26 | 2014-06-12 ✅ Patent 9,177,784 granted on 2015-11-03Semiconductor device dielectric interface layer
#27 | 2014-04-17 ✅ Patent 10,714,315 granted on 2020-07-14Semiconductor reaction chamber showerhead
#28 | 2014-03-13 ✅ Patent 9,021,985 granted on 2015-05-05Process gas management for an inductively-coupled plasma deposition reactor
#29 | 2014-03-06 ✅ Patent 8,742,668 granted on 2014-06-03Method for stabilizing plasma ignition
#30 | 2014-02-13 ✅ Patent 9,120,114 granted on 2015-09-01Deposition apparatus
#31 | 2013-11-07 ✅ Patent 8,728,832 granted on 2014-05-20Semiconductor device dielectric interface layer
#32 | 2013-10-10 ✅ Patent 8,946,830 granted on 2015-02-03Metal oxide protective layer for a semiconductor device
#33 | 2013-08-01 ✅ Patent 9,399,819 granted on 2016-07-26Deposition apparatus and deposition method
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