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Inventor profile of:

Paul Graeupner

City:

Aalen

Country:

Germany

Published Applications:

Last publication date:

2021-08-26

Top Assignees for applications by Paul Graeupner

The entities that hold a legal rights for patent applications filed by inventor Graeupner Paul:

CARL ZEISS SMT AG 18 Oberkochen, Germany
Carl Zeiss SMT GmbH 11 Oberkochen, Germany
Carl Zeiss SMT AG 3 , Germany
ASML Netherlands B.V. 3 Veldhoven, Netherlands
ASML Netherlands B.V. 1 , Netherlands
Carl Zeiss SMS Ltd 1 Misgav, Israel

Recent patent applications by Graeupner Paul

Paul Graeupner from Aalen, DE has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2021-08-26

US20210263406A1

Physics

Method and apparatus for performing an aerial image simulation of a photolithographic mask

#2 | 2018-06-14

US20180164691A1

Physics

PROJECTION EXPOSURE METHODS AND SYSTEMS

#3 | 2015-06-11

US20150160565A1

Physics

Projection exposure methods and systems

#4 | 2015-06-04

US20150153652A1

Physics

Method for adjusting an illumination setting

#5 | 2013-05-09

US20130114056A1

Physics

METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

#6 | 2012-01-19

US20120013985A1

Physics

Method for correcting optical proximity effects

#7 | 2011-09-01

US20110211181A1

Physics

Lithographic apparatus and device manufacturing method

#8 | 2010-06-24

US20100157266A1

Physics

Projection exposure method and projection exposure apparatus for microlithography

#9 | 2010-03-11

US20100060873A1

Physics

Illumination system for illuminating a mask in a microlithographic exposure apparatus

#10 | 2009-11-12

US20090280437A1

Physics

Projection exposure methods and systems

#11 | 2009-01-01

US20090002661A1

Physics

Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus

#12 | 2008-09-04

US20080212211A1

Physics

Immersion lithography objective

#13 | 2008-07-17

US20080170215A1

Physics

Lithographic apparatus and device manufacturing method

#14 | 2008-04-24

US20080094599A1

Physics

Projection system with compensation of intensity variations and compensation element therefor

#15 | 2008-02-14

US20080036982A1

Physics

Method For Structuring A Substrate Using Multiple Exposure

#16 | 2008-02-07

US20080032207A1

Physics

Method for correcting optical proximity effects

#17 | 2008-01-10

US20080007706A1

Physics

Method of optimizing imaging performance

#18 | 2007-08-23

US20070195299A1

Physics

Method for improving an Optical Imaging Property of a Projection Objective of a Microlithographic Projection Exposure Apparatus

#19 | 2007-08-16

US20070188881A1

Physics

Projection objective, especially for microlithography, and method for adjusting a projection objective

#20 | 2007-04-24

US10448339

Projection objective, especially for microlithography, and method for adjusting a projection objective

#21 | 2006-07-27

US20060164655A1

Physics

Method for determining wavefront aberrations

#22 | 2006-03-28

US10445076

Method for determining wavefront aberrations

#23 | 2005-12-01

US20050264780A1

Physics

Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus

#24 | 2005-10-27

US20050237506A1

Physics

Method of optimizing imaging performance

#25 | 2005-08-11

US20050174550A1

Physics

Lithographic apparatus and device manufacturing method

InventorID:

232384 ⎘