Inventor profile of:

Hako BOTMA

City:

Eindhoven

Country:

Netherlands

Published Applications:

17

Last publication date:

2018-02-01

Top Assignees for applications by Hako BOTMA

The entities that hold a legal rights for patent applications filed by inventor BOTMA Hako:

Recent patent applications by BOTMA Hako

Hako BOTMA from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2018-02-01
US20180031982A1
Physics

Radiation system

#2 | 2011-06-23
US20110149255A1
Physics

Lithographic apparatus and method

#3 | 2009-06-25
US20090159819A1
Physics

Pulse modifier, lithographic apparatus and device manufacturing method

#4 | 2009-03-26
US20090080085A1
Physics

Electromagnetic radiation pulse duration control apparatus and method

#5 | 2008-03-20
US20080067424A1
Physics

Lithographic apparatus, beam delivery systems, prisms and device manufacturing method

#6 | 2007-07-26
US20070170376A1
Physics

Lithographic apparatus and device manufacturing method

#7 | 2007-04-26
US20070090278A1
Physics

Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method

#8 | 2007-03-15
US20070057201A1
Physics

Lithographic apparatus and device manufacturing method

#9 | 2006-10-31
US10731429
-

Lithographic apparatus, mirror element, device manufacturing method, and beam delivery system

#10 | 2006-06-15
US20060126681A1
Performing operations; transporting

Pulse modifier, lithographic apparatus, and device manufacturing method

#11 | 2005-12-08
US20050270513A1
Physics

Lithographic apparatus and device manufacturing method

#12 | 2005-12-08
US20050270510A1
Physics

Illumination assembly, method for providing a radiation beam, lithographic projection apparatus and device manufacturing method

#13 | 2005-12-01
US20050264784A1
Physics

Lithographic apparatus and device manufacturing method

#14 | 2005-10-06
US20050219494A1
Physics

Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution

#15 | 2005-08-02
US10734639
-

Lithographic apparatus and device manufacturing method

#16 | 2005-07-07
US20050146702A1
Physics

Lithographic apparatus and device manufacturing method

#17 | 2005-06-30
US20050140957A1
Physics

Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method

InventorID:

2106066 ⎘