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Inventor profile of:

David Ferdinand VLES

City:

Eindhoven

Country:

Netherlands

Published Applications:

Last publication date:

2026-02-26

Top Assignees for applications by David Ferdinand VLES

The entities that hold a legal rights for patent applications filed by inventor VLES David Ferdinand:

ASML Netherlands B.V. 30 Veldhoven, Netherlands
ASML Holding N.V. 4 Veldhoven, Netherlands
ASML Netherlands B.V. 1 Veidhoven, Netherlands

Recent patent applications by VLES David Ferdinand

David Ferdinand VLES from Eindhoven, NL has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2026-02-26

US20260056459A1

Physics

PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS

#2 | 2024-09-12

US20240302734A1

Physics

METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION

#3 | 2024-01-25

US20240027893A1

Physics

Pellicle and pellicle assembly

#4 | 2024-01-04

US20240004283A1

Physics

MEMBRANE FOR EUV LITHOGRAPHY

#5 | 2023-10-12

US20230324786A1

Physics

Metal-silicide-nitridation for stress reduction

#6 | 2023-10-05

US20230311173A1

Performing operations; transporting

MEMBRANE CLEANING APPARATUS

#7 | 2023-05-04

US20230134837A1

Physics

Substrate support, lithographic apparatus and loading method

#8 | 2022-09-01

US20220276553A1

Physics

PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS

#9 | 2022-08-11

US20220252974A1

Physics

Pellicle and pellicle assembly

#10 | 2022-06-16

US20220187701A1

Physics

Metal-silicide-nitridation for stress reduction

#11 | 2022-04-21

US20220121111A1

Physics

Pellicle and pellicle assembly

#12 | 2022-01-13

US20220008963A1

Performing operations; transporting

Membrane cleaning apparatus

#13 | 2021-07-08

US20210208500A1

Physics

Pellicle and pellicle assembly

#14 | 2021-06-17

US20210181618A1

Physics

Metal-silicide-nitridation for stress reduction

#15 | 2021-04-15

US20210109438A1

Physics

Membrane for EUV lithography

#16 | 2020-12-31

US20200406244A1

Performing operations; transporting

Graphene pellicle lithographic apparatus

#17 | 2020-10-08

US20200319546A1

Physics

Pellicle frame and pellicle assembly

#18 | 2020-07-02

US20200209736A1

Physics

Pellicle and pellicle assembly

#19 | 2020-05-21

US20200159107A1

Physics

Simultaneous double-side coating of multilayer graphene pellicle by local thermal processing

#20 | 2020-05-07

US20200142319A1

Physics

Alignment measurement system

#21 | 2020-02-27

US20200064731A1

Physics

Pellicle and pellicle assembly

#22 | 2020-02-27

US20200064183A1

Physics

Sensor mark and a method of manufacturing a sensor mark

#23 | 2019-07-25

US20190227445A1

Physics

Lithographic apparatus

#24 | 2019-05-02

US20190129299A1

Physics

Membrane for EUV lithography

#25 | 2019-04-18

US20190113853A1

Physics

Substrate support, lithographic apparatus and loading method

#26 | 2019-02-21

US20190056654A1

Physics

Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle

#27 | 2019-01-10