Yozo IKEDO

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2021-02-25

Top Assignees for applications by Yozo IKEDO

The entities that hold a legal rights for patent applications filed by inventor IKEDO Yozo:

Yozo IKEDO from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

Film-forming material mixed-gas forming device and film forming device

Substrate treatment apparatus

Substrate-supporting device

Method of forming fluorine-doped low-dielectric-constant insulating film

InventorID:

2209909 ⎘