Campbell, California
United States
83
2024-05-23
The entities that hold a legal rights for patent applications filed by inventor Shchegrov Andrei V.:
Andrei V. Shchegrov from Campbell, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Device feature specific edge placement error (EPE)
#2 | 2024-01-25MASSIVE OVERLAY METROLOGY SAMPLING WITH MULTIPLE MEASUREMENT COLUMNS
#3 | 2023-11-09Massive overlay metrology sampling with multiple measurement columns
#4 | 2023-07-13Self-calibrating overlay metrology
#5 | 2022-12-29Self-calibrated overlay metrology using a skew training sample
#6 | 2022-11-10Self-calibrating overlay metrology
#7 | 2022-11-03Bandgap measurements of patterned film stacks using spectroscopic metrology
#8 | 2022-09-22Overlay metrology using spectroscopic phase
#9 | 2022-04-12Pupil-plane beam scanning for metrology
#10 | 2021-07-22Optical metrology tool equipped with modulated illumination sources
#11 | 2021-03-25Transmission small-angle X-ray scattering metrology system
#12 | 2021-02-25Systems and methods for combined reflectometry and photoelectron spectroscopy
#13 | 2020-10-22Methods and systems for combining x-ray metrology data sets to improve parameter estimation
#14 | 2020-07-30Methods and systems for co-located metrology
#15 | 2020-07-16Semiconductor metrology based on hyperspectral imaging
#16 | 2020-06-11Loosely-coupled inspection and metrology system for high-volume production process monitoring
#17 | 2019-09-05Metrology and control of overlay and edge placement errors
#18 | 2019-07-11Systems and methods for combined x-ray reflectometry and photoelectron spectroscopy
#19 | 2019-07-09Model based measurement systems with improved electromagnetic solver performance
#20 | 2019-06-27Optical metrology tool equipped with modulated illumination sources
#21 | 2019-02-07Overlay metrology using multiple parameter configurations
#22 | 2019-02-07Bandgap measurements of patterned film stacks using spectroscopic metrology
#23 | 2019-01-17Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction
#24 | 2018-10-18Transmission small-angle X-ray scattering metrology system
#25 | 2018-09-06Process robust overlay metrology based on optical scatterometry
#26 | 2018-06-28Optical metrology with small illumination spot size
#27 | 2018-06-26Confined illumination for small spot size metrology
#28 | 2018-04-26Hybrid metrology for patterned wafer characterization
#29 | 2018-04-19Metrology systems and methods for process control
#30 | 2018-03-01Spectral reflectometry for in-situ process monitoring and control
#31 | 2018-03-01Model based optical measurements of semiconductor structures with anisotropic dielectric permittivity
#32 | 2018-02-22Measurement of multiple patterning parameters
#33 | 2017-12-14Apparatus, techniques, and target designs for measuring semiconductor parameters
#34 | 2017-11-21Compac X-ray source for semiconductor metrology
#35 | 2017-10-05Semiconductor metrology with information from multiple processing steps
#36 | 2017-08-01Confined illumination for small spot size metrology
#37 | 2017-06-27High brightness liquid droplet X-ray source for semiconductor metrology
#38 | 2017-06-15X-ray scatterometry metrology for high aspect ratio structures
#39 | 2017-05-25Systems for providing illumination in optical metrology
#40 | 2017-03-16Compressive sensing for metrology
#41 | 2017-01-19Optical metrology tool equipped with modulated illumination sources
#42 | 2017-01-05Measurement of multiple patterning parameters
#43 | 2016-12-13Compressive sensing for metrology
#44 | 2016-11-17Optical metrology with small illumination spot size
#45 | 2016-11-03Computationally efficient X-ray based overlay measurement
#46 | 2016-07-14Measurement system optimization for X-ray based metrology
#47 | 2016-04-21Measurement of small box size targets
#48 | 2016-01-07Signal response metrology based on measurements of proxy structures
#49 | 2015-11-12Apparatus, techniques, and target designs for measuring semiconductor parameters
#50 | 2015-11-12Signal response metrology for scatterometry based overlay measurements
#51 | 2015-06-25Measurement of multiple patterning parameters
#52 | 2015-04-30Methods and apparatus for measuring semiconductor device overlay using X-ray metrology
#53 | 2015-04-23Small-angle scattering X-ray metrology systems and methods
#54 | 2015-02-19Metrology tool with combined XRF and SAXS capabilities
#55 | 2015-02-12Methods and apparatus for patterned wafer characterization
#56 | 2015-02-12Differential methods and apparatus for metrology of semiconductor targets
#57 | 2015-01-29Combined x-ray and optical metrology
#58 | 2014-11-27Metrology system optimization for parameter tracking
#59 | 2014-10-23On-device metrology
#60 | 2014-08-28Systems for providing illumination in optical metrology
#61 | 2014-06-19Integrated use of model-based metrology and a process model
#62 | 2014-05-15Apparatus and method for optical metrology with optimized system parameters
#63 | 2014-01-16Model building and analysis engine for combined X-ray and optical metrology
#64 | 2013-11-14Metrology tool with combined X-ray and optical scatterometers
#65 | 2013-09-26Efficient and compact visible microchip laser source with periodically poled nonlinear materials
#66 | 2013-08-29Optical metrology using targets with field enhancement elements
#67 | 2013-07-18Apparatus and method of measuring roughness and other parameters of a structure
#68 | 2013-07-04Optical metrology tool equipped with modulated illumination sources
#69 | 2013-05-09Secondary target design for optical measurements
#70 | 2009-05-28Parametric profiling using optical spectroscopic systems
#71 | 2007-10-09Parametric profiling using optical spectroscopic systems
#72 | 2007-07-05MANUFACTURABLE VERTICAL EXTENDED CAVITY SURFACE EMITTING LASER ARRAYS
#73 | 2007-07-05Manufacturable vertical extended cavity surface emitting laser arrays
#74 | 2007-06-28Cavity and packaging designs for arrays of vertical cavity surface emitting lasers with or without extended cavities
#75 | 2006-12-14Frequency stabilized vertical extended cavity surface emitting lasers
#76 | 2006-11-30System and method for driving semiconductor laser sources for displays
#77 | 2006-06-22Parametric profiling using optical spectroscopic systems to adjust processing parameter
#78 | 2006-05-11Overlay error detection
#79 | 2006-04-04Parametric profiling using optical spectroscopic systems
#80 | 2006-03-07Overlay error detection
#81 | 2006-02-02Apparatus, system, and method for wavelength conversion of mode-locked extended cavity surface emitting semiconductor lasers
#82 | 2006-02-02Projection display apparatus, system, and method
#83 | 2005-05-31Parametric profiling using optical spectroscopic systems
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